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Design and Implementation of Pulsed Laser Deposition System for Thin Film Coating Applications

Design and Implementation of Pulsed Laser Deposition System for Thin Film Coating Applications PDF Author: Tov I. Vestgaarden
Publisher:
ISBN:
Category : Pulsed laser deposition
Languages : en
Pages : 196

Book Description


Design and Implementation of Pulsed Laser Deposition System for Thin Film Coating Applications

Design and Implementation of Pulsed Laser Deposition System for Thin Film Coating Applications PDF Author: Tov I. Vestgaarden
Publisher:
ISBN:
Category : Pulsed laser deposition
Languages : en
Pages : 196

Book Description


Pulsed Laser Deposition of Thin Films

Pulsed Laser Deposition of Thin Films PDF Author: Robert Eason
Publisher: John Wiley & Sons
ISBN: 0470052112
Category : Science
Languages : en
Pages : 754

Book Description
Edited by major contributors to the field, this text summarizes current or newly emerging pulsed laser deposition application areas. It spans the field of optical devices, electronic materials, sensors and actuators, biomaterials, and organic polymers. Every scientist, technologist and development engineer who has a need to grow and pattern, to apply and use thin film materials will regard this book as a must-have resource.

Current Research in Pulsed Laser Deposition

Current Research in Pulsed Laser Deposition PDF Author: Liviu Duta
Publisher: MDPI
ISBN: 3036510443
Category : Medical
Languages : en
Pages : 224

Book Description
Despite its limitation in terms of surface covered area, the PLD technique still gathers interest among researchers by offering endless possibilities for tuning thin film composition and enhancing their properties of interest due to: (i) the easiness of a stoichiometric transfer even for very complex target materials, (ii) high adherence of the deposited structures to the substrate, (iii) controlled degree of phase, crystallinity, and thickness of deposited coatings, (iv) versatility of the experimental set-up which allows for simultaneous ablation of multiple targets resulting in combinatorial maps or consecutive ablation of multiple targets producing multi-layered structures, and (v) adjustment of the number of laser pulses, resulting in either a spread of nanoparticles, islands of materials or a complete covering of a surface. Moreover, a variation of PLD, known as Matrix Assisted Pulsed Laser Evaporation, allows for deposition of organic materials, ranging from polymers to proteins and even living cells, otherwise difficult to transfer unaltered in the form of thin films by other techniques. Furthermore, the use of laser light as transfer agent ensures purity of films and pulse-to-pulse deposition allows for an unprecedented control of film thickness at the nm level. This Special Issue is a collection of state-of-the art research papers and reviews in which the topics of interest are devoted to thin film synthesis by PLD and MAPLE, for numerous research and industry field applications, such as bio-active coatings for medical implants and hard, protective coatings for cutting and drilling tools withstanding high friction and elevated temperatures, sensors, solar cells, lithography, magnetic devices, energy-storage and conversion devices, controlled drug delivery and in situ microstructuring for boosting of surface properties.

Pulsed Laser Deposition of Thin Films

Pulsed Laser Deposition of Thin Films PDF Author: Douglas B. Chrisey
Publisher: Wiley-Interscience
ISBN: 9780471592181
Category : Technology & Engineering
Languages : en
Pages : 0

Book Description
A comprehensive overview of what is required to set up and begin research in this newly developing technology and understand the basics of the process. Internationally recognized experts in their fields cover such fundamentals as history, theory, film characteristics, surface modification, laser technology, materials and applications including excellent reviews regarding the entire areas of semiconductor buffer layers, thin-film ferroelectrics and ferrites along with the work involving films deposited by PLD.

Handbook of Laser Micro- and Nano-Engineering

Handbook of Laser Micro- and Nano-Engineering PDF Author: KOJI SUGIOKA.
Publisher:
ISBN: 9783319695372
Category : Lasers in engineering
Languages : en
Pages :

Book Description
This handbook provides a comprehensive review of the entire field of laser micro and nano processing, including not only a detailed introduction to individual laser processing techniques but also the fundamentals of laser-matter interaction and lasers, optics, equipment, diagnostics, as well as monitoring and measurement techniques for laser processing. Consisting of 11 sections, each composed of 4 to 6 chapters written by leading experts in the relevant field. Each main part of the handbook is supervised by its own part editor(s) so that high-quality content as well as completeness are assured. The book provides essential scientific and technical information to researchers and engineers already working in the field as well as students and young scientists planning to work in the area in the future. Lasers found application in materials processing practically since their invention in 1960, and are currently used widely in manufacturing. The main driving force behind this fact is that the lasers can provide unique solutions in material processing with high quality, high efficiency, high flexibility, high resolution, versatility and low environmental load. Macro-processing based on thermal process using infrared lasers such as CO2 lasers has been the mainstream in the early stages, while research and development of micro- and nano-processing are becoming increasingly more active as short wavelength and/or short pulse width lasers have been developed. In particular, recent advances in ultrafast lasers have opened up a new avenue to laser material processing due to the capabilities of ultrahigh precision micro- and nanofabrication of diverse materials. This handbook is the first book covering the basics, the state-of-the-art and important applications of the dynamic and rapidly expanding discipline of laser micro- and nanoengineering. This comprehensive source makes readers familiar with a broad spectrum of approaches to solve all relevant problems in science and technology. This handbook is the ultimate desk reference for all people working in the field.

