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Author: Jorge Rocca Publisher: Springer ISBN: 3319195212 Category : Science Languages : en Pages : 415
Book Description
These proceedings comprise invited and contributed papers presented at the 14th International Conference on X-Ray Lasers (ICXRL 2014). This conference is part of a continuing series dedicated to recent developments and applications of x-ray lasers and other coherent x-ray sources with attention to supporting technologies and instrumentation. New results in the generation of intense, coherent x-rays and progress toward practical devices and their applications in numerous fields are reported. Areas of research in plasma-based x-ray lasers, 4th generation accelerator-based sources and higher harmonic generation, and other x-ray generation schemes are covered. The scope of ICXRL 2014 included, but was not limited to: Laser-pumped X-ray lasers Discharge excitation and other X-ray laser pumping methods Injection/seeding of X-ray amplifiers New lasing transitions and novel X-ray laser schemes High Harmonic sources-Free-electron laser generation in the XUV and X-ray range Novel schemes for coherent XUV and X-ray generation XUV and X-ray optics and metrology-Driving laser technology Theory and modeling of X-ray gain medium and beam characteristics Applications of high brightness and ultrashort X-ray sources
Author: Jorge Rocca Publisher: Springer ISBN: 3319195212 Category : Science Languages : en Pages : 415
Book Description
These proceedings comprise invited and contributed papers presented at the 14th International Conference on X-Ray Lasers (ICXRL 2014). This conference is part of a continuing series dedicated to recent developments and applications of x-ray lasers and other coherent x-ray sources with attention to supporting technologies and instrumentation. New results in the generation of intense, coherent x-rays and progress toward practical devices and their applications in numerous fields are reported. Areas of research in plasma-based x-ray lasers, 4th generation accelerator-based sources and higher harmonic generation, and other x-ray generation schemes are covered. The scope of ICXRL 2014 included, but was not limited to: Laser-pumped X-ray lasers Discharge excitation and other X-ray laser pumping methods Injection/seeding of X-ray amplifiers New lasing transitions and novel X-ray laser schemes High Harmonic sources-Free-electron laser generation in the XUV and X-ray range Novel schemes for coherent XUV and X-ray generation XUV and X-ray optics and metrology-Driving laser technology Theory and modeling of X-ray gain medium and beam characteristics Applications of high brightness and ultrashort X-ray sources
Author: David Attwood Publisher: Cambridge University Press ISBN: 1139643428 Category : Technology & Engineering Languages : en Pages : 611
Book Description
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Author: Claude Phipps Publisher: Springer Science & Business Media ISBN: 0387304525 Category : Science Languages : en Pages : 598
Book Description
Laser ablation describes the interaction of intense optical fields with matter, in which atoms are selectively driven off by thermal or nonthermal mechanisms. The field of laser ablation physics is advancing so rapidly that its principal results are seen only in specialized journals and conferences. This is the first book that combines the most recent results in this rapidly advancing field with authoritative treatment of laser ablation and its applications, including the physics of high-power laser-matter interaction. Many practical applications exist, ranging from inertial confinement fusion to propulsion of aerostats for pollution monitoring to laser ignition of hypersonic engines to laser cleaning nanoscale contaminants in high-volume computer hard drive manufacture to direct observation of the electronic or dissociative states in atoms and molecules, to studying the properties of materials during 200kbar shocks developed in 200fs. Selecting topics which are representative of such a broad field is difficult. Laser Ablation and its Applications emphasizes the wide range of these topics rather than - as is so often the case in advanced science – focusing on one specialty or discipline. The book is divided into four sections: theory and modeling, ultrafast interactions, material processing and laser-matter interaction in novel regimes. The latter range from MALDI to ICF, SNOM’s and femtosecond nanosurgery to laser space propulsion. The book arose from the SPIE series of High Power Laser Ablation Symposia which began in 1998. It is intended for a graduate course in laser interactions with plasmas and materials, but it should be accessible to anyone with a graduate degree in physics or engineering. It is also intended as a major reference work to familiarize scientists just entering the field with laser ablation and its applications.
