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Author: Amy W K Liu Publisher: World Scientific ISBN: 9814496405 Category : Technology & Engineering Languages : en Pages : 706
Book Description
Heteroepitaxial films are commonplace among today's electronic and photonic devices. The realization of new and better devices relies on the refinement of epitaxial techniques and improved understanding of the physics underlying epitaxial growth. This book provides an up-to-date report on a wide range of materials systems. The first half reviews metallic and dielectric thin films, including chapters on metals, rare earths, metal-oxide layers, fluorides, and high-Tc superconductors. The second half covers semiconductor systems, reviewing developments in group-IV, arsenide, phosphide, antimonide, nitride, II-VI and IV-VI heteroepitaxy. Topics important to several systems are covered in chapters on atomic processes, ordering and growth dynamics.
Author: Amy W K Liu Publisher: World Scientific ISBN: 9814496405 Category : Technology & Engineering Languages : en Pages : 706
Book Description
Heteroepitaxial films are commonplace among today's electronic and photonic devices. The realization of new and better devices relies on the refinement of epitaxial techniques and improved understanding of the physics underlying epitaxial growth. This book provides an up-to-date report on a wide range of materials systems. The first half reviews metallic and dielectric thin films, including chapters on metals, rare earths, metal-oxide layers, fluorides, and high-Tc superconductors. The second half covers semiconductor systems, reviewing developments in group-IV, arsenide, phosphide, antimonide, nitride, II-VI and IV-VI heteroepitaxy. Topics important to several systems are covered in chapters on atomic processes, ordering and growth dynamics.
Author: J. Mirecki Millunchick Publisher: Cambridge University Press ISBN: 9781107413092 Category : Technology & Engineering Languages : en Pages : 350
Book Description
Strain has a tremendous effect on the morphology and composition of heteroepitaxial semiconductor thin films. Recent progress in strained island formation, and in the morphological and compositional instabilities induced by heteroepitaxial stress, has led to new theoretical and experimental advances, as well as to promising materials for various optoelectronic applications. This book brings together research groups looking at important advances and breaking news in the field. The book centers around mechanisms rather than materials, thus papers in different semiconductor systems, including SiGe, III-V, nitrides, or II-VI semiconductors, are presented. Issues on growth, characterization, and modeling of morphological and compositional nonuniformities are also addressed, as are devices based on these spontaneous structures. Topics include: surface dynamics - atomistic processes; growth on patterned, high-index and vicinal substrates; quantum dots and wires; interdiffusion and segregation; band structure, electronic properties and devices; morphology and microstructure; and nitrides
Author: C.E. Morosanu Publisher: Elsevier ISBN: 1483291731 Category : Technology & Engineering Languages : en Pages : 720
Book Description
The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously. Contents: Part I. 1. Evolution of CVD Films. Introductory remarks. Short history of CVD thin films. II. Fundamentals. 2. Techniques of Preparing Thin Films. Electrolytic deposition techniques. Vacuum deposition techniques. Plasma deposition techniques. Liquid-phase deposition techniques. Solid-phase deposition techniques. Chemical vapour conversion of substrate. Chemical vapour deposition. Comparison between CVD and other thin film deposition techniques. 3. Chemical Processes Used in CVD. Introduction. Description of chemical reactions used in CVD. 4. Thermodynamics of CVD. Feasibility of a CVD process. Techniques for equilibrium calculations in CVD systems. Examples of thermodynamic studies of CVD systems. 5. Kinetics of CVD. Steps and control type of a CVD heterogeneous reaction. Influence of experimental parameters on thin film deposition rate. Continuous measurement of the deposition rate. Experimental methods for studying CVD kinetics. Role of homogeneous reactions in CVD. Mechanism of CVD processes. Kinetics and mechanism of dopant incorporation. Transport phenomena in CVD. Status of kinetic and mechanism investigations in CVD systems. 6. Measurement of Thin Film Thickness. Mechanical methods. Mechanical-optical methods. Optical methods. Electrical methods. Miscellaneous methods. 7. Nucleation and Growth of CVD Films. Stages in the nucleation and growth mechanism. Regimes of nucleation and growth. Nucleation theory. Dependence of nucleation on deposition parameters. Heterogeneous nucleation and CVD film structural forms. Homogeneous nucleation. Experimental techniques. Experimental results of CVD film nucleation. 8. Thin Film Structure. Techniques for studying thin film structure. Structural defects in CVD thin films. 9. Analysis of CVD Films. Analysis techniques of thin film bulk. Analysis techniques of thin film surfaces. Film composition measurement. Depth concentration profiling. 10. Properties of CVD Films. Mechanical properties. Thermal properties. Optical properties. Photoelectric properties. Electrical properties. Magnetic properties. Chemical properties. Part III. 11. Equipment and Substrates. Equipment for CVD. Safety in CVD. Substrates. 12. Preparation and Properties of Semiconducting Thin Films. Homoepitaxial semiconducting films. Heteroepitaxial semiconducting films. 13. Preparation and Properties of Amorphous Insulating Thin Films. Oxides. Nitrides and Oxynitrides. Polymeric thin films. 14. Preparation and Properties of Conductive Thin Films. Metals and metal alloys. Resistor materials. Transparent conducting films. Miscellaneous materials. 15. Preparation and Properties of Superconducting and Magnetic Thin Films. Superconducting materials. Magnetic materials. 16. Uses of CVD Thin Films. Applications in electronics and microelectronics. Applications in the field of microwaves and optoelectronics. Miscellaneous applications. Artificial heterostructures (Quantum wells, superlattices, monolayers, two-dimensional electron gases). Part V. 17. Present and Future Importance of CVD Films.
