![Synthesis of YBa2Cu3O--[subscript Delta] Superconducting Thin Films by Reactive Ion-beam Sputter-deposition for Application to Devices PDF](https://books.google.com/books/content/images/frontcover/4DXyNwAACAAJ?fife=w150-h200)
Author: René Ralph WoolcottPublisher:
ISBN:
Category :
Languages : en
Pages : 232
Book Description
Synthesis of YBa2Cu3O--[subscript Delta] Superconducting Thin Films by Reactive Ion-beam Sputter-deposition for Application to Devices
![Synthesis of YBa2Cu3O--[subscript Delta] Superconducting Thin Films by Reactive Ion-beam Sputter-deposition for Application to Devices PDF](https://books.google.com/books/content/images/frontcover/4DXyNwAACAAJ?fife=w80-h100)
Author: René Ralph WoolcottComputer-Controlled Ion Beam Sputter-Deposition of Superconducting Oxide Films
Author: Publisher:
ISBN:
Category :
Languages : en
Pages : 76
Book Description
The goals of this project are: 1) the development of a new method for the fabrication of superconducting oxide thin films, viz computer controlled ion beam sputter deposition; and 2) the fabrication of YBa2Cu3O(7-delta) thin films and devices using this method. In the early stage of the project it was demonstrated that the use of complex multicomponent sputter targets (such as ceramic YBa2Cu3O7-delta) present significant problems for compositional control. The new computer-controlled ion beam sputter deposition system was developed. The key features include: 1) a rotatable target holder assembly, which serves to position elemental targets under the ion beam in a rapid sequence, 2) a primary ion beam to produce a sputtered flux from the targets, 3) a secondary oxygen beam (ionic, atomic, or reactive oxygen (ozone)) to oxygenate the film and lower the required deposition temperature, 4) complete computer interfacing to provide real time feedback on the thickness of the depositing species and control of the above items. In terms of the superconductor device objectives, the system is designed to allow for low temperature deposition for integrated devices, compositional control and flexibility, and for scaling to a commercial system. The capability of the system for controlled sequential deposition of layered structures is fundamental for the production of heterostructures and sandwich junctions (superconductor-insulator-superconductor and superconductor-normal-superconductor). This is demanding due to the short coherence lengths in the oxide superconductors.
Handbook of Sputter Deposition Technology
Author: Kiyotaka WasaPublisher: William Andrew
ISBN: 1437734847
Category : Technology & Engineering
Languages : en
Pages : 657
Book Description
This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. - A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available - All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique - 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
Simple Chemical Methods for Thin Film Deposition
Author: Babasaheb R. SankapalPublisher: Springer Nature
ISBN: 9819909619
Category : Science
Languages : en
Pages : 590
Book Description
This book explores chemical methods for thin film deposition with diverse nanostructured morphology and their applications. Unlike top-down techniques, chemical methods offer low cost, simplicity, and growth of nanostructured surface architecture with ease of small to large-scale area deposition. The book primarily focuses on innovative twelve chemical methods for thin-film deposition on one platform. Since each method has its own advantages and disadvantages, it is crucial to select the specific method for specific material to be deposited depending upon what type of application is targeted. Due to inclusive of diverse chemical deposition methods, researcher will have knowledge about best choice of the deposition method to be adopted. Inclusive methods discussed in the book are chemical bath deposition, successive ionic layer adsorption and reaction, ion exchange, electroless deposition, electrodeposition, hydrothermal, spray pyrolysis, spin coating, dip coating, doctor blade, screen printing, and sol-gel. The selection of the correct procedure for material to be deposited in thin film form depends on its unique process parameters based on the kind of application and its requirement. The role of preparative factors necessary for thin film alters properties related to structure and surface morphology, electrical conductivity and optical band gap which have been extensively discussed along with the underlying science of film synthesis. The book provides a comprehensive overview of the field of chemical methods for thin film synthesis to applications. In addition to synthesis, the book covers characterization, instrumentation, and industrial application of thin films. As a result, concentrated techniques will be of great interest to university/college professors, students and new engineers as well as postdocs and scientists in the area.
Normal-state properties and laser deposition of YBa 2 Cu 3 O 7 - delta superconductor thin films
Author: Neng-Yu ChenPublisher:
ISBN: 9789040710872
Category : Laser ablation
Languages : en
Pages : 131
Book Description
The New Superconducting Electronics
Author: H. WeinstockPublisher: Springer Science & Business Media
ISBN: 940111918X
Category : Technology & Engineering
Languages : en
Pages : 460
Book Description
This volume is based on the proceedings of the NATO-sponsored Advanced Studies Institute (ASn on The New Superconducting Electronics (held 9-20 August 1992 in Waterville Valley, New Hampshire USA). The contents herein are intended to provide an update to an earlier volume on the same subject (based on a NATO ASI held in 1988). Four years seems a relatively short time interval, and our title itself, featuring The New Superconducting Electronics, may appear somewhat pretentious. Nevertheless, we feel strongly that the ASI fostered a timely reexamination of the technical progress and application potential of this rapid-paced field. There are, indeed, many new avenues for technological innovation which were not envisioned or considered possible four years ago. The greatest advances by far have occurred with regard to oxide superconductors, the so-called high transition-temperature superconductors, known in short as HTS. These advances are mainly in the ability to fabricate both (1) high-quality, relatively large-area films for microwave filters and (2) multilayer device structures, principally superconducting-normal-superconducting (SNS) Josephson junctions, for superconducting-quantum-interference-device (SQUID) magnetometers. Additionally, we have seen the invention and development of the flux-flow transistor, a planar three-terminal device. During the earlier ASI only the very first HTS films with adequate critical-current density had just been fabricated, and these were of limited area and had high resistance for microwave current.
A Novel Computer-controlled Single Ion Beam Multi-target Sputter Deposition System for Y-Ba-Cu-O High TC Superconducting Thin Films
Author: Ying-Li LiuPublisher:
ISBN:
Category : Sputtering (Physics)
Languages : en
Pages : 470
Book Description
Normal-state Properties and Laser Deposition of YBa2Cu3O--{delta} Superconductor Thin Films
Author: Neng-Yu ChenHandbook of Thin-film Deposition Processes and Techniques
Author: Klaus K. SchuegrafPublisher: William Andrew
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 440
Book Description
The most recent developments and techniques in thin film deposition for high technology applications are described by 23 authorities in the field.
Principles of Vapor Deposition of Thin Films
Author: Professor K.S. K.S Sree HarshaPublisher: Elsevier
ISBN: 0080480314
Category : Technology & Engineering
Languages : en
Pages : 1173
Book Description
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.* Offers detailed derivation of important formulae.* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.