Ultra Clean Processing of Semiconductor Surfaces XIV PDF Download
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Author: Paul Mertens Publisher: Trans Tech Publications Ltd ISBN: 3035734178 Category : Technology & Engineering Languages : en Pages : 339
Book Description
14th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (14th UCPSS 2018) Selected, peer reviewed papers from the 14th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (14th UCPSS 2018), September 3-5, 2018, Leuven, Belgium
Author: Paul Mertens Publisher: Trans Tech Publications Ltd ISBN: 3035734178 Category : Technology & Engineering Languages : en Pages : 339
Book Description
14th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (14th UCPSS 2018) Selected, peer reviewed papers from the 14th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (14th UCPSS 2018), September 3-5, 2018, Leuven, Belgium
Author: Paul Mertens Publisher: Trans Tech Publications Ltd ISBN: 3038132829 Category : Science Languages : en Pages : 396
Book Description
UCPSS 2008 Selected, peer reviewed papers from the 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), held in Bruges, Belgium, September 22-24, 2008
Author: Paul Mertens Publisher: Trans Tech Publications Ltd ISBN: 3038137006 Category : Technology & Engineering Languages : en Pages : 365
Book Description
Selected, peer reviewed papers from the 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 20-22, 2010, Ostend, Belgium
Author: Takeshi Hattori Publisher: Springer Science & Business Media ISBN: 3662035359 Category : Technology & Engineering Languages : en Pages : 634
Book Description
A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.
Author: Michael Liehr Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 440
Book Description
Wafer cleaning, microcontamination and surface passivation are the key focus of this proceedings volume, the 3rd in a successful series from MRS. It is a field in which control of surface chemistry and surface morphology, as well as particle and molecular contamination removal, are of critical importance. This volume expands the scope of the topic to include ultraclean technology in a broader sense, emphasizing the identification and characterization of trace contamination, strategies for removal, and equipment considerations, as well as critical limits for impact on devices. Novel processes, such as chemical mechanical polishing (CMP), and their ramifications for contamination removal are also addressed.
Author: Paul Mertens Publisher: Trans Tech Publications Ltd ISBN: 3038131954 Category : Technology & Engineering Languages : en Pages : 383
Book Description
Selected, peer reviewed papers from the 8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) held in Antwerp, Belgium, September 18-20, 2006
Author: Ohmi Publisher: CRC Press ISBN: 9780824787530 Category : Technology & Engineering Languages : en Pages : 948
Book Description
Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int
Author: Paul Mertens
Author: Paul Mertens
Author: Paul Mertens
Author: Paul Mertens
Author: Takeshi Hattori
Author: Michael Liehr
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Author: Paul Mertens
Author: Jerzy Rużyłło
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Author: Ohmi