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The Characterization of Thin Carbon Films Created Via Radio Frequency Plasma-enhanced Chemical Vapor Deposition

The Characterization of Thin Carbon Films Created Via Radio Frequency Plasma-enhanced Chemical Vapor Deposition PDF Author: George Tecos
Publisher:
ISBN:
Category : Crystalline polymers
Languages : en
Pages : 112

Book Description
Various deposition parameters have been adopted to deposit carbon-based thin films on silicon subtrates via Plasma-Enhanced Chemical Vapor Detection (PECVD) with a Radio-Frequency Plasma. We seek a recipe and formulation for carbon film deposition by varying the ratios of input gases and subtrate temperature, with the goal of observing these effects on the deposited carbon film. Characterization of the samples was carried out through various procedures, including the Ion Beam Analysis (IBA) techniques: Rutherford/Non-Rutherford Backscattering Spectrometry (RBS/NRBS), Elastic Recoil Detection Analysis (ERDA), and Raman Spectroscopy. This data was analyzed to determine the purity, quality, elemental compensation, and interface integrity of each respective sample. We conclude that the films deposited on Si subtrates are polymer-like carbon films with 30-35 at% C and 65-70 at% H. The interface between the film and subtrate was found to be abrupt. The effect of subtrate temperature on the microstructure of the deposited films was found to be inconclusive. This study will lay the basis for future explorations into Western Michigan University produced CVD carbon-based films, and investigate the properties of these unique and profitable materials.

The Characterization of Thin Carbon Films Created Via Radio Frequency Plasma-enhanced Chemical Vapor Deposition

The Characterization of Thin Carbon Films Created Via Radio Frequency Plasma-enhanced Chemical Vapor Deposition PDF Author: George Tecos
Publisher:
ISBN:
Category : Crystalline polymers
Languages : en
Pages : 112

Book Description
Various deposition parameters have been adopted to deposit carbon-based thin films on silicon subtrates via Plasma-Enhanced Chemical Vapor Detection (PECVD) with a Radio-Frequency Plasma. We seek a recipe and formulation for carbon film deposition by varying the ratios of input gases and subtrate temperature, with the goal of observing these effects on the deposited carbon film. Characterization of the samples was carried out through various procedures, including the Ion Beam Analysis (IBA) techniques: Rutherford/Non-Rutherford Backscattering Spectrometry (RBS/NRBS), Elastic Recoil Detection Analysis (ERDA), and Raman Spectroscopy. This data was analyzed to determine the purity, quality, elemental compensation, and interface integrity of each respective sample. We conclude that the films deposited on Si subtrates are polymer-like carbon films with 30-35 at% C and 65-70 at% H. The interface between the film and subtrate was found to be abrupt. The effect of subtrate temperature on the microstructure of the deposited films was found to be inconclusive. This study will lay the basis for future explorations into Western Michigan University produced CVD carbon-based films, and investigate the properties of these unique and profitable materials.

Carbon Nanowalls

Carbon Nanowalls PDF Author: Mineo Hiramatsu
Publisher: Springer Science & Business Media
ISBN: 3211997180
Category : Technology & Engineering
Languages : en
Pages : 168

Book Description
Representing the first text to cover this exciting new area of research, this book will describe synthesis techniques of CNWs, their characterization and various expected applications using CNWs. Carbon-nanowalls (CNWs) can be described as two-dimensional graphite nanostructures with edges comprised of stacks of plane graphene sheets standing almost vertically on the substrate. These sheets form a wall structure with a high aspect ratio. The thickness of CNWs ranges from a few nm to a few tens of nm. The large surface area and sharp edges of CNWs may prove useful for a number of applications such as electrochemical devices, field electron emitters, storage materials for hydrogen gas, catalyst support. In particular, vertically standing CNWs with a high surface-to-volume ratio, serve as an ideal material for catalyst support for fuel cells and in gas storage materials.

