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Author: Ohmi Publisher: Routledge ISBN: 1351406426 Category : Science Languages : en Pages : 948
Book Description
Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int
Author: Ohmi Publisher: Routledge ISBN: 1351406426 Category : Science Languages : en Pages : 948
Book Description
Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int
Author: Ohmi Publisher: CRC Press ISBN: 9780367402341 Category : Languages : en Pages : 944
Book Description
Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int
Author: S. Lerman Publisher: ISBN: Category : Saline water conversion Languages : en Pages : 1
Book Description
This work is the first in what appears to be a comprehensive treatise on ultraclean technology in the semiconductor industry and other industries that require ultraclean technology. As the title indicates, this is a handbook, or more accurately, an in-depth encyclopedic treatment of the subject. Its audience includes scientists, engineers, and others involved with virtually any aspect of ultrapure water, and, although the author's target is the semiconductor industry, this volume is valuable to anyone working with ultrapure water.
Author: Zeman Publisher: Routledge ISBN: 135143151X Category : Medical Languages : en Pages : 642
Book Description
Integrates knowledge on microfiltration and ultrification, membrane chemistry, and characterization methods with the engineering and economic aspects of device performance, device and module design, processes, and applications. The text provides a discussion of membrane fundamentals and an analytical framework for designing and developing new filtrations systems for a broad range of technologically important functions. It offers information on membrane liquid precursors, fractal and stochastic pore space analysis, novel and advanced module designs, and original process design calculations.
Author: Norman N Li Publisher: John Wiley & Sons ISBN: 1118211545 Category : Technology & Engineering Languages : en Pages : 1105
Book Description
Advanced membranes-from fundamentals and membrane chemistry to manufacturing and applications A hands-on reference for practicing professionals, Advanced Membrane Technology and Applications covers the fundamental principles and theories of separation and purification by membranes, the important membrane processes and systems, and major industrial applications. It goes far beyond the basics to address the formulation and industrial manufacture of membranes and applications. This practical guide: Includes coverage of all the major types of membranes: ultrafiltration; microfiltration; nanofiltration; reverse osmosis (including the recent high-flux and low-pressure membranes and anti-fouling membranes); membranes for gas separations; and membranes for fuel cell uses Addresses six major topics: membranes and applications in water and wastewater; membranes for biotechnology and chemical/biomedical applications; gas separations; membrane contractors and reactors; environmental and energy applications; and membrane materials and characterization Includes discussions of important strategic issues and the future of membrane technology With chapters contributed by leading experts in their specific areas and a practical focus, this is the definitive reference for professionals in industrial manufacturing and separations and research and development; practitioners in the manufacture and applications of membranes; scientists in water treatment, pharmaceutical, food, and fuel cell processing industries; process engineers; and others. It is also an excellent resource for researchers in industry and academia and graduate students taking courses in separations and membranes and related fields.
Author: Robert P. Donovan Publisher: CRC Press ISBN: 1482289997 Category : Technology & Engineering Languages : en Pages : 460
Book Description
Recognizing the need for improved control measures in the manufacturing process of highly sensitized semiconductor technology, this practical reference provides in-depth and advanced treatment on the origins, procedures, and disposal of a variety of contaminants. It uses contemporary examples based on the latest hardware and processing apparatus to illustrate previously unavailable results and insights along with experimental and theoretical developments. Ensures the proper methods necessary to meet the standards established in the 1997 National Technology Roadmap for Semiconductors (NTRS)! Summarizing up-to-date control practices in the industry, Contamination-Free Manufacturing for Semiconductors and Other Precision Products: Details the physics and chemistry behind the mechanisms leading to contamination-induced failures Considers particles and molecular contaminants, including the entire spectrum of mass-based contaminants Outlines primary contamination problems and target control levels Reveals and offers solutions to inadequate areas of measurement capability and control technology Clarifies significant problems and decisions facing the industry by analyzing NTRS standards and contamination mechanisms Containing over 700 literature references, drawings, photographs, equations, and tables, Contamination-Free Manufacturing for Semiconductors and Other Precision Products is an essential reference for electrical and electronics, instrumentation, process, manufacturing, development, contamination control and quality engineers; physicists; and upper-level undergraduate and graduate students in these disciplines.
Author: Ohmi
Author: Ohmi
Author: Tadahiro Ōmi
Author: Ohmi
Author: S. Lerman
Author: Zeman
Author: Norman N Li
Author: Robert P. Donovan
Author: Richard E. Novak
Author: New York Public Library
Author: