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Author: Martin Hÿtch Publisher: Academic Press ISBN: 0323988660 Category : Technology & Engineering Languages : en Pages : 400
Book Description
Coulomb Interactions in Particle Beams, Volume 223 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and computing methods used in all these domains, with this release exploring Coulomb Interactions in Particle Beams. - Provides the authority and expertise of leading contributors from an international board of authors - Presents the latest release in the Advances in Imaging and Electron Physics series - Updated release includes the latest information on Coulomb Interactions in Particle Beams
Author: Martin Hÿtch Publisher: Academic Press ISBN: 0323988660 Category : Technology & Engineering Languages : en Pages : 400
Book Description
Coulomb Interactions in Particle Beams, Volume 223 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and computing methods used in all these domains, with this release exploring Coulomb Interactions in Particle Beams. - Provides the authority and expertise of leading contributors from an international board of authors - Presents the latest release in the Advances in Imaging and Electron Physics series - Updated release includes the latest information on Coulomb Interactions in Particle Beams
Author: Albert Septier Publisher: Elsevier ISBN: 0323147186 Category : Science Languages : en Pages : 524
Book Description
Focusing of Charged Particles, Volume I, explains the focusing principles needed to guide the beams of fast particles over long distances and to increase the internal efficiency of particle accelerators. This book discusses the geometrical corpuscular optics as well as the methods for computing fields. Comprised of two parts encompassing two chapters, this volume starts with an overview of the general properties of potentials, fields, and trajectories. This book then examines the methods for resolving Laplace's and Poisson's equations, as well as computing trajectories with or without space charge. Other chapters describe the methods used for the measurement of magnetic field. This text discusses as well the optics of straight axis systems for focusing and producing low-intensity beams. The final chapter deals with the particular and very delicate problem of the production of electron microbes. Engineers, students, and researchers working with charged particles will find this book extremely useful.
Author: O. R. Frisch Publisher: Elsevier ISBN: 1483164705 Category : Science Languages : en Pages : 317
Book Description
Progress in Nuclear Physics, Volume 9 is a collection of six papers dealing with nuclear physics. The monograph discusses the significance of visual techniques in the development of high energy physics; the development of solid semiconductor detectors; theoretical techniques of high-energy beam design; and the structure analysis of collision amplitudes. The book explains that the spark technique is preferred over the bubble chamber when used in experiments with continuous sources of radiation. The use of germanium and silicon semiconductor detectors has enabled advances in studies on protons, alphas, and heavy ions, through fast response time, ease of construction, and simple power requirements. The problems encountered in beam design and effective uses of large accelerators are discussed extensively. For example, the book explains that inefficient beam practice can diminish intensity factors in the accelerator, so different beam designs such as the quadruple and the separated beam design as well as the pulsed high-field magnets are considered. The link between theory and experiment of collision amplitudes is reviewed, including structure analysis in the physics of elementary particles. The resulting processes after strange particles such as K-mesons interact with nuclei, instead of reacting with individual nucleons, are briefly noted. The text also includes discussion on the essential electromagnetic properties of the muon and the different research by Crowe, Charpak et al., and Hughes et al. about this subject. This collection of papers will prove useful for nuclear physicists, scientists, and academicians in the field of nuclear physics.
Author: Peter W. Hawkes Publisher: Academic Press ISBN: 0128134054 Category : Science Languages : en Pages : 767
Book Description
Principles of Electron Optics: Applied Geometrical Optics, Second Edition gives detailed information about the many optical elements that use the theory presented in Volume 1: electrostatic and magnetic lenses, quadrupoles, cathode-lens-based instruments including the new ultrafast microscopes, low-energy-electron microscopes and photoemission electron microscopes and the mirrors found in their systems, Wien filters and deflectors. The chapter on aberration correction is largely new. The long section on electron guns describes recent theories and covers multi-column systems and carbon nanotube emitters. Monochromators are included in the section on curved-axis systems. The lists of references include many articles that will enable the reader to go deeper into the subjects discussed in the text. The book is intended for postgraduate students and teachers in physics and electron optics, as well as researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy and nanolithography. - Offers a fully revised and expanded new edition based on the latest research developments in electron optics - Written by the top experts in the field - Covers every significant advance in electron optics since the subject originated - Contains exceptionally complete and carefully selected references and notes - Serves both as a reference and text
Author: Martin Hÿtch
Author: Martin Hÿtch
Author: P. W. Hawkes
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Author: Albert Septier
Author: O. R. Frisch
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Author: 
Author: Brookhaven National Laboratory
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Author: Peter W. Hawkes