Synthesis and Characterization of Hydrogenated Amorphous Carbon Films Deposited by Plasma-enhanced Chemical Vapor Deposition of Cyclohexane Precursor

Synthesis and Characterization of Hydrogenated Amorphous Carbon Films Deposited by Plasma-enhanced Chemical Vapor Deposition of Cyclohexane Precursor PDF Author: Thomas J. Poché
Publisher:
ISBN:
Category : Amorphous substances
Languages : en
Pages : 0

Book Description


Plasma Enhanced Chemical Vapor Deposition and Physical Characterization of Tin Oxide Thin Films

Plasma Enhanced Chemical Vapor Deposition and Physical Characterization of Tin Oxide Thin Films PDF Author: Joshua Robbins
Publisher:
ISBN:
Category : Oxides
Languages : en
Pages : 246

Book Description


Synthetic Diamond

Synthetic Diamond PDF Author: Karl E. Spear
Publisher: John Wiley & Sons
ISBN: 9780471535898
Category : Technology & Engineering
Languages : en
Pages : 690

Book Description
A riveting look at the science, technology and people involved in overcoming early impracticalities of the fledgling chemical vapor deposition (CVD) synthesis method and its development in today's state of commercial readiness. Provides insights into numerous vapor phase techniques. Surveys the synthesis, structure, properties and applications of diamondlike carbon. Details current and rapidly emerging applications, manufacturing and markets.

Plasma Enhanced Chemical Vapor Deposition of Diamondlike Carbon Films Using Acetylene

Plasma Enhanced Chemical Vapor Deposition of Diamondlike Carbon Films Using Acetylene PDF Author: Sriram Vishwanathan
Publisher:
ISBN:
Category : Diamond thin films
Languages : en
Pages : 114

Book Description
This study is focussed on the synthesis and characterization of diamondlike carbon (DLQ films deposited on silicon wafers and glass by plasma enhanced chemical vapor deposition (PECVD), using acetylene (C2H4) as a precursor. The process parameters, such as temperature, pressure, power and reactant gas flow rate have been systematically varied and their effects on the film growth rate and properties were investigated. The optimized deposition condition appeared to be at 150°C, 200mTorr, 200 Watts and flow rate = 25 sccm. For these conditions, the films were hard and found to have good adhesion to the substrate, and resistant to BF etching (49% BY diluted to 10% with distilled water). It was found that the adhesion of the DLC film to the substrate is good if the substrate is first etched with oxygen and CF4 prior to the deposition.

Synthesis and Characterization of Diamond-like Carbon Coatings Deposited by Plasma Source Ion Implantation and Conventional Ion Beam Assisted Deposition Processes

Synthesis and Characterization of Diamond-like Carbon Coatings Deposited by Plasma Source Ion Implantation and Conventional Ion Beam Assisted Deposition Processes PDF Author: Brian M. Stout
Publisher:
ISBN:
Category :
Languages : en
Pages : 114

Book Description
Diamond-like carbon coatings produced by Plasma Source Ion Implantation (PSII) and beamline Ion Beam Assisted Deposition (IBAD) were synthesized and studied. Gas pressure and electrical current were used as variables to design four independent PSII test sets. Beamline IBAD samples were produced with a pre-optimized set of parameters. Profilometry measurements showed the films to have thicknesses between 1.44 +/- 09 and 1.64 +/- 04 microns and to possess very low roughness averages, ranging from 14 +/- 3 to 28 +/- 3 nm, which correlate with substrate surface roughness. Atomic Force Microscopy revealed that diamond-like carbon crystal sizes varied significantly with chamber pressure. Crystals were generally spherical in shape suggesting that films were highly amorphous. Microhardness and nanohardness test results showed the hardest films to be greater than 3 times the hardness of untreated steel. The elastic modulus of the films, measured during the nanohardness test, was directly related to film hardness. Fretting wear and Pin-on-Disk tests were performed to quantitatively assess the ability of films to resist wear. Fretting wear tests showed a dramatic decrease in friction for diamond-like carbon films with friction levels ranging from 10% to 30% of that of untreated steel. Pin-on-Disk tests revealed a significant improvement in wear resistance prior to stylus penetration into the substrate.

Synthesis and Characterization of Amorphous Carbon Films for Magnetic Storage Technology

Synthesis and Characterization of Amorphous Carbon Films for Magnetic Storage Technology PDF Author: Jun Xie
Publisher:
ISBN:
Category :
Languages : en
Pages : 119

Book Description
Increasing demands for high magnetic storage capacity have led to the increase of the recording area density, mainly by reducing the distance between the magnetic media on the hard disk and the magnetic transducer of the head. A factor that has greatly contributed to the profound decrease of the magnetic spacing is excessive thinning of the protective amorphous carbon (a-C) overcoat. However, the remarkable decrease in overcoat thickness raises a concern about its quality and protective capability. In general, a-C films with higher sp3 carbon atom hybridization demonstrate higher density and better tribomechanical and corrosion properties. The sp2 and sp3 contents strongly depend on the film-growth conditions and deposition method. One of the most common film deposition methods is radio-frequency (RF) sputtering. This method uses low-energy neutral carbon atoms or clusters of atoms as film precursors and has been the workhorse of storage technology for more than four decades. Typically, Ar+ ion bombardment of the growing film during film growth is used to tailor the overcoat structure and properties without affecting its chemical environment. The substrate bias voltage is a key deposition parameter because it directly affects the ion bombardment energy. In this dissertation, the effect of the substrate bias voltage on the growth and properties of ultrathin a-C films was examined and the identified film structure-property interdependencies were explained in the context of an analytical model, which takes into account the effects of irradiation damage and thermal spikes. Substrate biasing during film deposition may lead to some undesirable effects, such as the development of a high compressive residual stress, which can cause premature overcoat failure by delamination. Experimental studies of this dissertation show that alternating between biasing and non-biasing deposition conditions, multi-layer a-C films consisting of ultrathin hard (bias on) and soft (bias off) layers characterized by high sp3 fraction and greatly reduced compressive residual stress can be synthesized by RF sputtering. An additional advantage is that these multi-layer a-C films exhibit lower surface roughness and improved tribological properties. Different from deposition methods using neutral carbon atoms as film-forming precursors, such as RF sputtering and other physical vapor deposition methods, filtered cathodic vacuum arc (FCVA) uses energetic C+ ions as film precursors, which is advantageous for depositing ultrathin and very smooth a-C films with superior nanomechanical/tribological properties. The role of important FCVA process parameters, such as substrate bias voltage, which controls the C+ ion energy, in the film growth process were investigated, while considering various means of reducing the a-C film thickness without jeopardizing its structure and properties. The effect of the duty cycle of substrate pulse biasing (i.e., the ratio of the time of substrate biasing over a pulse to the pulse bias period) was examined in terms of film deposition rate, surface topography, and nanostructure. Cross-sectional high-resolution transmission electron microscopy (HRTEM) combined with the scanning transmission electron microscopy (STEM) and electron energy loss spectroscopy (EELS) studies revealed variations in through-thickness hybridization and density with duty cycle. a-C films with the highest sp3 content and smallest thickness were synthesized under FCVA deposition conditions of 75% and 65% duty cycle, respectively. EELS studies show that a-C films generally possess a multi-layered structure consisting of surface and interface layers of relatively low sp3 contents and intermediate bulk layer of much higher sp3 content, a result of the deposition mechanisms encountered during ion bombardment. When the a-C film thickness is reduced to only 2-3 nm, the effects of the ultrathin (1-2 nm) surface and interface layers become increasingly more pronounced, resulting in the decrease of the overall sp3 content and, in turn, depletion of the film's protective capability. To reduce the thickness of the interface layer, a thin (

Microwave Plasma-enhanced Chemical Vapor Deposition and Characterization of Diamond and Silicon Nitride Thin Films

Microwave Plasma-enhanced Chemical Vapor Deposition and Characterization of Diamond and Silicon Nitride Thin Films PDF Author: Kevin John Grannen
Publisher:
ISBN:
Category :
Languages : en
Pages :

Book Description


Radio Frequency Plasma Assisted Chemical Vapor Deposition of Carbon Films from Ethane-hydrogen Mixtures

Radio Frequency Plasma Assisted Chemical Vapor Deposition of Carbon Films from Ethane-hydrogen Mixtures PDF Author: Shyankay Jou
Publisher:
ISBN:
Category :
Languages : en
Pages : 148

Book Description