Author: S. R. Steele
Publisher:
ISBN:
Category :
Languages : en
Pages : 54
Book Description
The objectives of this program include: (a) The investigation of some of the specific applications of currently available CVD materials in electron tubes, (b) The preparation of improved CVD materials which appear to be potentially valuable for future use in electron tubes. (Author).
Chemical Vapor Deposited Materials for Electron Tubes
Author: S. R. Steele
Publisher:
ISBN:
Category :
Languages : en
Pages : 54
Book Description
The objectives of this program include: (a) The investigation of some of the specific applications of currently available CVD materials in electron tubes, (b) The preparation of improved CVD materials which appear to be potentially valuable for future use in electron tubes. (Author).
Publisher:
ISBN:
Category :
Languages : en
Pages : 54
Book Description
The objectives of this program include: (a) The investigation of some of the specific applications of currently available CVD materials in electron tubes, (b) The preparation of improved CVD materials which appear to be potentially valuable for future use in electron tubes. (Author).
Technical Abstract Bulletin
Author: Defense Documentation Center (U.S.)
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 784
Book Description
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 784
Book Description
Chemical Vapor Deposition
Author: Srinivasan Sivaram
Publisher: Springer Science & Business Media
ISBN: 1475747519
Category : Technology & Engineering
Languages : en
Pages : 302
Book Description
In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Publisher: Springer Science & Business Media
ISBN: 1475747519
Category : Technology & Engineering
Languages : en
Pages : 302
Book Description
In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Scientific and Technical Aerospace Reports
Government-wide Index to Federal Research & Development Reports
Author:
Publisher:
ISBN:
Category : Government publications
Languages : en
Pages : 1470
Book Description
Publisher:
ISBN:
Category : Government publications
Languages : en
Pages : 1470
Book Description
Chemical Vapor Deposition: 1960-1980
Author: Donald T. Hawkins
Publisher: Springer
ISBN:
Category : Reference
Languages : en
Pages : 762
Book Description
Publisher: Springer
ISBN:
Category : Reference
Languages : en
Pages : 762
Book Description
Chemical Vapor Deposition
Author: John Milton Blocher
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 426
Book Description
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 426
Book Description
Handbook of Chemical Vapor Deposition
Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 1437744885
Category : Technology & Engineering
Languages : en
Pages : 459
Book Description
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Publisher: William Andrew
ISBN: 1437744885
Category : Technology & Engineering
Languages : en
Pages : 459
Book Description
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Metal Finishing Abstracts
Author:
Publisher:
ISBN:
Category : Finishes and finishing
Languages : en
Pages : 542
Book Description
Publisher:
ISBN:
Category : Finishes and finishing
Languages : en
Pages : 542
Book Description