Author: Jian Xing
Publisher:
ISBN:
Category :
Languages : en
Pages : 192
Book Description
Computer Simulation of Diamond Film Growth by Chemical Vapor Deposition Using Monte Carlo Method
Atomic-scale Kinetic Monte Carlo Simulations of Diamond Chemical Vapor Deposition
Author: Corbett Chandler Battaile
Publisher:
ISBN:
Category :
Languages : en
Pages : 372
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 372
Book Description
Kinetic Monte Carlo Simulation of Chemical Vapor Deposition Growth of Thin Films
Diamond Films
Author: Koji Kobashi
Publisher: Elsevier
ISBN: 0080525571
Category : Science
Languages : en
Pages : 350
Book Description
- Discusses the most advanced techniques for diamond growth - Assists diamond researchers in deciding on the most suitable process conditions - Inspires readers to devise new CVD (chemical vapor deposition Ever since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films.
Publisher: Elsevier
ISBN: 0080525571
Category : Science
Languages : en
Pages : 350
Book Description
- Discusses the most advanced techniques for diamond growth - Assists diamond researchers in deciding on the most suitable process conditions - Inspires readers to devise new CVD (chemical vapor deposition Ever since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films.
Monte Carlo Computer Simulation of Deposition and Epitaxial Growth in Multicomponent Systems
Author: Christopher Paul Burmester
Publisher:
ISBN:
Category :
Languages : en
Pages : 230
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 230
Book Description
Diamond Chemical Vapor Deposition
Author: Huimin Liu
Publisher: Elsevier
ISBN: 0815516878
Category : Technology & Engineering
Languages : en
Pages : 207
Book Description
This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experiences researchers, scientists, and engineers in academia and industry with the latest developments in this growing field.
Publisher: Elsevier
ISBN: 0815516878
Category : Technology & Engineering
Languages : en
Pages : 207
Book Description
This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experiences researchers, scientists, and engineers in academia and industry with the latest developments in this growing field.
Molecular and Microstructure Scale Models of CVD Diamond Growth
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 9
Book Description
This project developed atomistic and microstructural models for the growth of polycrystalline thin films. The atomistic simulations were based upon the kinetic Monte Carlo method and employed experimental and first-principles data for different surface reactions. The models predict the atomic structure of the film, the surface structure, point defect incorporation and the growth rate of different surfaces. The microstructural models employ the atomistic simulation predictions of growth rate for different surfaces to track the evolution of an ensemble of 1000 grains during film growth under a wide range of growth conditions. This model predicts the grain structure, grain size, surface roughness, crystallographic texture, etc. Both of these models were also used to show how to optimize diamond film growth.
Publisher:
ISBN:
Category :
Languages : en
Pages : 9
Book Description
This project developed atomistic and microstructural models for the growth of polycrystalline thin films. The atomistic simulations were based upon the kinetic Monte Carlo method and employed experimental and first-principles data for different surface reactions. The models predict the atomic structure of the film, the surface structure, point defect incorporation and the growth rate of different surfaces. The microstructural models employ the atomistic simulation predictions of growth rate for different surfaces to track the evolution of an ensemble of 1000 grains during film growth under a wide range of growth conditions. This model predicts the grain structure, grain size, surface roughness, crystallographic texture, etc. Both of these models were also used to show how to optimize diamond film growth.
Chemical Vapor Deposition Modeling Using Direct Simulation Monte Carlo with Non-linear Chemistry and Level Set Profile Evolution
Author: Husain Ali Al-Mohssen
Publisher:
ISBN:
Category :
Languages : en
Pages : 69
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 69
Book Description
Modelling {100} CVD Diamond Growth Using Kinetic Monte Carlo
Computational Mechanics ’95
Author: S.N. Atluri
Publisher: Springer Science & Business Media
ISBN: 3642796540
Category : Technology & Engineering
Languages : en
Pages : 3181
Book Description
AI!, in the earlier conferences (Tokyo, 1986; Atlanta, 1988, Melbourne, 1991; and Hong Kong, 1992) the response to the call for presentations at ICES-95 in Hawaii has been overwhelming. A very careful screening of the extended abstracts resulted in about 500 paper being accepted for presentation. Out of these, written versions of about 480 papers reached the conference secretariat in Atlanta in time for inclusion in these proceedings. The topics covered at ICES-95 range over the broadest spectrum of computational engineering science. The editors thank the international scientific committee, for their advice and encouragement in making ICES-95 a successful scientific event. Special thanks are expressed to the International Association for Boundary Elements Methods for hosting IABEM-95 in conjunction with ICES-95. The editors here express their deepest gratitude to Ms. Stacy Morgan for her careful handling of a myriad of details of ICES-95, often times under severe time constraints. The editors hope that the readers of this proceedings will find a kaleidoscopic view of computational engineering in the year 1995, as practiced in various parts of the world. Satya N. Atluri Atlanta, Georgia, USA Genki Yagawa Tokyo,Japan Thomas A. Cruse Nashville, TN, USA Organizing Committee Professor Genki Yagawa, University of Tokyo, Japan, Chair Professor Satya Atluri, Georgia Institute of Technology, U.S.A.
Publisher: Springer Science & Business Media
ISBN: 3642796540
Category : Technology & Engineering
Languages : en
Pages : 3181
Book Description
AI!, in the earlier conferences (Tokyo, 1986; Atlanta, 1988, Melbourne, 1991; and Hong Kong, 1992) the response to the call for presentations at ICES-95 in Hawaii has been overwhelming. A very careful screening of the extended abstracts resulted in about 500 paper being accepted for presentation. Out of these, written versions of about 480 papers reached the conference secretariat in Atlanta in time for inclusion in these proceedings. The topics covered at ICES-95 range over the broadest spectrum of computational engineering science. The editors thank the international scientific committee, for their advice and encouragement in making ICES-95 a successful scientific event. Special thanks are expressed to the International Association for Boundary Elements Methods for hosting IABEM-95 in conjunction with ICES-95. The editors here express their deepest gratitude to Ms. Stacy Morgan for her careful handling of a myriad of details of ICES-95, often times under severe time constraints. The editors hope that the readers of this proceedings will find a kaleidoscopic view of computational engineering in the year 1995, as practiced in various parts of the world. Satya N. Atluri Atlanta, Georgia, USA Genki Yagawa Tokyo,Japan Thomas A. Cruse Nashville, TN, USA Organizing Committee Professor Genki Yagawa, University of Tokyo, Japan, Chair Professor Satya Atluri, Georgia Institute of Technology, U.S.A.