The Electron and the Bit PDF Download

Author: John V. Guttag
Publisher:
ISBN:
Category : Computer science
Languages : en
Pages : 400

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Book Description

Author: Walter J. Kastner
Publisher: CCB Publishing
ISBN: 177143211X
Category : Fiction
Languages : en
Pages : 413

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Book Description
A Certain Ms. Ball is a historical romance adventure for all those eggheads, children, and grownups who want to know how high-tech and the space age were started, who the nerds really were who advanced the arts and the sciences we take for granted today. The interfaces for DVDs, the Internet, lasers, and fiber optics to collect light from a laser source and focus it to a point for readout or for coupling to another fiber optic for communications are tiny glass spheres, some as small as 1/100 of an inch in diameter. Our two-millimeter heroine, Crystal, is born in A.D. 523 on the Arabian shore during a lightning storm. A shepherd boy finds her and keeps her until he dies as sultan. Shahrazad is his destiny, but he will have to wait. Crystal has many adventures with well-known historical figures. Our hero is reborn in 1636 and starts his search for Crystal, from her legend. As Captain Nemo he finds Crystal and his destiny. Their son remains to seek his destiny.

Author: Richard Garfinkle
Publisher: CRC Press
ISBN: 1003860621
Category : Art
Languages : en
Pages : 305

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Book Description
This book gives students and experienced programmers a way to see coding as an art and themselves as artists whose personal views, experiences, and ways of thinking can make their programs better for themselves and their users. This book shows in a good-humored and sympathetic way how the artistic and practical sides of programming are the same, delving into the methods of coding, the history of art, and the ways in which artists and audiences interact and benefit each other. Not confined to a single language or style of coding, this book provides a widely applicable framework for people to learn what languages and styles work best for them at present and as the field evolves. It can be used as a classroom text or for personal study and enrichment.

Author: Anthony Hey
Publisher: CRC Press
ISBN: 0429969007
Category : Science
Languages : en
Pages : 463

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Book Description
Computational properties of use to biological organisms or to the construction of computers can emerge as collective properties of systems having a large number of simple equivalent components (or neurons). The physical meaning of content-addressable memory is described by an appropriate phase space flow of the state of a system. A model of such a system is given, based on aspects of neurobiology but readily adapted to integrated circuits. The collective properties of this model produce a content-addressable memory which correctly yields an entire memory from any subpart of sufficient size. The algorithm for the time evolution of the state of the system is based on asynchronous parallel processing. Additional emergent collective properties include some capacity for generalization, familiarity recognition, categorization, error correction, and time sequence retention. The collective properties are only weakly sensitive to details of the modeling or the failure of individual devices.

Author: Tom Yulsman
Publisher: CRC Press
ISBN: 1040160573
Category : Science
Languages : en
Pages : 215

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Book Description
With stunning regularity, the search for our cosmic roots has been yielding remarkable new discoveries about the universe and our place in it. In his compelling book, Origins: The Quest for Our Cosmic Roots addresses some of the most profound issues humans have ever confronted. In his compelling book, veteran science journalist Tom Yulsman chronicles the latest discoveries and describes in clear and engaging terms what they mean. From the interior of protons to the outer reaches of the universe, and from the control room of one of the world's most powerful particle accelerators to an observatory atop the tallest mountain in the Pacific basin, Yulsman takes readers on a fantastic voyage at the cutting edge of science.

Author:
Publisher: Academic Press
ISBN: 0080577296
Category : Science
Languages : en
Pages : 317

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Book Description
Advances in Electronics and Electron Physics

Author: George Brewer
Publisher: Elsevier
ISBN: 0323153410
Category : Technology & Engineering
Languages : en
Pages : 377

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Book Description
Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.

Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1454

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Author:
Publisher:
ISBN:
Category : Patents
Languages : en
Pages : 816

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Book Description

Author: William B. Glendinning
Publisher: William Andrew
ISBN: 1437728227
Category : Technology & Engineering
Languages : en
Pages : 672

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Book Description
This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.