Author: Ali Foroughi AbariPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages :
Book Description
Atomic Layer Deposition of Metal Oxide Thin Films on Metallic Substrates
Author: Ali Foroughi AbariPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages :
Book Description
Atomic Layer Deposition of Metal Oxide Thin Films
Author: Dennis Michael HausmannPublisher:
ISBN:
Category : Thin film devices
Languages : en
Pages : 350
Book Description
Atomic Layer Deposition of Metal Oxide and Nitride Thin Films [microform]
![Atomic Layer Deposition of Metal Oxide and Nitride Thin Films [microform] PDF](https://books.google.com/books/content/images/frontcover/8hsXnQEACAAJ?fife=w80-h100)
Author: Becker, Jill SvenjaPublisher: Ann Arbor, Mich. : University Microfilms International
ISBN:
Category : Thin film devices
Languages : en
Pages : 308
Book Description
Atomic Layer Deposition for Semiconductors
Author: Cheol Seong HwangPublisher: Springer Science & Business Media
ISBN: 146148054X
Category : Science
Languages : en
Pages : 266
Book Description
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Atomic Layer Deposition and Characterization of Metal Oxide Thin Films
Author: Ali MahmoodinezhadAtomic Layer Deposition
Author: Tommi KääriäinenPublisher: John Wiley & Sons
ISBN: 1118062779
Category : Technology & Engineering
Languages : en
Pages : 274
Book Description
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Chemical Vapour Deposition
Author: Anthony C. JonesPublisher: Royal Society of Chemistry
ISBN: 0854044655
Category : Science
Languages : en
Pages : 600
Book Description
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
Mechanistic Insight and Properties of Metal Oxide Thin Films Deposited Via Atomic Layer Deposition
Author: Benjamin PeekChemical Vapor Deposition and Atomic Layer Deposition of Metal Oxide and Nitride Thin Films
Author: Jeffrey Thomas BartonPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 276
Book Description
Handbook of Manufacturing Engineering and Technology
Author: Andrew Y. C. NeePublisher: Springer
ISBN: 9781447146698
Category : Technology & Engineering
Languages : en
Pages : 0
Book Description
The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.