Author: Akhter Uddin AhmedPublisher:
ISBN:
Category :
Languages : en
Pages : 418
Book Description
The Electrical, Structural, and Optical Properties of Aluminum Nitride Thin Films Deposited by Atmospheric Pressure Metal-organic Chemical Vapor Deposition
Author: Akhter Uddin AhmedScientific and Technical Aerospace Reports
Author: Electrical & Electronics Abstracts
Author: Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 2304
Book Description
International Aerospace Abstracts
Author: Modern Aspects of Bulk Crystal and Thin Film Preparation
Author: Nikolai KolesnikovPublisher: BoD – Books on Demand
ISBN: 9533076100
Category : Science
Languages : en
Pages : 622
Book Description
In modern research and development, materials manufacturing crystal growth is known as a way to solve a wide range of technological tasks in the fabrication of materials with preset properties. This book allows a reader to gain insight into selected aspects of the field, including growth of bulk inorganic crystals, preparation of thin films, low-dimensional structures, crystallization of proteins, and other organic compounds.
Structural, Dielectric, and Optical Properties of Potassium Tantalate Niobate Thin Films Prepared by Metalorganic Chemical Vapor Deposition
Author: Barbara Michelle NicholsPublisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
The structure-property relations of potassium tantalate niobate (KTaxNb1-xO 3) thin films have been investigated to assess their viability as nonlinear optical materials. Single phase, epitaxial films were deposited by low pressure metalorganic chemical vapor deposition over the entire solid solution range. Under optimized growth conditions, the composition of the films could be controlled within 5 atomic percent.
Chemical Abstracts
Author: Preparation and Properties of Aluminum Nitride Films by Plasma-enhanced Metal-organic Chemical Vapor Deposition
Author: Chin Hsiung HoMetals Abstracts Index
Author: Handbook of Deposition Technologies for Films and Coatings
Author: Peter M. MartinPublisher: William Andrew
ISBN: 0815520328
Category : Technology & Engineering
Languages : en
Pages : 932
Book Description
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.