Author: Peter M. Martin Publisher: William Andrew ISBN: 0815520328 Category : Technology & Engineering Languages : en Pages : 932
Book Description
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Book Description
Cathodic arcs are among the longest studied yet least understood objects in science. Plasma-generating, tiny spots appear on the cathode; they are highly dynamic and hard to control. With an approach emphasizing the fractal character of cathode spots, strongly fluctuating plasma properties are described such as the presence of multiply charged ions that move with supersonic velocity. Richly illustrated, the book also deals with practical issues, such as arc source construction, macroparticle removal, and the synthesis of dense, well adherent coatings. The book spans a bridge from plasma physics to coatings technology based on energetic condensation, appealing to scientists, practitioners and graduate students alike.
Author: Donald M. Mattox Publisher: William Andrew ISBN: 0128130857 Category : Technology & Engineering Languages : en Pages : 383
Book Description
The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. - History and detailed descriptions of Vacuum Deposition Technologies - Review of Enabling Technologies and their importance to current applications - Extensively referenced text - Patents are referenced as part of the history - Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology - Glossary of Terms for vacuum coating
Author: Teofil Jesionowski Publisher: MDPI ISBN: 3039213970 Category : Science Languages : en Pages : 204
Book Description
The book deals with novel aspects and perspectives in metal oxide and hybrid material fabrication. The contributions are mainly focused on the search for a new group of advanced materials with designed physicochemical properties, especially an expanded porous structure and defined surface activity. The proposed technological procedures result in an enhanced activity of the synthesized hybrid materials, which is of great importance when considering their potential fields of application. The use of such materials in different technological disciplines, including aspects associated with environmental protection, allows for the verification of the proposed synthesis method. Thus, it can be stated that those aspects are of interdisciplinary character and may be located at the interface of three scientific disciplines—chemistry, materials science, and engineering—as well as environmental protection. Furthermore, the presented scientific scope is in some way an answer to the continuous demand for such types of materials and opens new perspectives for their practical use
Author: Paolo Mele Publisher: ISBN: 9781536160864 Category : Zinc oxide thin films Languages : en Pages : 0
Book Description
Zinc oxide (ZnO) is an n-type semiconductor with versatile applications such as optical devices in ultraviolet region, piezoelectric transducers, transparent electrode for solar cells and gas sensors. This book "ZnO Thin Films: Properties, Performance and Applications" gives a deep insight in the intriguing science of zinc oxide thin films. It is devoted to cover the most recent advances and reviews the state of the art of ZnO thin films applications involving energy harvesting, microelectronics, magnetic devices, photocatalysis, photovoltaics, optics, thermoelectricity, piezoelectricity, electrochemistry, temperature sensing. It serves as a fundamental information source on the techniques and methodologies involved in zinc oxide thin films growth, characterization, post-deposition plasma treatments and device processing. This book will be invaluable to the experts to consolidate their knowledge and provide insight and inspiration to beginners wishing to learn about zinc oxide thin films.
Author: Mineo Hiramatsu Publisher: Springer Science & Business Media ISBN: 3211997180 Category : Technology & Engineering Languages : en Pages : 168
Book Description
Representing the first text to cover this exciting new area of research, this book will describe synthesis techniques of CNWs, their characterization and various expected applications using CNWs. Carbon-nanowalls (CNWs) can be described as two-dimensional graphite nanostructures with edges comprised of stacks of plane graphene sheets standing almost vertically on the substrate. These sheets form a wall structure with a high aspect ratio. The thickness of CNWs ranges from a few nm to a few tens of nm. The large surface area and sharp edges of CNWs may prove useful for a number of applications such as electrochemical devices, field electron emitters, storage materials for hydrogen gas, catalyst support. In particular, vertically standing CNWs with a high surface-to-volume ratio, serve as an ideal material for catalyst support for fuel cells and in gas storage materials.
Author: Jacques I. Pankove Publisher: Courier Corporation ISBN: 0486138704 Category : Science Languages : en Pages : 466
Book Description
Comprehensive text and reference covers all phenomena involving light in semiconductors, emphasizing modern applications in semiconductor lasers, electroluminescence, photodetectors, photoconductors, photoemitters, polarization effects, absorption spectroscopy, more. Numerous problems. 339 illustrations.
Author: Publisher: Academic Press ISBN: 008054293X Category : Science Languages : en Pages : 268
Book Description
This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools.Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application*This single source saves time and effort by including comprehensive information at one's finger tips*The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD*The numerous practical applications assist the working engineer to select and refine thin film processes
Author: Peter M. Martin
Author: André Anders
Author: Donald M. Mattox
Author: 
Author: 
Author: Teofil Jesionowski
Author: Paolo Mele
Author: Mineo Hiramatsu
Author: Jacques I. Pankove
Author: