Author: Publisher:
ISBN:
Category :
Languages : en
Pages : 454
Book Description
Aerosol Assisted Chemical Vapour Deposition of Tungsten and Molybdenum Oxide Thin Films
Author: Aerosol Assisted Chemical Vapour Deposition of Titanium Dioxide and Tungsten Oxide Thin Films
Author: Aerosol Assisted Chemical Vapour Deposition of Titanium Dioxide and Tungsten Oxide Thin Films
Author: Cynthia EdusiChemical Vapour Deposition of Tungsten Oxide Thin Films from Single-source Procursors
Author: Characteristics of Aerosol Assisted and Conventional Chemical Vapour Deposition of Metal Oxide Thin Films on Glass, with Or Without Metal Dopants
Author: Gillian WaltersNanomaterials via Single-Source Precursors
Author: Allen W. ApblettPublisher: Elsevier
ISBN: 0128203447
Category : Technology & Engineering
Languages : en
Pages : 630
Book Description
Nanomaterials via Single-Source Precursors: Synthesis, Processing and Applications presents recent results and overviews of synthesis, processing, characterization and applications of advanced materials for energy, electronics, biomedicine, sensors and aerospace. A variety of processing methods (vapor, liquid and solid-state) are covered, along with materials, including metals, oxides, semiconductor, sulfides, selenides, nitrides, and carbon-based materials. Production of quantum dots, nanoparticles, thin films and composites are described by a collection of international experts. Given the ability to customize the phase, morphology, and properties of target materials, this "rational approach to synthesis and processing is a disruptive technology for electronic, energy, structural and biomedical (nano)materials and devices. The use of single-source chemical precursors for materials processing technology allows for intimate elemental mixing and hence production of complex materials at temperatures well below traditional physical methods and those involving direct combination of elements. The use of lower temperatures enables thin-film deposition on lightweight polymer substrates and reduces damage to complex devices structures such as used in power, electronics and sensors. - Discusses new approaches to synthesis or single-source precursors (SSPs) and the concept of rational design of materials - Includes materials processing of SSPs in the design of new materials and novel devices - Provides comprehensive coverage of the subject (materials science and chemistry) as related to SSPs and the range of potential applications
Modeling of Chemical Vapor Deposition of Tungsten Films
Author: Chris R. KleijnPublisher: Birkhäuser
ISBN: 3034877412
Category : Science
Languages : en
Pages : 138
Book Description
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Vapor Deposition of Thin Films
Author: Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
A highly pure thin metal film having a nanocrystalline structure and a process of preparing such highly pure thin metal films of, e.g., rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium by plasma assisted chemical vapor deposition of, e.g., rhodium(allyl).sub. 3, iridium(allyl).sub. 3, molybdenum(allyl).sub. 4, tungsten(allyl).sub. 4, rhenium(allyl).sub. 4, platinum(allyl).sub. 2, or palladium(allyl).sub. 2 are disclosed. Additionally, a general process of reducing the carbon content of a metallic film prepared from one or more organometallic precursor compounds by plasma assisted chemical vapor deposition is disclosed.
Chemical Vapour Deposition
Author: Anthony C. JonesPublisher: Royal Society of Chemistry
ISBN: 0854044655
Category : Science
Languages : en
Pages : 600
Book Description
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
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