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Author: Becker, Jill SvenjaPublisher: Ann Arbor, Mich. : University Microfilms International
ISBN:
Category : Thin film devices
Languages : en
Pages : 308
Book Description
Atomic Layer Deposition of Metal Oxide and Nitride Thin Films [microform]
![Atomic Layer Deposition of Metal Oxide and Nitride Thin Films [microform] PDF](https://books.google.com/books/content/images/frontcover/8hsXnQEACAAJ?fife=w80-h100)
Author: Becker, Jill SvenjaPublisher: Ann Arbor, Mich. : University Microfilms International
ISBN:
Category : Thin film devices
Languages : en
Pages : 308
Book Description
Chemical Vapor Deposition and Atomic Layer Deposition of Metal Oxide and Nitride Thin Films
Author: Jeffrey Thomas BartonPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 276
Book Description
Atomic Layer Deposition of Metal Oxide Thin Films
Author: Dennis Michael HausmannPublisher:
ISBN:
Category : Thin film devices
Languages : en
Pages : 350
Book Description
Atomic Layer Deposition
Author: Tommi KääriäinenPublisher: John Wiley & Sons
ISBN: 1118062779
Category : Technology & Engineering
Languages : en
Pages : 274
Book Description
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Atomic Layer Deposition and Characterization of Metal Oxide Thin Films
Author: Ali MahmoodinezhadAtomic Layer Deposition of Metal Oxide Thin Films on Metallic Substrates
Author: Ali Foroughi AbariPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages :
Book Description
Atomic Layer Deposition of Metal and Transition Metal Nitride Thin Films and in Situ Mass Spectrometry Studies
Author: Marika JuppoPublisher:
ISBN: 9789521002212
Category :
Languages : en
Pages : 65
Book Description
From Novel Processes to Industry-Relevant Applications
Author: Eric Christopher StevensPublisher:
ISBN:
Category :
Languages : en
Pages : 215
Book Description
Atomic Layer Deposition (ALD)
Author: Jeannie ValdezPublisher:
ISBN: 9781634839204
Category : TECHNOLOGY & ENGINEERING
Languages : en
Pages : 183
Book Description
Atomic layer deposition (ALD) is a thin film deposition technique used in the mass production of microelectronics. In this book, novel nonvolatile memory devices are discussed. The chapters examine the low-temperature fabrication process of single-crystal platinum non-thin films using plasma-enhanced atomic layer deposition (PEALD). A comprehensive review of ALD surface coatings for battery systems is provided, as well as a theoretical calculation on the mechanism of thermal and plasma-enhanced atomic layer deposition of SiO2; and fluorine doping behavior in Zn-based conducting oxide film grown by ALD.
Atomic Layer Deposition of Nanostructured Materials
Author: Nicola PinnaPublisher: John Wiley & Sons
ISBN: 3527639934
Category : Technology & Engineering
Languages : en
Pages : 472
Book Description
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.