Current Research in Pulsed Laser Deposition

Current Research in Pulsed Laser Deposition PDF Author: Liviu Duta
Publisher:
ISBN: 9783036510453
Category :
Languages : en
Pages : 224

Book Description
Despite its limitation in terms of surface covered area, the PLD technique still gathers interest among researchers by offering endless possibilities for tuning thin film composition and enhancing their properties of interest due to: (i) the easiness of a stoichiometric transfer even for very complex target materials, (ii) high adherence of the deposited structures to the substrate, (iii) controlled degree of phase, crystallinity, and thickness of deposited coatings, (iv) versatility of the experimental set-up which allows for simultaneous ablation of multiple targets resulting in combinatorial maps or consecutive ablation of multiple targets producing multi-layered structures, and (v) adjustment of the number of laser pulses, resulting in either a spread of nanoparticles, islands of materials or a complete covering of a surface. Moreover, a variation of PLD, known as Matrix Assisted Pulsed Laser Evaporation, allows for deposition of organic materials, ranging from polymers to proteins and even living cells, otherwise difficult to transfer unaltered in the form of thin films by other techniques. Furthermore, the use of laser light as transfer agent ensures purity of films and pulse-to-pulse deposition allows for an unprecedented control of film thickness at the nm level. This Special Issue is a collection of state-of-the art research papers and reviews in which the topics of interest are devoted to thin film synthesis by PLD and MAPLE, for numerous research and industry field applications, such as bio-active coatings for medical implants and hard, protective coatings for cutting and drilling tools withstanding high friction and elevated temperatures, sensors, solar cells, lithography, magnetic devices, energy-storage and conversion devices, controlled drug delivery and in situ microstructuring for boosting of surface properties.

Fabrication of Thin Films by Pulsed Laser Deposition for Clean Energy Applications

Fabrication of Thin Films by Pulsed Laser Deposition for Clean Energy Applications PDF Author: Xiaojun Zhang
Publisher:
ISBN:
Category :
Languages : en
Pages : 79

Book Description
Pulsed laser deposition (PLD) is a physical vapor deposition technique for thin film fabrication. Compared with other techniques, pulsed laser deposition technique has advantages such as stoichiometry, flexibility, versatility, lower deposition temperature, ability to grow metastable materials. Because of these advantages, pulsed laser deposition has been widely used in materials research. In this dissertation, pulsed laser deposition has been used to grow thin films for solid oxide fuel cell, light-emitting diode, and solar cell applications. Firstly, yttria-stabilized zirconia (YSZ) and cerium dioxide (CeO2) thin films are deposited in oxygen-deficient environments; their properties are compared to those deposited in oxygen-rich environments. Oxygen-deficient films are highly (001)-oriented, which corresponds to a surface that is expected to be forbidden based on Tasker's theoretical calculation of stoichiometric ionic crystals. A model considering non-stoichiometry-induced surface relaxation and surface atomic density is proposed to explain the orientation phenomenon observed under oxygen-deficient deposition conditions. This model is consistent with previous experimental results for indium tin oxide (ITO), SnO2 and NiO thin films deposited under similar conditions. Detailed studies of the preferred orientation of these oxygen-deficient ionic crystals are of direct relevance to the fabrication of films for use in solid oxide fuel cells. Secondly, undoped, Cu-doped, Se-enriched, Cu2Se-doped, Ag-doped, Ag2Se-doped, and nitrogen-doped ZnSe films have been grown on fused quartz substrates by pulsed laser deposition. It is found that adding a small amount (~2 mol%) of Cu2Se can significantly improve crystallinity and (111) texturing of ZnSe films. While the other films are highly resistive, Cu2Se-doped ZnSe films are p-type conducting with hole concentrations of ~ cm-3 and resistivity of ~0.098 ohm*cm (compared with previous reports of ~ cm-3 and 0.75 ohm*cm, respectively). The successful heavy p-type doping of ZnSe films is attributed to substitution of Zn atoms with Cu while limiting selenium-vacancy-associated compensating defects with additional selenium. Nitrogen doping has turned ZnSe films more favorable to wurtzite structures. Two newly observed Raman peaks at 555 cm-1 and 602 cm-1 are assigned to N local vibrational modes of hexagonal ZnSe structures. The nitrogen-doped ZnSe films are not conductive, which might be due to compensating defects arising from the presence of native defects or other impurities. This work is of importance to solve doping difficulties and contact problems of wide-bandgap semiconductors. Finally, batch growth of thin films by pulsed laser deposition has been tried. Using the natural temperature gradient, films with different deposition temperatures have been fabricated together. With change of deposition temperatures, ZnSe films are shown to have problems associated with crystalline defects, selenium loss, or phase separation. ZnSe films with improved crystallinity and no phase separation have been achieved using a 16 mol% Se enriched target. Multi-plume pulsed laser deposition has been proposed and discussed. With directionality of PLD plumes and non-uniformity of PLD films, this system is supposed to be more suitable for high-throughput compound thin film fabrication, which makes it very promising for efficient materials optimization and exploration. High-throughput fabrication of compound thin films has been successfully achieved using this system.

