Author: Ibrahim OklurPublisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Waveguide and Optical Studies of Insulators Using Ion Implantation
Studies of Ion Implantation Into Insulators Using Nuclear Methods, Luminescence and Waveguide Techniques
Author: Nurdogan CanOptical Effects of Ion Implantation
Author: P. D. TownsendPublisher: Cambridge University Press
ISBN: 0521394309
Category : Science
Languages : en
Pages : 300
Book Description
This book describes the use of ion implantation to control the optical properties of solid state materials.
Optical and Electrical Conductivity Studies of Ion Implanted Insulators
Author: James Robert CrawfordPublisher:
ISBN:
Category :
Languages : en
Pages : 280
Book Description
Ion Implantation Waveguide Formation in Transition Metal Ion Doped Insulators
Author: Niall A. GallenInsulating Materials for Optoelectronics
Author: F. Agull¢-L¢pezPublisher: World Scientific
ISBN: 9810222300
Category : Technology & Engineering
Languages : en
Pages : 465
Book Description
This review volume presents new developments in the preparation, physical characterization and applications of insulating materials for Optoelectronics. Insulators occupy a leading position as laser and optical amplifier hosts, electrooptic and acoustooptic modulators, frequency doublers and optical parametric oscillators, photorefractive devices and radiator detectors. These applications rely heavily on the development of advanced techniques for the preparation of both bulk and waveguide structures, the adequate knowledge of the microscopic behaviour defects, impurities and a thorough understanding of their response to electromagnetic fields. All these topics relating basic physicochemical aspects and applied performance are authoritatively discussed in the book.
Ion Implantation
Author: Mark GoorskyPublisher: BoD – Books on Demand
ISBN: 9535106341
Category : Science
Languages : en
Pages : 452
Book Description
Ion implantation presents a continuously evolving technology. While the benefits of ion implantation are well recognized for many commercial endeavors, there have been recent developments in this field. Improvements in equipment, understanding of beam-solid interactions, applications to new materials, improved characterization techniques, and more recent developments to use implantation for nanostructure formation point to new directions for ion implantation and are presented in this book.
Structural Studies of Ion-implanted Optical Waveguides
Author: R. S. Lowther-HarrisHigh Energy and High Dose Ion Implantation
Author: S.U. CampisanoPublisher: Elsevier
ISBN: 0444596798
Category : Technology & Engineering
Languages : en
Pages : 320
Book Description
Ion beam processing is a means of producing both novel materials and structures. The contributions in this volume strongly focus on this aspect and include many papers reporting on the modification of the electrical and structural properties of the target materials, both metals and semiconductors, as well as the synthesis of buried and surface compound layers. Many examples on the applications of high energy and high dose ion implantation are also given. All of the papers from Symposia C and D are presented in this single volume because the interests of many of the participants span both topics. Additionally many of the materials science aspects, including experimental methods, equipment and processing problems, diagnostic and analytical techniques are common to both symposia.
Ion Implantation Technology - 94
Author: S. CoffaPublisher: Newnes
ISBN: 044459972X
Category : Science
Languages : en
Pages : 1031
Book Description
The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters. The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.