Bias and Substrate Effects on the Vapor Phase Growth on Diamond Thin Films PDF Download

Author: Yong-Hee Lee
Publisher:
ISBN:
Category :
Languages : en
Pages : 326

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Author: Huimin Liu
Publisher: Elsevier
ISBN: 0815516878
Category : Technology & Engineering
Languages : en
Pages : 207

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This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experiences researchers, scientists, and engineers in academia and industry with the latest developments in this growing field.

Author: Koji Kobashi
Publisher: Elsevier
ISBN: 0080525571
Category : Science
Languages : en
Pages : 350

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Book Description
- Discusses the most advanced techniques for diamond growth - Assists diamond researchers in deciding on the most suitable process conditions - Inspires readers to devise new CVD (chemical vapor deposition Ever since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films.

Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :

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Chemical vapor deposition (CVD) has been the main method for synthesizing diamond thin films on hetero substrate materials since 1980s. It has been well acknowledged that both nucleation and growth of diamond on non-diamond surfaces without pre-treatment are very difficult and slow. Furthermore, the weak adhesion between the diamond thin films and substrates has been a major problem for widespread application of diamond thin films. Up to now, Si has been the most frequently used substrate for the study of diamond thin films and various methods, including bias and diamond powder scratching, have been applied to enhance diamond nucleation density. In the present study, nucleation and growth of diamond thin films on Ti3SiC2, a newly developed ceramic-metallic material, using Microwave Plasma Enhanced (MPE) and Hot-Filament (HF) CVD reactors were carried out. In addition, synchrotron-based Near Edge Extended X-Ray Absorption Fine Structure Spectroscopy (NEXAFS) was used to identify the electronic and chemical structures of various NCD films. The results from MPECVD showed that a much higher diamond nucleation density and a much higher film growth rate can be obtained on Ti3SiC2 compared with on Si. Consequently, nanocrystalline diamond (NCD) thin films were feasibly synthesized on Ti3SiC2 under the typical conditions for microcrystalline diamond film synthesis. Furthermore, the diamond films on Ti3SiC2 exhibited better adhesion than on Si. The early stage growth of diamond thin films on Ti3SiC2 by HFCVD indicated that a nanowhisker-like diamond-graphite composite layer, different from diamond nucleation on Si, initially formed on the surface of Ti3SiC2, which resulted in high diamond nucleation density. These results indicate that Ti3SiC2 has great potentials to be used both as substrates and interlayers on metals for diamond thin film deposition and application. This research may greatly expand the tribological application of both Ti3SiC2 and diamond thin films. The re.

Author: Ashok Kumar Dua
Publisher: Trans Tech Publications Ltd
ISBN: 3035706352
Category : Technology & Engineering
Languages : en
Pages : 110

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Diamond, as well as being a precious gem, is a versatile material par excellence. No other material comes anywhere near to matching its properties, which are both extreme, and also expressed in rare combinations. However, natural diamonds, and those synthesised under high sandpressure temperatures, are too expensive or small for many technological applications. These limitations can be overcome by using large-area diamond coatings; chemically bonded to inexpensive non-diamond surfaces. The consequent economic advantages provide the driving force for much diamond-related research and technology.

Author: John Michael Larson
Publisher:
ISBN:
Category :
Languages : en
Pages : 512

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Author: Christopher Nebel
Publisher: Academic Press
ISBN: 0080541038
Category : Technology & Engineering
Languages : en
Pages : 481

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This volume reviews the state of the art of thin film diamond, a very promising new semiconductor that may one day rival silicon as the material of choice for electronics. Diamond has the following important characteristics; it is resistant to radiation damage, chemically inert and biocompatible and it will become "the material" for bio-electronics, in-vivo applications, radiation detectors and high-frequency devices. Thin-Film Diamond is the first book to summarize state of the art of CVD diamond in depth. It covers the most recent results regarding growth and structural properties, doping and defect characterization, hydrogen in and on diamond as well as surface properties in general, applications of diamond in electrochemistry, as detectors, and in surface acoustic wave devices.· Accessible by both experts and non-experts in the field of semi-conductors research and technology, each chapter is written in a tutorial format· Helping engineers to manufacture devices with optimized electronic properties· Truly international, this volume contains chapters written by recognized experts representing academic and industrial institutions from Europe, Japan and the US

Author: Peter Gielisse
Publisher: CRC Press
ISBN: 9781566766555
Category : Technology & Engineering
Languages : en
Pages : 520

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Book Description
This text covers nucleation and growth; modeling and phase equilibria; properties characterisation; diamond-like carbon; and wide bandgap nitrides and carbides of Diamond and Diamond-Film applications as presented as the proceedings of the third international symposium on Diamond Films in St.Petersburg, Russia June 16-19, 1996

Author: Ashok Kumar Dua
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 118

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Book Description
Dua, former head of the materials science section at the Bhabha Atomic Research Center in India, examines the past, present, and future of diamond thin films. He details their methods of preparation and characterization, and the mechanisms of nucleation, growth, and epitaxy of CVD diamond. Reactor-scale modeling, in situ diagnostics, and the processing of diamond films are some other topics covered. Concluding chapters look ahead to expected applications, recent developments, and new ideas in the field. There is no subject index. Annotation : 2004 Book News, Inc., Portland, OR (booknews.com).

Author: John I. B. Wilson
Publisher: Wiley-VCH
ISBN:
Category : Science
Languages : en
Pages : 494

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Book Description
This volume brings together some of the key components in what is an exciting scientific and technical challenge: to establish diamond as an engineering material that will revolutionise operations in optics, mechanics and electronics. The collection of papers gives a "snapshot" of a rapidly developing subject. It should attract comments and thoughts from those that have not previously considered thin-film diamond to be a maturing subject, as well as being stimulating to all of them already working in the area.