Author: Publisher: ISBN: Category : Optical instruments Languages : en Pages : 892
Book Description
Publishes papers reporting on research and development in optical science and engineering and the practical applications of known optical science, engineering, and technology.
Author: Ampere A. Tseng Publisher: World Scientific ISBN: 9812790896 Category : Technology & Engineering Languages : en Pages : 583
Book Description
Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students. Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices. Sample Chapter(s). Chapter 1: Atom, Molecule, and Nanocluster Manipulations for Nanostructure Fabrication Using Scanning Probe Microscopy (3,320 KB). Contents: Atomic Force Microscope Lithography (N Kawasegi et al.); Nanowire Assembly and Integration (Z Gu & D H Gracias); Extreme Ultraviolet Lithography (H Kinoshita); Electron Projection Lithography (T Miura et al.); Electron Beam Direct Writing (K Yamazaki); Electron Beam Induced Deposition (K Mitsuishi); Focused Ion Beams and Interaction with Solids (T Ishitani et al.); Nanofabrication of Nanoelectromechanical Systems (NEMS): Emerging Techniques (K L Ekinci & J Brugger); and other papers. Readership: Researchers, professionals, and graduate students in the fields of nanoengineering and nanoscience.
Author: David G. Seiler Publisher: American Institute of Physics ISBN: Category : Computers Languages : en Pages : 868
Book Description
The worldwide semiconductor community faces increasingly difficult challenges as it moves into the manufacturing of chips with feature sizes approaching 100 nm and beyond. The magnitude of these challenges demands special attention from the metrology and analytical measurements community. New paradigms must be found. Adequate research and development for new metrology concepts are urgently needed. Topics include: integrated circuit history, challenges and overviews, front end, lithography, interconnect and back end, and critical analytical techniques. Characterization and metrology are key enablers for developing new semiconductor technology and in improving manufacturing. This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continue the advances in semiconductor technology. It covers major aspects of process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics. The editors believe that this book of collected papers provides a concise and effective portrayal of industry characterization needs and the way they are being addressed by industry, academia, and government to continue the dramatic progress in semiconductor technology. Hopefully, it will also provide a basis for stimulating advances in metrology and new ideas for research and development.
Author: Stephen W. Paddock Publisher: Springer Science & Business Media ISBN: 159259722X Category : Science Languages : en Pages : 446
Book Description
In Confocal Microscopy Methods and Protocols, Stephen Paddock and a highly skilled panel of experts lead the researcher using confocal techniques from the bench top, through the imaging process, to the journal page. They concisely describe all the key stages of confocal imaging-from tissue sampling methods, through the staining process, to the manipulation, presentation, and publication of the realized image. Written in a user-friendly, nontechnical style, the methods specifically cover most of the commonly used model organisms: worms, sea urchins, flies, plants, yeast, frogs, and zebrafish. Centered in the many biological applications of the confocal microscope, the book makes possible the successful imaging of both fixed and living specimens using primarily the laser scanning confocal microscope. The powerful hands-on methods collected in Confocal Microscopy Methods and Protocols will help even the novice to produce first-class cover-quality confocal images.
Author: Joseph R. Lakowicz Publisher: Springer Science & Business Media ISBN: 0387463127 Category : Science Languages : en Pages : 961
Book Description
The third edition of this established classic text reference builds upon the strengths of its very popular predecessors. Organized as a broadly useful textbook Principles of Fluorescence Spectroscopy, 3rd edition maintains its emphasis on basics, while updating the examples to include recent results from the scientific literature. The third edition includes new chapters on single molecule detection, fluorescence correlation spectroscopy, novel probes and radiative decay engineering. Includes a link to Springer Extras to download files reproducing all book artwork, for easy use in lecture slides. This is an essential volume for students, researchers, and industry professionals in biophysics, biochemistry, biotechnology, bioengineering, biology and medicine.
Author: Jorge Rocca
Author: Jorge Rocca
Author: David Attwood
Author: Claude Phipps
Author: 
Author: Ampere A. Tseng
Author: David G. Seiler
Author: Stephen W. Paddock
Author: 
Author: 
Author: Joseph R. Lakowicz