Author: Hector T. H. ChenPublisher:
ISBN:
Category :
Languages : en
Pages : 278
Book Description
The Effects of Synchrotron Radiation on the Mechanical Properties of X-ray Lithography Mask Membranes
Author: Hector T. H. ChenFrom Instrumentation to Nanotechnology
Author: J.W. GardnerPublisher: CRC Press
ISBN: 1040294308
Category : Technology & Engineering
Languages : en
Pages : 350
Book Description
Addressed to physical and chemical scientists and engineers, this book provides information on the design, manufacture, and assessment of components with critical dimensions or critical tolerances in the 0.1-100 nanometer range. Such tiny parts are now used in automobile engines, cassette players, and other common products. The 16 lectures presented are from an advanced vacation school on instrumentation and nanotechnology in Warwick, England, September 1990. Among the topics are signal processing, ultrasonic sensors, and nanoactuators for controlled displacements. .
Analysis and Simulation of Pattern Placement Errors in Advanced Lithographic Masks
Author: Adam H. FisherMechanical Characterization of X-ray and SCALPEL Lithographic Masks
Author: Michael P. SchlaxPlasma Processing for VLSI
Author: Norman G. EinspruchPublisher: Academic Press
ISBN: 1483217752
Category : Technology & Engineering
Languages : en
Pages : 544
Book Description
VLSI Electronics: Microstructure Science, Volume 8: Plasma Processing for VLSI (Very Large Scale Integration) discusses the utilization of plasmas for general semiconductor processing. It also includes expositions on advanced deposition of materials for metallization, lithographic methods that use plasmas as exposure sources and for multiple resist patterning, and device structures made possible by anisotropic etching. This volume is divided into four sections. It begins with the history of plasma processing, a discussion of some of the early developments and trends for VLSI. The second section, Deposition, discusses deposition techniques for VLSI such as sputtering metals for metallization and contacts, plasma-enhanced chemical vapor deposition of metals and suicides, and plasma enhanced chemical vapor deposition of dielectrics. The part on Lithography presents the high-resolution trilayer resist system, pulsed x-ray sources for submicrometer x-ray lithography, and high-intensity deep-UV sources. The last part, Etching, provides methods in etching, like ion-beam etching using reactive gases, low-pressure reactive ion etching, and the uses of inert-gas ion milling. The theory and mechanisms of plasma etching are described and a number of new device structures made possible by anisotropic etching are enumerated as well. Scientists, engineers, researchers, device designers, and systems architects will find the book useful.
LIGA and its Applications
Author: Volker SailePublisher: John Wiley & Sons
ISBN: 3527316981
Category : Technology & Engineering
Languages : en
Pages : 491
Book Description
Covering technological aspects as well as the suitability and applicability of various kinds of uses, this handbook shows optimization strategies, techniques and assembly pathways to achieve the combination of complex, even three-dimensional structures with simple manufacturing steps. The authors provide information on markets, commercialization opportunities and aspects of mass or large-scale production as well as design tools, experimental techniques, novel materials, and ideas for future improvements. Not only do they weigh up cost versus quantity, they also consider CMOS and LIGA strategies. Of interest to physicists, electronics engineers, materials scientists, institutional and industrial libraries as well as graduate students of the relevant disciplines.
The Physics of Submicron Lithography
Author: Kamil A. ValievPublisher: Springer Science & Business Media
ISBN: 146153318X
Category : Science
Languages : en
Pages : 502
Book Description
This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.
Synchrotron Radiation Research
Author: Herman WinickPublisher: Springer Science & Business Media
ISBN: 1461579988
Category : Medical
Languages : en
Pages : 767
Book Description
This book has grown out of our shared experience in the development of the Stanford Synchrotron Radiation Laboratory (SSRL), based on the electron-positron storage ring SPEAR at the Stanford Linear Accelerator Center (SLAC) starting in Summer, 1973. The immense potential of the photon beam from SPEAR became obvious as soon as experiments using the beam started to run in May, 1974. The rapid growth of interest in using the beam since that time and the growth of other facilities using high-energy storage rings (see Chapters 1 and 3) demonstrates how the users of this source of radiation are finding applications in an increasingly wide variety of fields of science and technology. In assembling the list of authors for this book, we have tried to cover as many of the applications of synchrotron radiation, both realized already or in the process of realization, as we can. Inevitably, there are omissions both through lack of space and because many projects are at an early stage. We thank the authors for their efforts and cooperation in producing what we believe is the most comprehensive treatment of synchrotron radiation research to date.
From Galileo's "Occhialino" To Optoelectronics
Author: Paolo MazzoldiPublisher: World Scientific
ISBN: 981455328X
Category :
Languages : en
Pages : 962
Book Description
The aim of the Conference was to emphasize the state-of-art in the development of new materials and processes for use in optoelectronics, the technological innovations and applications of optical materials and systems in different disciplines, the potential and actual transfer of technologies and industrial know-how among different countries, the perspectives of new applications and industrial needs for optical materials and systems, the need for a “forum” for cooperation between Laboratories and Industries of different countries.The papers in the proceedings discuss the complexity in nonlinear optics, potentiality of molecular optoelectronics, the development of novel optical fabrication techniques, such as sol-gel and ion implantation, of glasses and glass ceramics materials for modern optical applications, of active glasses for integrated optics, laser glasses, electrochromic coatings.
Dissertation Abstracts International
Author: Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 700
Book Description