Atomic Layer Deposition for Semiconductors PDF Download

Author: Cheol Seong Hwang
Publisher: Springer Science & Business Media
ISBN: 146148054X
Category : Science
Languages : en
Pages : 266

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Book Description
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Author: Nicola Pinna
Publisher: John Wiley & Sons
ISBN: 3527639926
Category : Technology & Engineering
Languages : en
Pages : 463

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Book Description
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Author: Bert Sels
Publisher: John Wiley & Sons
ISBN: 3527699813
Category : Technology & Engineering
Languages : en
Pages : 1500

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Book Description
Reflecting the R&D efforts in the field that have resulted in a plethora of novel applications over the past decade, this handbook gives a comprehensive overview of the tangible benefits of nanotechnology in catalysis. By bridging fundamental research and industrial development, it provides a unique perspective on this scientifically and economically important field. While the first three parts are devoted to preparation and characterization of nanocatalysts, the final three provide in-depth insights into their applications in the fine chemicals industry, the energy industry, and for environmental protection, with expert authors reporting on real-life applications that are on the brink of commercialization. Timely reading for catalytic chemists, materials scientists, chemists in industry, and process engineers.

Author: Anthony C. Jones
Publisher: Royal Society of Chemistry
ISBN: 0854044655
Category : Science
Languages : en
Pages : 600

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Book Description
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket

Author: Ulrich Heiz
Publisher: Springer Science & Business Media
ISBN: 3540326464
Category : Technology & Engineering
Languages : en
Pages : 514

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Book Description
Nanocatalysis, a subdiscipline of nanoscience, seeks to control chemical reactions by changing the size, dimensionality, chemical composition, and morphology of the reaction center and by changing the kinetics using nanopatterning of the reaction center. This book offers a detailed pedagogical and methodological overview of the field. Readers discover many examples of current research, helping them explore new and emerging applications.

Author: Bert F. Sels
Publisher: John Wiley & Sons
ISBN: 3527339140
Category : Technology & Engineering
Languages : en
Pages : 1180

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Book Description
Dieses Handbuch präsentiert die in den letzten zehn Jahren entstandenen neuen Anwendungsbereiche und gibt einen umfassenden Überblick über dieses wissenschaftlich und ökonomisch wichtige Gebiet. Einzigartig ist die Verbindung von Grundlagenforschung und industrieller Entwicklung.

Author: David Cameron
Publisher: MDPI
ISBN: 3039366521
Category : Science
Languages : en
Pages : 142

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Book Description
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing – known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics.

Author: Sunil S Joshi
Publisher: Elsevier
ISBN: 0128016701
Category : Technology & Engineering
Languages : en
Pages : 784

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Book Description
Industrial Catalytic Processes for Fine and Specialty Chemicals provides a comprehensive methodology and state-of-the art toolbox for industrial catalysis. The book begins by introducing the reader to the interesting, challenging, and important field of catalysis and catalytic processes. The fundamentals of catalysis and catalytic processes are fully covered before delving into the important industrial applications of catalysis and catalytic processes, with an emphasis on green and sustainable technologies. Several case studies illustrate new and sustainable ways of designing catalysts and catalytic processes. The intended audience of the book includes researchers in academia and industry, as well as chemical engineers, process development chemists, and technologists working in chemical industries and industrial research laboratories. - Discusses the fundamentals of catalytic processes, catalyst preparation and characterization, and reaction engineering - Outlines the homogeneous catalytic processes as they apply to specialty chemicals - Introduces industrial catalysis and catalytic processes for fine chemicals - Includes a number of case studies to demonstrate the various processes and methods for designing green catalysts

Author: Oluwatobi Adeleke
Publisher: CRC Press
ISBN: 1003803334
Category : Technology & Engineering
Languages : en
Pages : 353

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Book Description
While thin film technology has benefited greatly from artificial intelligence (AI) and machine learning (ML) techniques, there is still much to be learned from a full-scale exploration of these technologies in atomic layer deposition (ALD). This book provides in-depth information regarding the application of ML-based modeling techniques in thin film technology as a standalone approach and integrated with the classical simulation and modeling methods. It is the first of its kind to present detailed information regarding approaches in ML-based modeling, optimization, and prediction of the behaviors and characteristics of ALD for improved process quality control and discovery of new materials. As such, this book fills significant knowledge gaps in the existing resources as it provides extensive information on ML and its applications in film thin technology. Offers an in-depth overview of the fundamentals of thin film technology, state-of-the-art computational simulation approaches in ALD, ML techniques, algorithms, applications, and challenges. Establishes the need for and significance of ML applications in ALD while introducing integration approaches for ML techniques with computation simulation approaches. Explores the application of key techniques in ML, such as predictive analysis, classification techniques, feature engineering, image processing capability, and microstructural analysis of deep learning algorithms and generative model benefits in ALD. Helps readers gain a holistic understanding of the exciting applications of ML-based solutions to ALD problems and apply them to real-world issues. Aimed at materials scientists and engineers, this book fills significant knowledge gaps in existing resources as it provides extensive information on ML and its applications in film thin technology. It also opens space for future intensive research and intriguing opportunities for ML-enhanced ALD processes, which scale from academic to industrial applications. . .

Author: Philippe Serp
Publisher: Wiley-VCH
ISBN: 9783527348442
Category : Technology & Engineering
Languages : en
Pages : 688

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Book Description
b”Supported Metal Single Atom CatalysisCovers all key aspects of supported metal single atom catalysts, an invaluable resource for academic researchers and industry professionals alike Single atom catalysis is one of the most innovative and dynamic research areas in catalysis science. Supported metal catalysts are used extensively across the chemical industry, ranging from fine and bulk chemical production to petrochemicals. Single atom catalysts (SACs) combine the advantages of both homogeneous and heterogeneous catalysts such as catalyst stability, activity, and high dispersion of the active phase. Supported Metal Single Atom Catalysis provides an authoritative and up-to-date overview of the emerging field, covering the synthesis, preparation, characterization, modeling, and applications of SACs. This comprehensive volume introduces the basic principles of single atom catalysis, describes metal oxide and carbon support materials for SAC preparation, presents characterization techniques and theoretical calculations, and discusses SACs in areas including selective hydrogenation, oxidation reactions, activation of small molecules, C-C bond formation, and biomedical applications. Highlights the activity, selectivity, and stability advantages of supported metal SACs compared to other heterogeneous catalysts Covers applications of SACs in thermal catalysis, electrocatalysis, and photocatalysis Includes chapters on single atom alloys and supported double and triple metal atom catalysts Discusses the prospects, challenges, and potential industrial applications of SACs Supported Metal Single Atom Catalysis is an indispensable reference for all those working in the fields of catalysis, solid-state chemistry, materials science, and spectroscopy, including catalytic chemists, organic chemists, electrochemists, theoretical chemists, and industrial chemists.