Author: Alan D. WilsonPublisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 156
Book Description
X-ray Lithography and Applications of Soft X-rays to Technology
Author: Alan D. WilsonPublisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 156
Book Description
X-Rays From Laser Plasmas
Author: I. C. E. TurcuPublisher: John Wiley & Sons
ISBN:
Category : Science
Languages : en
Pages : 348
Book Description
Soft X-rays have great potential for use in a wide variety of applications, including the semiconductor industry and the life sciences. X-Rays from Laser Plasmas: Generation and Applications focuses exclusively and in detail on the science and technology of soft X-rays produced with non-synchrotron sources. Using a minimum of mathematical formulae, it discusses how such X-rays can be efficiently and economically generated from plasmas produced by lasers, and how they interact with matter. Authored by Dr Edmond Turcu, one of the pioneers in this field, X-Rays from Laser Plasmas: Generation and Applications will be of great interest to a wide variety of readers, including all those working in X-ray lithography, microscopy, and radiobiology.
Soft X-ray Optics
Author: Eberhard SpillerPublisher: SPIE Press
ISBN: 9780819416544
Category : Medical
Languages : en
Pages : 296
Book Description
This text describes optics mainly in the 10 to 500 angstrom wavelength region. These wavelengths are 50 to 100 times shorter than those for visible light and 50 to 100 times longer than the wavelengths of medical x rays or x-ray diffraction from natural crystals. There have been substantial advances during the last 20 years, which one can see as an extension of optical technology to shorter wavelengths or as an extension of x-ray diffraction to longer wavelengths. Artificial diffracting structures like zone plates and multilayer mirrors are replacing the natural crystals of x-ray diffraction. Some of these structures can now be fabricated to have diffraction-limited resolution. The new possibilities are described in a simple, tutorial way.
Soft X-Rays and Extreme Ultraviolet Radiation
Author: David AttwoodPublisher: Cambridge University Press
ISBN: 1139643428
Category : Technology & Engineering
Languages : en
Pages : 611
Book Description
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
X-Ray Lithography and Applications of Soft X-Rays to Technology
Author: Optical Systems for Soft X Rays
Author: A.G. MichettePublisher: Springer Science & Business Media
ISBN: 1461322235
Category : Science
Languages : en
Pages : 338
Book Description
A fundamental problem in cell biology is the cause of aging. The solution to this problem has not yet been obtained because,(l) until recently, it was not possible to image living cells directly. The use of low-energy (soft) X rays has made such imaging possible, perhaps thereby allowing the aging process to be understood and possibly overcome (a result that may well generate further social, moral, and ethical problems). Fortun ately this is not the only aspect of cell biology amenable to soft X-ray imaging, and it is envisaged that many less controversial studies--such as investigations of the detailed differences between healthy and diseased or malignant cells (in their natural states) and processes of cell division and growth-will be made possible. The use of soft X rays is not limited to biological studies-many applications are possible in, for example, fusion research, materials science, and astronomy. Such studies have only recently begun in earnest because several difficulties had to be overcome, major among these being the lack (for some purposes) of sufficiently intense sources, and the technological difficulties associated with making efficient optical systems. As is well known, the advent of dedicated synchrotron radiation sources, in particular, has alleviated the first of these difficulties, not just for the soft X-ray region. It is the purpose of this book to consider progress in the second.
X-Rays and Extreme Ultraviolet Radiation
Author: David AttwoodPublisher: Cambridge University Press
ISBN: 1107062896
Category : Science
Languages : en
Pages : 655
Book Description
Master the physics and understand the current applications of modern X-ray and EUV sources with this fully updated second edition.
Materials and Processes for Next Generation Lithography
Author: Publisher: Elsevier
ISBN: 0081003587
Category : Science
Languages : en
Pages : 636
Book Description
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Technology of Si, Ge, and SiC / Technologie Von Si, Ge und SiC
Author: W. DietzePublisher: Springer Science & Business Media
ISBN: 9783540114741
Category : Science
Languages : en
Pages : 680
Book Description
Author: