Author: Jörg SchwenkePublisher:
ISBN: 9789174732306
Category :
Languages : en
Pages : 155
Book Description
Towards Ultrafast Imaging with Extreme Ultraviolet Light Sources
Author: Jörg SchwenkePublisher:
ISBN: 9789174732306
Category :
Languages : en
Pages : 155
Book Description
High-Resolution Extreme Ultraviolet Microscopy
Author: Michael Werner ZürchPublisher: Springer
ISBN: 3319123882
Category : Science
Languages : en
Pages : 139
Book Description
This thesis describes novel approaches and implementation of high-resolution microscopy in the extreme ultraviolet light regime. Using coherent ultrafast laser-generated short wavelength radiation for illuminating samples allows imaging beyond the resolution of visible-light microscopes. Michael Zürch gives a comprehensive overview of the fundamentals and techniques involved, starting from the laser-based frequency conversion scheme and its technical implementation as well as general considerations of diffraction-based imaging at nanoscopic spatial resolution. Experiments on digital in-line holography and coherent diffraction imaging of artificial and biologic specimens are demonstrated and discussed in this book. In the field of biologic imaging, a novel award-winning cell classification scheme and its first experimental application for identifying breast cancer cells are introduced. Finally, this book presents a newly developed technique of generating structured illumination by means of so-called optical vortex beams in the extreme ultraviolet regime and proposes its general usability for super-resolution imaging.
Coherent High-Resolution Imaging of Artificial and Biological Specismen Using Compact Ultrafast Extreme Ultraviolet Sources
Author: Michael Werner ZürchPublisher:
ISBN:
Category :
Languages : en
Pages : 268
Book Description
Bright High-repetition-rate Source of Narrowband Extreme-ultraviolet Harmonics Beyond 22 EV.
Author: Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Novel table-top sources of extreme-ultraviolet light based on high-harmonic generation yield unique insight into the fundamental properties of molecules, nanomaterials or correlated solids, and enable advanced applications in imaging or metrology. Extending high-harmonic generation to high repetition rates portends great experimental benefits, yet efficient extreme-ultraviolet conversion of correspondingly weak driving pulses is challenging. In this article, we demonstrate a highly-efficient source of femtosecond extreme-ultraviolet pulses at 50-kHz repetition rate, utilizing the ultraviolet second-harmonic focused tightly into Kr gas. In this cascaded scheme, a photon flux beyond ≈3 × 1013 s-1 is generated at 22.3 eV, with 5 × 10-5 conversion efficiency that surpasses similar harmonics directly driven by the fundamental by two orders-of-magnitude. The enhancement arises from both wavelength scaling of the atomic dipole and improved spatio-temporal phase matching, confirmed by simulations. Finally, spectral isolation of a single 72-meV-wide harmonic renders this bright, 50-kHz extreme-ultraviolet source a powerful tool for ultrafast photoemission, nanoscale imaging and other applications.
Extreme Ultraviolet Astronomy
Author: Martin A. BarstowPublisher: Cambridge University Press
ISBN: 1139435124
Category : Science
Languages : en
Pages : 412
Book Description
This book describes the development of astronomy in the Extreme Ultraviolet wavelength range, from the first rocket-based experiments to later satellite missions. It will be of great value to graduate students and researchers.
Ultrafast Opto-optical Control of Extreme Ultraviolet Light Pulses
Author: Samuel BengtssonPublisher:
ISBN: 9789177534914
Category :
Languages : en
Pages : 139
Book Description
Development of Extreme Ultraviolet and Soft X-ray Multilayer Optics for Scientific Studies with Femtosecond/attosecond Sources
Author: Publisher:
ISBN:
Category :
Languages : en
Pages : 146
Book Description
The development of multilayer optics for extreme ultraviolet (EUV) radiation has led to advancements in many areas of science and technology, including materials studies, EUV lithography, water window microscopy, plasma imaging, and orbiting solar physics imaging. Recent developments in femtosecond and attosecond EUV pulse generation from sources such as high harmonic generation lasers, combined with the elemental and chemical specificity provided by EUV radiation, are opening new opportunities to study fundamental dynamic processes in materials. Critical to these efforts is the design and fabrication of multilayer optics to transport, focus, shape and image these ultra-fast pulses This thesis describes the design, fabrication, characterization, and application of multilayer optics for EUV femtosecond and attosecond scientific studies. Multilayer mirrors for bandwidth control, pulse shaping and compression, tri-material multilayers, and multilayers for polarization control are described. Characterization of multilayer optics, including measurement of material optical constants, reflectivity of multilayer mirrors, and metrology of reflected phases of the multilayer, which is critical to maintaining pulse size and shape, were performed. Two applications of these multilayer mirrors are detailed in the thesis. In the first application, broad bandwidth multilayers were used to characterize and measure sub-100 attosecond pulses from a high harmonic generation source and was performed in collaboration with the Max-Planck institute for Quantum Optics and Ludwig- Maximilians University in Garching, Germany, with Professors Krausz and Kleineberg. In the second application, multilayer mirrors with polarization control are useful to study femtosecond spin dynamics in an ongoing collaboration with the T-REX group of Professor Parmigiani at Elettra in Trieste, Italy. As new ultrafast x-ray sources become available, for example free electron lasers, the multilayer designs described in this thesis can be extended to higher photon energies, and such designs can be used with those sources to enable new scientific studies, such as molecular bonding, phonon, and spin dynamics.
Extreme Ultraviolet Spectral Streak Camera
Author: John Michael SzilagyiPublisher:
ISBN:
Category : Extreme ultraviolet lithography
Languages : en
Pages : 76
Book Description
The recent development of extreme ultraviolet (EUV) sources has increased the need for diagnostic tools, and has opened up a previously limited portion of the spectrum. With ultrafast laser systems and spectroscopy moving into shorter timescales and wavelengths, the need for nanosecond scale imaging of EUV is increasing. EUV's high absorption has limited the number of imaging options due to the many atomic resonances in this spectrum. Currently EUV is imaged with photodiodes and X-ray CCDs. However photodiodes are limited in that they can only resolve intensity with respect to time and X-ray CCDs are limited to temporal resolution in the microsecond range. This work shows a novel approach to imaging EUV light over a nanosecond time scale, by using an EUV scintillator to convert EUV to visible light imaged by a conventional streak camera. A laser produced plasma, using a mass-limited tin based target, provided EUV light which was imaged by a grazing incidence flat field spectrometer onto a Ce:YAG scintillator. The EUV spectrum (5 nm-20 nm) provided by the spectrometer is filter by a zirconium filter and then converted by the scintillator to visible light (550 nm) which can then be imaged with conventional optics. Visible light was imaged by an electron image tube based streak camera. The streak camera converts the visible light image to an electron image using a photocathode, and sweeps the image across a recording medium. The streak camera also provides amplification and gating of the image by the means of a micro channel plate, within the image tube, to compensate for low EUV intensities. The system provides 42 ns streaked images of light with a temporal resolution of 440 ps at a repetition rate of 1 Hz. Upon calibration the EUV streak camera developed in this work will be used in future EUV development.
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