American Doctoral Dissertations PDF Download

Author:
Publisher:
ISBN:
Category : Dissertation abstracts
Languages : en
Pages : 784

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Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 704

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Author: E. McCafferty
Publisher: Springer Science & Business Media
ISBN: 1441904549
Category : Science
Languages : en
Pages : 583

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Book Description
This textbook is intended for a one-semester course in corrosion science at the graduate or advanced undergraduate level. The approach is that of a physical chemist or materials scientist, and the text is geared toward students of chemistry, materials science, and engineering. This textbook should also be useful to practicing corrosion engineers or materials engineers who wish to enhance their understanding of the fundamental principles of corrosion science. It is assumed that the student or reader does not have a background in electrochemistry. However, the student or reader should have taken at least an undergraduate course in materials science or physical chemistry. More material is presented in the textbook than can be covered in a one-semester course, so the book is intended for both the classroom and as a source book for further use. This book grew out of classroom lectures which the author presented between 1982 and the present while a professorial lecturer at George Washington University, Washington, DC, where he organized and taught a graduate course on “Environmental Effects on Materials.” Additional material has been provided by over 30 years of experience in corrosion research, largely at the Naval Research Laboratory, Washington, DC and also at the Bethlehem Steel Company, Bethlehem, PA and as a Robert A. Welch Postdoctoral Fellow at the University of Texas. The text emphasizes basic principles of corrosion science which underpin extensions to practice.

Author: David E.J. Talbot
Publisher: CRC Press
ISBN: 1351259903
Category : Technology & Engineering
Languages : en
Pages : 699

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Book Description
Twenty years after its first publication, Corrosion Science and Technology continues to be a relevant practical guide for students and professionals interested in material science. This Third Edition thoroughly covers the basic principles of corrosion science in the same reader-friendly manner that made the previous edition invaluable, and enlarges the scope of the content with expanded chapters on processes for various metals and new technologies for limiting costs and metal degradation in a variety of commercial enterprises not explored in previous editions. This book also presents expertly developed methods of corrosion testing and prediction.

Author: Babu Suryadevara
Publisher: Woodhead Publishing
ISBN: 0128218193
Category : Technology & Engineering
Languages : en
Pages : 650

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Book Description
Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The second edition includes the recent advances of CMP and its emerging materials, methods, and applications, including coverage of post-CMP cleaning challenges and tribology of CMP. This important book offers a systematic review of fundamentals and advances in the area. Part one covers CMP of dielectric and metal films, with chapters focusing on the use of current and emerging techniques and processes and on CMP of various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. New content addressed includes CMP challenges with tungsten, cobalt, and ruthenium as interconnect and barrier films, consumables for ultralow topography and CMP for memory devices. Part two addresses consumables and process control for improved CMP and includes chapters on CMP pads, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes and approaches for defection characterization, mitigation, and reduction. Advances in Chemical Mechanical Planarization (CMP), Second Edition is an invaluable resource and key reference for materials scientists and engineers in academia and R&D. - Reviews the most relevant techniques and processes for CMP of dielectric and metal films - Includes chapters devoted to CMP for current and emerging materials - Addresses consumables and process control for improved CMP, including post-CMP

Author: Aurel Nuro
Publisher: BoD – Books on Demand
ISBN: 1839624183
Category : Science
Languages : en
Pages : 334

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Emerging Contaminants presents the reader with information on classification, recent studies, and adverse effects on the environment and human health of the main classes of contaminants. Emerging contaminants are synthetic or natural compounds and microorganisms produced and used by humans that cause adverse ecological and human health effects when they reach the environment. This book is organized into four sections that cover the classification of contaminants and the instrumental techniques used to quantify them, recent studies on pesticides, antibiotics as an important group of emerging contaminants, and studies of different classes of emerging contaminants such as polybrominated diphenyl ethers (PBDEs), microplastics, and others.