Optical Thin Films and Coatings

Optical Thin Films and Coatings PDF Author: Angela Piegari
Publisher: Elsevier
ISBN: 0857097318
Category : Technology & Engineering
Languages : en
Pages : 869

Book Description
Optical coatings, including mirrors, anti-reflection coatings, beam splitters, and filters, are an integral part of most modern optical systems. Optical thin films and coatings provides an overview of thin film materials, the properties, design and manufacture of optical coatings and their use across a variety of application areas.Part one explores the design and manufacture of optical coatings. Part two highlights unconventional features of optical thin films including scattering properties of random structures in thin films, optical properties of thin film materials at short wavelengths, thermal properties and colour effects. Part three focusses on novel materials for optical thin films and coatings and includes chapters on organic optical coatings, surface multiplasmonics and optical thin films containing quantum dots. Finally, applications of optical coatings, including laser components, solar cells, displays and lighting, and architectural and automotive glass, are reviewed in part four.Optical thin films and coatings is a technical resource for researchers and engineers working with optical thin films and coatings, professionals in the security, automotive, space and other industries requiring an understanding of these topics, and academics interested in the field. - An overview of the materials, properties, design and manufacture of thin films - Special attention is given to the unconventional features and novel materials of optical thin films - Reviews applications of optical coatings including laser components, solar cells, glasing, displays and lighting

Development of a Pulsed-laser Technique for Thin Film Deposition

Development of a Pulsed-laser Technique for Thin Film Deposition PDF Author: David J. Uhl
Publisher:
ISBN:
Category : Materials science
Languages : en
Pages : 76

Book Description
The majority of nanotechnology-related research at the CSCU-CNT at Southern Connecticut State University involves depositing thin films of controlled thicknesses using a thermal physical vapor deposition method. The thermal evaporative method, however, is limited to the deposition of single transition metals with low melting points. This project greatly expands the scope of available materials for deposition through the development and implementation of a pulsed-laser deposition technique. A solid state, Nd:YAG, Q-switched laser from 1989 was restored and aligned, and a 3-dimensional CAD model of the high vacuum chamber was produced to aid in the configuration of the system. The power output of the laser beam was monitored using a digital intensity readout; the beam reached a maximum power of 2 Watts. Three target elements were selected for deposition onto a Silicon substrate in order to test the efficiency of the system. Copper, Iron, and Tantalum samples were exposed to the beam under vacuum for 5 minutes. The Silicon substrates were imaged under a scanning electron microscope. The images demonstrate successful depositions. This development has greatly widened the scope of materials available for thin film deposition, subsequently impacting future research at the CSCU-CNT in the field of nanotechnology.

Pulsed Laser Deposition Improvements by Self-Directed Control

Pulsed Laser Deposition Improvements by Self-Directed Control PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 26

Book Description
Improvements in material thin coatings for the year 2000 and beyond require a radical new approach to deposition processes. Pulsed Laser Deposition (PLD) is one such deposition process which offers deposition of complex materials currently not possible with other deposition methods. Unfortunately, it is not enough to control thin film material composition, but thin film stoichiometry, micro and macro stress and strain, and thickness as well. It is also desirable to have a deposition process that is easy to use and is repeatable. In order to propel the current thin film deposition culture into accepting PLD as a manufacturing process, the automation of PLD is inevitable. The inception, development, and implementation of PLD automation methods is the aim of this document.