Author: Ralph P. Ruth Publisher: ISBN: Category : Languages : en Pages : 96
Book Description
The objective of this program is to carry out a fundamental study of nucleation and film growth mechanisms in heteroepitaxial semiconductor thin films, and to apply the results to the preparation of improved films and thin-film devices on insulating substrates. Both theoretical and experimental investigations are involved, with emphasis on chemical vapor deposition (CVD) techniques applied to the Si-on-Al2O3 and GaAs-on-Al2O3 systems. Two theoretical approaches to modeling the heteroepitaxial interface are being investigated. (Author).
Author: John Venables Publisher: Cambridge University Press ISBN: 9780521785006 Category : Science Languages : en Pages : 392
Book Description
This book covers the experimental and theoretical understanding of surface and thin film processes. It presents a unique description of surface processes in adsorption and crystal growth, including bonding in metals and semiconductors. Emphasis is placed on the strong link between science and technology in the description of, and research for, new devices based on thin film and surface science. Practical experimental design, sample preparation and analytical techniques are covered, including detailed discussions of Auger electron spectroscopy and microscopy. Thermodynamic and kinetic models of structure are emphasised throughout. The book provides extensive leads into practical and research literature, as well as resources on the World Wide Web (see http://venables.asu.edu/book). Each chapter contains problems which aim to develop awareness of the subject and the methods used. Aimed as a graduate textbook, this book will also be useful as a sourcebook for graduate students, researchers and practitioners in physics, chemistry, materials science and engineering.
Author: Hari Singh Nalwa Publisher: Elsevier ISBN: 0080533248 Category : Technology & Engineering Languages : en Pages : 3451
Book Description
This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures. Thin films is a field of the utmost importance in today's materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, digital camcorders, sensitive broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are but a few examples of miniaturized device technologies that depend the utilization of thin film materials. The Handbook of Thin Films Materials is a comprehensive reference focusing on processing techniques, characterization methods, and physical properties of these thin film materials.
Author: Koji Kajimura Publisher: Springer Science & Business Media ISBN: 4431681418 Category : Technology & Engineering Languages : en Pages : 1312
Book Description
Since the discovery of high temperature superconductors, many new materials have been invented. In the last year, several new materials were also discovered, but their critical temperatures are still below lOOK. Precise physical and chemical work has made tremendous progress in the theoretical and experimental study of physical properties and carrier state characterizations. The de Haas van Alphen effect measurement showed the existence of a Fermi surface in YBCO. Flux dynamics is a well-known new problem in which flux creep and irreversibility line features are especially important for a fundamental understanding of the critical current and flux pinning. Flux pinning centers which are intentionally added using non-superconducting precipitates, neutrons, and protons, etc. increase critical currents to practical levels. The analysis of electric and magnetic properties are expected to reveal the pinning mechanism and also to further application development. As for wires and bulks, many melt-like sintering techniques have improved the material performance of critical current densities. A new seeding Quench-Melt Growth technique enlarged crystal size and increased the repulsion force. These melting processes, in conjunction with a mechanical strength improvement have been effectively introduced into wire fabrication in order to realize kilometer range wires and will put the oxide wires to practical use. Where thin film is con cerned, when many fabrication methods had been developed using the assistance effect of activated oxygen such as ozone and oxygen radicals, a high current 2 density of 106A/cm at 77K was reported.
Author: Amy W K Liu
Author: Amy W K Liu
Author: W. K. Liu
Author: J. Mirecki Millunchick
Author: C.E. Morosanu
Author: Nitin Singh
Author: Andrew Martin Lam
Author: Ralph P. Ruth
Author: John Venables
Author: Hari Singh Nalwa
Author: Koji Kajimura