Author: Publisher:
ISBN: 9789402818093
Category :
Languages : en
Pages : 176
Book Description
Wavelength-resolved Extreme Ultraviolet Lensless Imaging and Metrology
Author: Extreme Ultraviolet (EUV) Holographic Metrology for Lithography Applications
Author: Sang-hun YiDiffraction-based Metrology in the Extreme Ultraviolet
Author: Frederik TuitjePublisher:
ISBN:
Category :
Languages : de
Pages : 0
Book Description
The growing numerical development of Coherent Diffraction Imaging (CDI) towards ptychography allows for the first time the separate reconstruction of object and the wavefront illuminating it. This work is dedicated to the investigation of further possibilities resulting from the complex reconstruction of object and illumination. In this thesis, gold structures buried in silicon are reconstructed and examined with regard to their surface morphology in reflection geometry. This completely non-destructive method allows metrology on structures of embedded circuits and otherwise hidden defects. The increasing demand for easily accessible and compact high-performance light sources around the silicon and water window opens the question regarding their suitability for lensless imaging. In the following chapters a method is introduced which allows an almost complete source analysis by means of a single long time exposed diffraction pattern. The knowledge gained in this way allows an improvement of the source with respect to water window CDI and provides insight into dynamic processes within the source. The complex-valued reconstruction of the wavefront allows an insight into the plasma and the ionization states prevailing there. The XUV seed pulse of a seeded Soft-X-Ray laser (SXRL), which passes the pumped plasma and changes its properties with respect to the states in the plasma, is reconstructed ptychographically. Adapted Maxwell-Bloch simulations allow by comparison with the measurement to restore the ionization states during the passage of the seed pulse. Previous experiments showed artifacts during reconstruction, which were directly related to the periodicity of the objects. Simulation of periodic objects of different sizes and with the addition of intentional defects showed a dependence of the reconstruction of the object on the illumination function. Various criteria were derived from this simulation and are presented in this thesis.
Characterization of an Expanded-field Schwarzschild Objective for Extreme Ultraviolet Lithography
Author: Publisher:
ISBN:
Category :
Languages : en
Pages : 16
Book Description
The performance of a new 10x-reduction Schwarzschild system for projection imaging at 13.4 nm wavelength is reported. The optical design is optimized to achieve 0.1 [mu]m resolution over a 0.4 mm image field of view, an increase in area of a factor of 100 over previous designs. An off-set aperture, located on the convex primary, defines an unobscured 0.08 numerical aperture. The system is illuminated using extreme ultraviolet (EUV) radiation emitted from a laser plasma source and collected by an ellipsoidal condenser. A 450 turning mirror is used to relay the collected EUV radiation onto a near-normal reflecting mask. Multiple sets of primary and secondary elements were fabricated, matched and clocked to minimize the effects of small figure errors on imaging performance. Optical metrology indicates that the wave-front error within the subaperture used is within a factor of two of the design value. Images recorded in PMMA and ZEP 520 resists reveal good imaging fidelity over much of the 0.4 mm field with equal line/space gratings being resolved to 0.1 [mu]m.
Advanced Holography
Author: Izabela NaydenovaPublisher: BoD – Books on Demand
ISBN: 9533077298
Category : Technology & Engineering
Languages : en
Pages : 392
Book Description
Advanced Holography - Metrology and Imaging covers digital holographic microscopy and interferometry, including interferometry in the infra red. Other topics include synthetic imaging, the use of reflective spatial light modulators for writing dynamic holograms and image display using holographic screens. Holography is discussed as a vehicle for artistic expression and the use of software for the acquisition of skills in optics and holography is also presented. Each chapter provides a comprehensive introduction to a specific topic, with a survey of developments to date.
Optical Frequency Comb Metrology from Infrared to Extreme Ultraviolet Wavelengths
Author: Characterization of Extreme Ultraviolet Imaging Systems
Author: Edita TejnilAbsolute Intensity Measurements in the Extreme Ultraviolet Spectrum of Solar Radiation
Author: H. E. HintereggerPublisher:
ISBN:
Category : Electromagnetic waves
Languages : en
Pages : 48
Book Description
Direct Index of Refraction Measurement at Extreme Ultraviolet Wavelength Region with a Novel Interferometer
Author: Extreme Ultraviolet Imaging and Resist Characterization Using Spatial Filtering Techniques
Author: Michael David ShumwayPublisher:
ISBN:
Category :
Languages : en
Pages : 336
Book Description