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Author: A. K. Tyagi Publisher: Elsevier ISBN: 0128014423 Category : Technology & Engineering Languages : en Pages : 872
Book Description
Materials Under Extreme Conditions: Recent Trends and Future Prospects analyzes the chemical transformation and decomposition of materials exposed to extreme conditions, such as high temperature, high pressure, hostile chemical environments, high radiation fields, high vacuum, high magnetic and electric fields, wear and abrasion related to chemical bonding, special crystallographic features, and microstructures. The materials covered in this work encompass oxides, non-oxides, alloys and intermetallics, glasses, and carbon-based materials. The book is written for researchers in academia and industry, and technologists in chemical engineering, materials chemistry, chemistry, and condensed matter physics. - Describes and analyzes the chemical transformation and decomposition of a wide range of materials exposed to extreme conditions - Brings together information currently scattered across the Internet or incoherently dispersed amongst journals and proceedings - Presents chapters on phenomena, materials synthesis, and processing, characterization and properties, and applications - Written by established researchers in the field
Author: A. K. Tyagi Publisher: Elsevier ISBN: 0128014423 Category : Technology & Engineering Languages : en Pages : 872
Book Description
Materials Under Extreme Conditions: Recent Trends and Future Prospects analyzes the chemical transformation and decomposition of materials exposed to extreme conditions, such as high temperature, high pressure, hostile chemical environments, high radiation fields, high vacuum, high magnetic and electric fields, wear and abrasion related to chemical bonding, special crystallographic features, and microstructures. The materials covered in this work encompass oxides, non-oxides, alloys and intermetallics, glasses, and carbon-based materials. The book is written for researchers in academia and industry, and technologists in chemical engineering, materials chemistry, chemistry, and condensed matter physics. - Describes and analyzes the chemical transformation and decomposition of a wide range of materials exposed to extreme conditions - Brings together information currently scattered across the Internet or incoherently dispersed amongst journals and proceedings - Presents chapters on phenomena, materials synthesis, and processing, characterization and properties, and applications - Written by established researchers in the field
Author: Professor K.S. K.S Sree Harsha Publisher: Elsevier ISBN: 0080480314 Category : Technology & Engineering Languages : en Pages : 1173
Book Description
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.* Offers detailed derivation of important formulae.* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
Author: S.D. Brotherton Publisher: Springer Science & Business Media ISBN: 3319000020 Category : Technology & Engineering Languages : en Pages : 467
Book Description
Introduction to Thin Film Transistors reviews the operation, application and technology of the main classes of thin film transistor (TFT) of current interest for large area electronics. The TFT materials covered include hydrogenated amorphous silicon (a-Si:H), poly-crystalline silicon (poly-Si), transparent amorphous oxide semiconductors (AOS), and organic semiconductors. The large scale manufacturing of a-Si:H TFTs forms the basis of the active matrix flat panel display industry. Poly-Si TFTs facilitate the integration of electronic circuits into portable active matrix liquid crystal displays, and are increasingly used in active matrix organic light emitting diode (AMOLED) displays for smart phones. The recently developed AOS TFTs are seen as an alternative option to poly-Si and a-Si:H for AMOLED TV and large AMLCD TV applications, respectively. The organic TFTs are regarded as a cost effective route into flexible electronics. As well as treating the highly divergent preparation and properties of these materials, the physics of the devices fabricated from them is also covered, with emphasis on performance features such as carrier mobility limitations, leakage currents and instability mechanisms. The thin film transistors implemented with these materials are the conventional, insulated gate field effect transistors, and a further chapter describes a new thin film transistor structure: the source gated transistor, SGT. The driving force behind much of the development of TFTs has been their application to AMLCDs, and there is a chapter dealing with the operation of these displays, as well as of AMOLED and electrophoretic displays. A discussion of TFT and pixel layout issues is also included. For students and new-comers to the field, introductory chapters deal with basic semiconductor surface physics, and with classical MOSFET operation. These topics are handled analytically, so that the underlying device physics is clearly revealed. These treatments are then used as a reference point, from which the impact of additional band-gap states on TFT behaviour can be readily appreciated. This reference book, covering all the major TFT technologies, will be of interest to a wide range of scientists and engineers in the large area electronics industry. It will also be a broad introduction for research students and other scientists entering the field, as well as providing an accessible and comprehensive overview for undergraduate and postgraduate teaching programmes.
Author: Oliver A Williams Publisher: Royal Society of Chemistry ISBN: 1849737614 Category : Science Languages : en Pages : 553
Book Description
The exceptional mechanical, optical, surface and biocompatibility properties of nanodiamond have gained it much interest. Exhibiting the outstanding bulk properties of diamond at the nanoscale in the form of a film or small particle makes it an inexpensive alternative for many applications. Nanodiamond is the first comprehensive book on the subject. The book reviews the state of the art of nanodiamond films and particles covering the fundamentals of growth, purification and spectroscopy and some of its diverse applications such as MEMS, drug delivery and biomarkers and biosensing. Specific chapters include the theory of nanodiamond, diamond nucleation, low temperature growth, diamond nanowires, electrochemistry of nanodiamond, nanodiamond flexible implants, and cell labelling with nanodiamond particles. Edited by a leading expert in nanodiamonds, this is the perfect resource for those new to, and active in, nanodiamond research and those interested in its applications.
Author: Mineo Hiramatsu Publisher: Springer Science & Business Media ISBN: 3211997180 Category : Technology & Engineering Languages : en Pages : 168
Book Description
Representing the first text to cover this exciting new area of research, this book will describe synthesis techniques of CNWs, their characterization and various expected applications using CNWs. Carbon-nanowalls (CNWs) can be described as two-dimensional graphite nanostructures with edges comprised of stacks of plane graphene sheets standing almost vertically on the substrate. These sheets form a wall structure with a high aspect ratio. The thickness of CNWs ranges from a few nm to a few tens of nm. The large surface area and sharp edges of CNWs may prove useful for a number of applications such as electrochemical devices, field electron emitters, storage materials for hydrogen gas, catalyst support. In particular, vertically standing CNWs with a high surface-to-volume ratio, serve as an ideal material for catalyst support for fuel cells and in gas storage materials.
Author: A. K. Tyagi
Author: A. K. Tyagi
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Author: Professor K.S. K.S Sree Harsha
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Author: S.D. Brotherton
Author: Oliver A Williams
Author: Mineo Hiramatsu