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Author: Trevor Frank Jones Publisher: BoD – Books on Demand ISBN: 180356668X Category : Science Languages : en Pages : 232
Book Description
Written by experts from around the world, this book presents a comprehensive overview of slurry technology. The editor is grounded in the science of dilute concentrations of coarse particles in horizontal ducts, including settling distributions, critical deposition, swirling flow, and the two-layer model. This volume includes ten chapters that address such topics as process modelling, measurement (including non-Newtonian rheology), high-concentration conveying, vertical transport of fine-particle slurries, rheometry of sludges, pipe wear, and wastewater applications. There is also a chapter on an application at the fringe of our subject: fluidisation.
Author: Trevor Frank Jones Publisher: BoD – Books on Demand ISBN: 180356668X Category : Science Languages : en Pages : 232
Book Description
Written by experts from around the world, this book presents a comprehensive overview of slurry technology. The editor is grounded in the science of dilute concentrations of coarse particles in horizontal ducts, including settling distributions, critical deposition, swirling flow, and the two-layer model. This volume includes ten chapters that address such topics as process modelling, measurement (including non-Newtonian rheology), high-concentration conveying, vertical transport of fine-particle slurries, rheometry of sludges, pipe wear, and wastewater applications. There is also a chapter on an application at the fringe of our subject: fluidisation.
Author: Robert Visintainer Publisher: Springer Nature ISBN: 3031254406 Category : Science Languages : en Pages : 494
Book Description
This book is based on the industry leading short course of the same name hosted by the GIW Industries Hydraulic Laboratory and founded by Dr. Roland Clift and Graeme Addie, who together with Dr. Ken Wilson continued its development and authored the first edition of this textbook. This fourth edition has been extensively updated by the international team of engineers and authors who inherited this legacy and continue its development to the present day. Focusing on the hydraulic design of slurry pipelines, the pumps that power them, and the interactions between pumps and systems, it retains the classroom tested balance of theoretical development and practical engineering which have made it a slurry transport classic. The topics covered are important to slurry system engineers for the optimization of new designs, as well as the operators of existing systems, who may need to calculate and plan for changing conditions from day to day. Updates to the fourth edition include: · Careful formulation of the theoretical concepts, providing greater clarity of slurry flow dynamics, including a new chapter on the principles and characterization of slurry flows. · Expansion of the 4-Component Models for settling slurry pipeline flow and pump solids effect, based on an extensive series of full-sized tests. · An expanded treatment of complex slurries, including a broader discussion of non-Newtonian fluids and their interaction with coarse particles. · A new chapter on test methods, presenting an overview of slurry system instrumentation, modern techniques for characterizing slurry rheology, and practical advice for planning and executing a slurry test. · An overview of advances in the computational modeling of slurries, including an in-depth parametric study of slurry pump wear and operating cost. The authors highlight methods for achieving energy efficiency, which are crucial to the effective use of scarce resources, given the foundational role of slurry transport systems in the energy intensive industries of mining and dredging. Key concepts are supported with case studies and worked examples. Slurry Transport Using Centrifugal Pumps, fourth edition, is both methodical and in-depth. It is ideal as a teaching tool for classroom or self-directed learning domains, and valuable as a design guide for engineer practitioners at all experience levels.
Author: B.E.A. Jacobs Publisher: CRC Press ISBN: 0203215915 Category : Architecture Languages : en Pages : 321
Book Description
This book benefits users, manufacturers and engineers by drawing together an overall view of the technology. It attempts to give the reader an appreciation of the extent to which slurry transport is presently employed, the theoretical basis for pipeline design, the practicalities of design and new developments.
Author: Iraj Zandi Publisher: Elsevier ISBN: 1483151298 Category : Technology & Engineering Languages : en Pages : 323
Book Description
Advances in Solid-Liquid Flow in Pipes and its Application focuses on solid-liquid interactions. The selection first takes a look at hydraulic transport of bulky materials and role of lift in the radial migration of particles in a pipe flow. Topics include the technological and economical considerations of transporting materials; lift model and the equations of motion; coefficients of lift and drag; and calculated behavior of particles in a pipe flow. The book then discusses particle and fluid velocities of turbulent flows of suspensions of neutrally buoyant particles; phase-separation phenomena in iso-density, two-phase flows; and transient flow of solid-liquid mixtures in pipes. The text discusses pipeline transportation of coke in petroleum products, including slurry components, hydraulic tests, and hydraulic characteristics of slurry. The book then evaluates the use of heavy media in the pipeline transport of particulate solids. Comparison of pressure gradients and equipment and experimental procedures are highlighted. The selection is a valuable reference for readers interested in solid-liquid interactions.
Author: Babu Suryadevara Publisher: Woodhead Publishing ISBN: 0128218193 Category : Technology & Engineering Languages : en Pages : 650
Book Description
Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The second edition includes the recent advances of CMP and its emerging materials, methods, and applications, including coverage of post-CMP cleaning challenges and tribology of CMP. This important book offers a systematic review of fundamentals and advances in the area. Part one covers CMP of dielectric and metal films, with chapters focusing on the use of current and emerging techniques and processes and on CMP of various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. New content addressed includes CMP challenges with tungsten, cobalt, and ruthenium as interconnect and barrier films, consumables for ultralow topography and CMP for memory devices. Part two addresses consumables and process control for improved CMP and includes chapters on CMP pads, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes and approaches for defection characterization, mitigation, and reduction. Advances in Chemical Mechanical Planarization (CMP), Second Edition is an invaluable resource and key reference for materials scientists and engineers in academia and R&D. Reviews the most relevant techniques and processes for CMP of dielectric and metal films Includes chapters devoted to CMP for current and emerging materials Addresses consumables and process control for improved CMP, including post-CMP
Author: Trevor Frank Jones
Author: Trevor Frank Jones
Author: Barbara A. Sakkestad
Author: Robert Visintainer
Author: B.E.A. Jacobs
Author: Iraj Zandi
Author: Babu Suryadevara
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