Author: Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 702
Book Description
Scientific and Technical Aerospace Reports
Author: Ion Implantation in Semiconductors
Author: D. StiévenardPublisher: Trans Tech Publications Ltd
ISBN: 3035703027
Category : Technology & Engineering
Languages : en
Pages : 480
Book Description
The volume presents approximately 30 invited contributions.
Radiation Effects in Advanced Semiconductor Materials and Devices
Author: C. ClaeysPublisher: Springer Science & Business Media
ISBN: 3662049740
Category : Science
Languages : en
Pages : 424
Book Description
This wide-ranging book summarizes the current knowledge of radiation defects in semiconductors, outlining the shortcomings of present experimental and modelling techniques and giving an outlook on future developments. It also provides information on the application of sensors in nuclear power plants.
Advances in Electronics and Electron Physics
Author: Publisher: Academic Press
ISBN: 0080577261
Category : Computers
Languages : en
Pages : 407
Book Description
Advances in Electronics and Electron Physics
Effect of Disorder and Defects in Ion-Implanted Semiconductors: Optical and Photothermal Characterization
Author: Publisher: Academic Press
ISBN: 0080864430
Category : Technology & Engineering
Languages : en
Pages : 335
Book Description
Defects in ion-implanted semiconductors are important and will likely gain increased importance as annealing temperatures are reduced with successive IC generations. Novel implant approaches, such as MdV implantation, create new types of defects whose origin and annealing characteristics will need to be addressed. Publications in this field mainly focus on the effects of ion implantation on the material and the modification in the implanted layer after high temperature annealing. The editors of this volume and Volume 45 focus on the physics of the annealing kinetics of the damaged layer. An overview of characterization tehniques and a critical comparison of the information on annealing kinetics is also presented. - Provides basic knowledge of ion implantation-induced defects - Focuses on physical mechanisms of defect annealing - Utilizes electrical, physical, and optical characterization tools for processed semiconductors - Provides the basis for understanding the problems caused by the defects generated by implantation and the means for their characterization and elimination
Physics Briefs
Author: Gallium-Nitride (GaN) II
Author: Publisher: Academic Press
ISBN: 0080864554
Category : Science
Languages : en
Pages : 509
Book Description
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The "Willardson and Beer" Series, as it is widely known, has succeeded in publishing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise indeed that this tradition will be maintained and even expanded.Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry.
Solar Energy Update
Author: Gallium Arsenide and Related Compounds
Author: Rapid Thermal Processing of Semiconductors
Author: Victor E. BorisenkoPublisher: Springer Science & Business Media
ISBN: 1489918043
Category : Technology & Engineering
Languages : en
Pages : 374
Book Description
Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.