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Author: M.E. Welland Publisher: Springer Science & Business Media ISBN: 9401100411 Category : Science Languages : en Pages : 253
Book Description
An extensive body of research is involved in pushing miniaturisation to its physical limit, encompassing the miniaturisation of electronic devices, the manipulation of single atoms by scanning tunnelling microscopy, bio-engineering, the chemical synthesis of complex molecules, microsensor technology, and information storage and retrieval. In parallel to these practical aspects of miniaturisation there is also the necessity to understand the physics of small structures. Ultimate Limits of Fabrication and Measurement brings together a number of leading articles from a variety of fields with the common aim of ultimate miniaturisation and measurement.
Author: M.E. Welland Publisher: Springer Science & Business Media ISBN: 9401100411 Category : Science Languages : en Pages : 253
Book Description
An extensive body of research is involved in pushing miniaturisation to its physical limit, encompassing the miniaturisation of electronic devices, the manipulation of single atoms by scanning tunnelling microscopy, bio-engineering, the chemical synthesis of complex molecules, microsensor technology, and information storage and retrieval. In parallel to these practical aspects of miniaturisation there is also the necessity to understand the physics of small structures. Ultimate Limits of Fabrication and Measurement brings together a number of leading articles from a variety of fields with the common aim of ultimate miniaturisation and measurement.
Author: Jeom Kee Paik Publisher: John Wiley & Sons ISBN: 1119367786 Category : Technology & Engineering Languages : en Pages : 971
Book Description
Reviews and describes both the fundamental and practical design procedures for the ultimate limit state design of ductile steel plated structures The new edition of this well-established reference reviews and describes both fundamentals and practical design procedures for steel plated structures. The derivation of the basic mathematical expressions is presented together with a thorough discussion of the assumptions and the validity of the underlying expressions and solution methods. Furthermore, this book is also an easily accessed design tool, which facilitates learning by applying the concepts of the limit states for practice using a set of computer programs, which can be downloaded. Ultimate Limit State Design of Steel Plated Structures provides expert guidance on mechanical model test results as well as nonlinear finite element solutions, sophisticated design methodologies useful for practitioners in industries or research institutions, and selected methods for accurate and efficient analyses of nonlinear behavior of steel plated structures both up to and after the ultimate strength is reached. Covers recent advances and developments in the field Includes new topics on constitutive equations of steels, test database associated with low/elevated temperature, and strain rates Includes a new chapter on a semi-analytical method Supported by a companion website with illustrative example data sheets Provides results for existing mechanical model tests Offers a thorough discussion of assumptions and the validity of underlying expressions and solution methods Designed as both a textbook and a handy reference, Ultimate Limit State Design of Steel Plated Structures, Second Edition is well suited to teachers and university students who are approaching the limit state design technology of steel plated structures for the first time. It also meets the needs of structural designers or researchers who are involved in civil, marine, and mechanical engineering as well as offshore engineering and naval architecture.
Author: George Brewer Publisher: Elsevier ISBN: 0323153410 Category : Technology & Engineering Languages : en Pages : 377
Book Description
Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.
Author: Zhiyong Ma Publisher: CRC Press ISBN: 135173394X Category : Science Languages : en Pages : 843
Book Description
Nanoelectronics is changing the way the world communicates, and is transforming our daily lives. Continuing Moore’s law and miniaturization of low-power semiconductor chips with ever-increasing functionality have been relentlessly driving R&D of new devices, materials, and process capabilities to meet performance, power, and cost requirements. This book covers up-to-date advances in research and industry practices in nanometrology, critical for continuing technology scaling and product innovation. It holistically approaches the subject matter and addresses emerging and important topics in semiconductor R&D and manufacturing. It is a complete guide for metrology and diagnostic techniques essential for process technology, electronics packaging, and product development and debugging—a unique approach compared to other books. The authors are from academia, government labs, and industry and have vast experience and expertise in the topics presented. The book is intended for all those involved in IC manufacturing and nanoelectronics and for those studying nanoelectronics process and assembly technologies or working in device testing, characterization, and diagnostic techniques.
Author: Christian Menn Publisher: Birkhäuser ISBN: 3034891318 Category : Technology & Engineering Languages : en Pages : 546
Book Description
This book was written to make the material presented in my book, Stahlbetonbrucken, accessible to a larger number of engineers throughout the world. A work in English, the logical choice for this task, had been contemplated as Stahlbetonbrucken was still in its earliest stages of preparation. The early success of Stahlbetonbrucken provided significant impetus for the writing of Prestressed Concrete Bridges, which began soon after the publication of its predecessor. The present work is more than a mere translation of Stahlbetonbrucken. Errors in Stahlbetonbrucken that were detected after publication have been corrected. New material on the relation between cracking in concrete and corrosion of reinforce ment, prestressing with unbonded tendons, skew-girder bridges, and cable-stayed bridges has been added. Most importantly, however, the presentation of the material has been extensively reworked to improve clarity and consistency. Prestressed Concrete Bridges can thus be regarded as a thoroughly new and improved edition of its predecessor.
Author: Ramchandra Publisher: Scientific Publishers ISBN: 9387869741 Category : Technology & Engineering Languages : en Pages : 1088
Book Description
Method of Limit State (Ultimate Limit State, (ULS) and serviceability limit state (SLS)) present an improved design philosophy and makes allow-ance for the short-compings of working stress method (conventional and long time used in practice). This method provides basic framework, within which the performance of the steel structures may be assessed against various limiting conditions and invo-lves some concept of probability. Object of limit design method is to get steel structure that will remain fit for use during its life with acceptable target reliability. The probability of a limit state being reached during its life time is kept very small. This method has been broadly adopted in many developed countries and based on the recommendations of IS: 800-2007 (Third Revised Edition). This method has been covered in nine parts (in twenty six chapters and four appendices) as listed in contents. After introducing `Limit State Method of Design of Concrete Structures (LSD: CC) in IS: 456-1978, it was natural for Bureau of Indian Standard to introduce `Limit State Design of Steel Structures (LSD: SS). SI units for text for complete book, uncertainties involved in the working stress method and the concept of partial safety factors for the loads and strength of mate-rials (for yield and ultimate stresses reached) are the special feature of the book. Concepts of shear centre for thin-walled beam cross-sections and unsymmetrical bending of beams are important for various requirements and have been included in appendices. The text of book has been covered in about 1000 pages and 550 diagrams. The texts of various topics has been explained in many illustrative worked-out examples.
Author: M.E. Welland
Author: M.E. Welland
Author: Jeom Kee Paik
Author: National Institute of Standards and Technology (U.S.)
Author: George Brewer
Author: Thomas R. Canada
Author: American Nuclear Society
Author: Zhiyong Ma
Author: 
Author: Christian Menn
Author: Ramchandra