Author: Perrin Walker
Publisher: CRC Press
ISBN: 9781439822531
Category : Science
Languages : en
Pages : 1434

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Book Description
This publication presents cleaning and etching solutions, their applications, and results on inorganic materials. It is a comprehensive collection of etching and cleaning solutions in a single source. Chemical formulas are presented in one of three standard formats - general, electrolytic or ionized gas formats - to insure inclusion of all necessary operational data as shown in references that accompany each numbered formula. The book describes other applications of specific solutions, including their use on other metals or metallic compounds. Physical properties, association of natural and man-made minerals, and materials are shown in relationship to crystal structure, special processing techniques and solid state devices and assemblies fabricated. This publication also presents a number of organic materials which are widely used in handling and general processing...waxes, plastics, and lacquers for example. It is useful to individuals involved in study, development, and processing of metals and metallic compounds. It is invaluable for readers from the college level to industrial R & D and full-scale device fabrication, testing and sales. Scientific disciplines, work areas and individuals with great interest include: chemistry, physics, metallurgy, geology, solid state, ceramic and glass, research libraries, individuals dealing with chemical processing of inorganic materials, societies and schools.

Author: Edward Ghali
Publisher: John Wiley & Sons
ISBN: 0470024038
Category : Science
Languages : en
Pages : 574

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Book Description
Corrosion Prevention and Protection: Practical Solutions presents a functional approach to the various forms of corrosion, such as uniform corrosion, pitting corrosion, crevice corrosion, galvanic corrosion, stress corrosion, hydrogen-induced damage, sulphide stress cracking, erosion-corrosion, and corrosion fatigue in various industrial environments. The book is split into two parts. The first, consisting of five chapters: Introduction and Principles (Fundamentals) of Corrosion Corrosion Testing, Detection, Monitoring and Failure Analysis Regulations, Specifications and Safety Materials: Metals, Alloys, Steels and Plastics Corrosion Economics and Corrosion Management The second part of the book consists of two chapters which present: a discussion of corrosion reactions, media, active and active-passive corrosion behaviour and the various forms of corrosion, a collection of case histories and practical solutions which span a wide range of industrial problems in a variety of frequently encountered environments, including statues & monuments, corrosion problems in metallurgical and mineral processing plants, boilers, heat exchangers and cooling towers, aluminum and copper alloys, galvanized steel structures as well as hydrogeological environmental corrosion This text is relevant to researchers and practitioners, engineers and chemists, working in corrosion in industry, government laboratories and academia. It is also suitable as a course text for engineering students as well as libraries related to chemical and chemical engineering institutes and research departments.

Author: Pierre Roberge
Publisher: McGraw Hill Professional
ISBN: 0071482431
Category : Technology & Engineering
Languages : en
Pages : 770

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Book Description
The Latest Methods for Preventing and Controlling Corrosion in All Types of Materials and Applications Now you can turn to Corrosion Engineering for expert coverage of the theory and current practices you need to understand water, atmospheric, and high-temperature corrosion processes. This comprehensive resource explains step-by-step how to prevent and control corrosion in all types of metallic materials and applications-from steel and aluminum structures to pipelines. Filled with 300 illustrations, this skills-building guide shows you how to utilize advanced inspection and monitoring methods for corrosion problems in infrastructure, process and food industries, manufacturing, and military industries. Authoritative and complete, Corrosion Engineering features: Expert guidance on corrosion prevention and control techniques Hands-on methods for inspection and monitoring of corrosion problems New methods for dealing with corrosion A review of current practice, with numerous examples and calculations Inside This Cutting-Edge Guide to Corrosion Prevention and Control • Introduction: Scope and Language of Corrosion • Electrochemistry of Corrosion • Environments: Atmospheric Corrosion • Corrosion by Water and Steam • Corrosion in Soils • Reinforced Concrete • High-Temperature Corrosion • Materials and How They Corrode: Engineering Materials • Forms of Corrosion • Methods of Control: Protective Coatings • Cathodic Protection • Corrosion Inhibitors • Failure Analysis and Design Considerations • Testing and Monitoring: Corrosion Testing and Monitoring

Author: Yuzhuo Li
Publisher: John Wiley & Sons
ISBN: 0471719196
Category : Technology & Engineering
Languages : en
Pages : 764

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Book Description
An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization: * Provides in-depth coverage of a wide range of state-of-the-art technologies and applications * Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips * Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP * Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP * Provides a perspective on the opportunities and challenges of the next fifteen years Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes.