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Author: Fuquan Zhao Publisher: SAE International ISBN: 0768014204 Category : Technology & Engineering Languages : en Pages : 728
Book Description
During the last several years, significant efforts have been directed toward the development of ultra-clean, gasoline-powered vehicles in the automotive industry. With the coming of increasingly stringent emissions legislation, this development is more critical now than ever before. This has lead to an increase in the technical information available. Advanced Developments in Ultra-Clean Gasoline-Powered Vehicles provides the reader with technical information including a description of fundamental processes, insight on technical issues, key trends, and future R&D directions.
Author: Fuquan Zhao Publisher: SAE International ISBN: 0768014204 Category : Technology & Engineering Languages : en Pages : 728
Book Description
During the last several years, significant efforts have been directed toward the development of ultra-clean, gasoline-powered vehicles in the automotive industry. With the coming of increasingly stringent emissions legislation, this development is more critical now than ever before. This has lead to an increase in the technical information available. Advanced Developments in Ultra-Clean Gasoline-Powered Vehicles provides the reader with technical information including a description of fundamental processes, insight on technical issues, key trends, and future R&D directions.
Author: Ohmi Publisher: Routledge ISBN: 1351406426 Category : Science Languages : en Pages : 948
Book Description
Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int
Author: Takeshi Hattori Publisher: Springer Science & Business Media ISBN: 3662035359 Category : Technology & Engineering Languages : en Pages : 634
Book Description
A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.
Author: Tadahiro Ohmi Publisher: CRC Press ISBN: 1420026860 Category : Science Languages : en Pages : 402
Book Description
As science pushes closer toward the atomic size scale, new challenges arise to slow the pace of the miniaturization that has transformed our society and fueled the information age. New technologies are necessary to surpass these obstacles and realize the tremendous growth predicted by Moore's law. Assembled from the works of pioneering researchers, Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing presents new developments and technologies for producing the next generation of electronic circuits and displays. This book introduces radical-reaction-based semiconductor manufacturing technologies that overcome the limitations of the existing molecule-reaction-based technologies. It systematically details the procedures and underlying concepts involved in wet process technologies and applications. Following an introduction to semiconductor surface chemical electronics, expert contributors discuss the principles and technology of high-performance wet cleaning; etching technologies and processes; antistatic technology; wet vapor resist stripping technology; and process and safety technologies including waste reclamation, chemical composition control, and ultrapure water and liquid chemical supply systems and materials for fluctuation-free facilities. Currently, large production runs are needed to balance the costs of acquiring and tuning equipment for specialized operating conditions. Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing explains the technologies and processes used to meet the demand for variety and low volumes that exists in today's digital electronics marketplace.
Author: K.L. Mittal Publisher: Springer Science & Business Media ISBN: 1489923675 Category : Science Languages : en Pages : 319
Book Description
This volume chronicles the proceedings of the Third Symposium on Particles on Surfaces : Detection, Adhesion and Removal held as a part of the 21st Annual Meeting of the Fine Particle Society in San Diego , California, August 21 - 25 , 1990 . The first two symposia i n t h i s series were held in 1986 and 1988 , respectively, and have been properly l documented ,2. Li ke its antecedent s the Third symposium was very well received, and the continuing success of these symposia reinforced our earlier belief that regular symposia on the topic of particles on surfaces were very much needed. Concomitantly, the fourth symposium in this series is planned in Las Vegas , July 13-17 , 199 2 . l As pointed out in the Preface to the earlier two volumes ,2, the topic of particles on surfaces is of tremendous interest and concern in a wide spectrum of technological areas . The objectives of the Third symposium were es s ent i a l ly the same as those of the earlier two and our intent her e was to provide an update on the research and development activities in the world of particles on surfaces . Apropos , there has been a deliberate attempt every time to s eek out new people to present their research results and we have been very succes s f ul in this mission.
Author: Avinash Kumar Agarwal Publisher: Springer Nature ISBN: 9811612803 Category : Technology & Engineering Languages : en Pages : 319
Book Description
This monograph is based on methanol as a fuel for transportation sector, specifically for compression ignition (CI) engines. The contents present examples of utilization of methanol as a fuel for CI engines in different modes of transportation such as railroad, personal vehicles or heavy duty road transportation. The book also focuses on effect of methanol on combustion and performance characteristics of the engine. The effect of methanol on exhaust emission production, prediction and control is also discussed. It also discusses current methanol utilization and its potential, its effect on the engine in terms of efficiency, combustion, performance, pollutants formation and prediction. Part of the chapters are based on review of state-of-the-art while other chapters are dedicated to an original research. This volume will be a useful guide to professionals and academics involved in alternative fuels, compression ignition engines, and environmental research.
Author: Fuquan Zhao
Author: Fuquan Zhao
Author: Ohmi
Author: Takeshi Hattori
Author: 
Author: Tadahiro Ohmi
Author: K.L. Mittal
Author: 
Author: 
Author: Avinash Kumar Agarwal
Author: