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Author: Howard Huff Publisher: Springer Science & Business Media ISBN: 9783540210818 Category : Science Languages : en Pages : 740
Book Description
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.
Author: Howard Huff Publisher: Springer Science & Business Media ISBN: 9783540210818 Category : Science Languages : en Pages : 740
Book Description
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.
Author: Massoud Pedram Publisher: Springer Science & Business Media ISBN: 0306481391 Category : Technology & Engineering Languages : en Pages : 533
Book Description
Power Aware Design Methodologies was conceived as an effort to bring all aspects of power-aware design methodologies together in a single document. It covers several layers of the design hierarchy from technology, circuit logic, and architectural levels up to the system layer. It includes discussion of techniques and methodologies for improving the power efficiency of CMOS circuits (digital and analog), systems on chip, microelectronic systems, wirelessly networked systems of computational nodes and so on. In addition to providing an in-depth analysis of the sources of power dissipation in VLSI circuits and systems and the technology and design trends, this book provides a myriad of state-of-the-art approaches to power optimization and control. The different chapters of Power Aware Design Methodologies have been written by leading researchers and experts in their respective areas. Contributions are from both academia and industry. The contributors have reported the various technologies, methodologies, and techniques in such a way that they are understandable and useful.
Author: Samares Kar Publisher: The Electrochemical Society ISBN: 1566775701 Category : Dielectrics Languages : en Pages : 676
Book Description
This issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Author: Nadine Collaert Publisher: Woodhead Publishing ISBN: 0081020627 Category : Technology & Engineering Languages : en Pages : 390
Book Description
High Mobility Materials for CMOS Applications provides a comprehensive overview of recent developments in the field of (Si)Ge and III-V materials and their integration on Si. The book covers material growth and integration on Si, going all the way from device to circuit design. While the book's focus is on digital applications, a number of chapters also address the use of III-V for RF and analog applications, and in optoelectronics. With CMOS technology moving to the 10nm node and beyond, however, severe concerns with power dissipation and performance are arising, hence the need for this timely work on the advantages and challenges of the technology. - Addresses each of the challenges of utilizing high mobility materials for CMOS applications, presenting possible solutions and the latest innovations - Covers the latest advances in research on heterogeneous integration, gate stack, device design and scalability - Provides a broad overview of the topic, from materials integration to circuits
Author: Rainer Waser Publisher: John Wiley & Sons ISBN: 9783527317370 Category : Technology & Engineering Languages : en Pages : 418
Book Description
This second of two volumes on applications in information technology is divided into two main sections. The first covers logic devices and concepts, ranging from advanced and non-conventional CMOS and semiconductor nanowire devices, via various spin-controlled logic devices and concepts involving carbon nanotubes, organic thin films, as well as single organic molecules, right up to the visionary idea of intramolecular computation. The second part, architectures and computational concepts, discusses biologically inspired structures and quantum cellular automata, finishing off by summarizing the main principles and current approaches to coherent solid-state-based quantum computation.
Author: Steven H. Voldman Publisher: John Wiley & Sons ISBN: 1119233100 Category : Technology & Engineering Languages : en Pages : 1168
Book Description
A practical and comprehensive reference that explores Electrostatic Discharge (ESD) in semiconductor components and electronic systems The ESD Handbook offers a comprehensive reference that explores topics relevant to ESD design in semiconductor components and explores ESD in various systems. Electrostatic discharge is a common problem in the semiconductor environment and this reference fills a gap in the literature by discussing ESD protection. Written by a noted expert on the topic, the text offers a topic-by-topic reference that includes illustrative figures, discussions, and drawings. The handbook covers a wide-range of topics including ESD in manufacturing (garments, wrist straps, and shoes); ESD Testing; ESD device physics; ESD semiconductor process effects; ESD failure mechanisms; ESD circuits in different technologies (CMOS, Bipolar, etc.); ESD circuit types (Pin, Power, Pin-to-Pin, etc.); and much more. In addition, the text includes a glossary, index, tables, illustrations, and a variety of case studies. Contains a well-organized reference that provides a quick review on a range of ESD topics Fills the gap in the current literature by providing information from purely scientific and physical aspects to practical applications Offers information in clear and accessible terms Written by the accomplished author of the popular ESD book series Written for technicians, operators, engineers, circuit designers, and failure analysis engineers, The ESD Handbook contains an accessible reference to ESD design and ESD systems.
Author: Tomasz Brozek Publisher: CRC Press ISBN: 1351831348 Category : Technology & Engineering Languages : en Pages : 388
Book Description
Micro- and Nanoelectronics: Emerging Device Challenges and Solutions presents a comprehensive overview of the current state of the art of micro- and nanoelectronics, covering the field from fundamental science and material properties to novel ways of making nanodevices. Containing contributions from experts in both industry and academia, this cutting-edge text: Discusses emerging silicon devices for CMOS technologies, fully depleted device architectures, characteristics, and scaling Explains the specifics of silicon compound devices (SiGe, SiC) and their unique properties Explores various options for post-CMOS nanoelectronics, such as spintronic devices and nanoionic switches Describes the latest developments in carbon nanotubes, iii-v devices structures, and more Micro- and Nanoelectronics: Emerging Device Challenges and Solutions provides an excellent representation of a complex engineering field, examining emerging materials and device architecture alternatives with the potential to shape the future of nanotechnology.
Author: Yogesh Singh Chauhan Publisher: Elsevier ISBN: 0323958230 Category : Technology & Engineering Languages : en Pages : 326
Book Description
FinFET/GAA Modeling for IC Simulation and Design: Using the BSIM-CMG Standard, Second Edition is the first to book to explain FinFET modeling for IC simulation and the industry standard – BSIM-CMG - describing the rush in demand for advancing the technology from planar to 3D architecture as now enabled by the approved industry standard. The book gives a strong foundation on the physics and operation of FinFET, details aspects of the BSIM-CMG model such as surface potential, charge and current calculations, and includes a dedicated chapter on parameter extraction procedures, thus providing a step-by-step approach for the efficient extraction of model parameters. With this book, users will learn Why you should use FinFET, The physics and operation of FinFET Details of the FinFET standard model (BSIM-CMG), Parameter extraction in BSIM-CMG FinFET circuit design and simulation, and more. - Authored by the lead inventor and developer of FinFET and developers of the BSIM-CMG standard model, providing an expert's insight into the specifications of the standard - A new edition of the original groundbreaking book on the industry-standard FinFET model—BSIM-CMGNew to This Edition - Includes a new chapter providing a comprehensive introduction to GAAFET, including motivations, device concepts, structure, benefits, and the industry standard GAAFET model - Covers the most recent developments in the BSIM-CMG model - Presents an updated RF modeling of FinFET using the BSIM-CMG model including parameter extraction - Includes a new chapter on cryogenic modeling
Author: Howard Huff
Author: Howard Huff
Author: Massoud Pedram
Author: Cor L. Claeys
Author: Samares Kar
Author: C. Claeys
Author: Nadine Collaert
Author: Rainer Waser
Author: Steven H. Voldman
Author: Tomasz Brozek
Author: Yogesh Singh Chauhan