Synthesis and Characterization of Radiation-sensitive Polymers and Their Application in Lithography PDF Download

Author: Hengpeng Wu
Publisher:
ISBN:
Category :
Languages : en
Pages : 0

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Author: Charles Robert Davis
Publisher:
ISBN:
Category : Polymers
Languages : en
Pages : 0

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Author: R. D. Miller
Publisher:
ISBN:
Category :
Languages : en
Pages : 28

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Book Description
This report describes the progress in the synthesis, characterization and spectroscopy of soluble polysilanes and germanes. It includes polymer structural studies, theoretical investigations of electronic structure and mechanistic studies of the photodecomposition. It also describes the potential of these materials as polymeric photoconductors, and as new materials for microlithography. The initial work on the nonlinear optical characteristics of these materials is also included. Keywords: Polysilane; Synthesis; Spectroscopy; Photochemistry applications. (sdw).

Author: Keizo Makuuchi
Publisher: John Wiley & Sons
ISBN: 0470587695
Category : Science
Languages : en
Pages : 448

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Book Description
This text examines the effect of radiation on polymers and the versatility of its industrial applications. By helping readers understand and solve problems associated with radiation processing of polymers, it serves as an important reference and fills a gap in the literature. Radiation processing can significantly improve important properties of polymers, however, there are still misconceptions about processing polymers by using ionizing radiation. This book explains the radiation processing of polymeric materials used in many industrial products including cars, airplanes, computers, and TVs. It even addresses emerging "green" issues like biomaterials and hydrogels.

Author: Donghui Li
Publisher:
ISBN:
Category : Adhesives
Languages : en
Pages : 52

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Book Description
Stimuli responsive polymeric materials can adapt to surrounding environments which may be sensitive to various factors, such as temperature, electric field, magnetic field, pH or light. Photoresponsive polymers are particularly interesting since light can be controlled spatially and temporally, which makes them potentially useful in many applications such as shape memory materials, surface patterned materials and controlled drug release. Switchable adhesion exhibits the ability to trigger adhesion in response to environmental changes, for example, temperature, light, pH, solvent, mechanics, and electro or magnetic field. The noteworthy functionality of switchable adhesives has been met with significant interest in many fields of material science and engineering and can find many useful and valuable applications, including the pain-free removal for wound dressing, simplification of separation for material recycle and easily repair or replacement of components in electronics. In this work, photoresonsive properties are utilized for switchable adhesion, which allows the debonding on demand. A series of novel photoresponsive polyacrylates are designed and synthesized, which are copolymers of n-butyl acrylate, 2-carboxyethyl acrylate and chromophores-contained diacrylate cross-linker. The photoresponsive cross-linker was introduced to achieve the removal of the adhesives since the photoresponsive linkage can be cleaved upon photo-irradiation. Besides, these polymers were synthesized by emulsion polymerization, which is environmental-friendly and also facilitates their industrial applications for pressure sensitive adhesives (PSAs) products.

Author: Vijay Kumar
Publisher: Springer
ISBN: 3030057704
Category : Technology & Engineering
Languages : en
Pages : 412

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Book Description
​This book provides an introduction of how radiation is processed in polymeric materials, how materials properties are affected and how the resulting materials are analyzed. It covers synthesis, characterization, or modification of important materials, e.g. polycarbonates, polyamides and polysaccharides, using radiation. For example, a complete chapter is dedicated to the characterization of biodegradable polymers irradiated with low and heavy ions. This book will be beneficial to all polymer scientists in the development of new macromolecules and to all engineers using these materials in applications. It summarizes the fundamental knowledge and latest innovations in research fields from medicine to space.

Author:
Publisher:
ISBN:
Category : Dissertation abstracts
Languages : en
Pages : 816

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Author: Andrew N. Dasheff
Publisher:
ISBN:
Category :
Languages : en
Pages : 46

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Author: Josiah Arevalo Hammack
Publisher:
ISBN:
Category : Polymer networks
Languages : en
Pages : 128

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Book Description
During interplanetary voyages spacecraft are exposed to a variety of ionizing radiations, including high intensity electromagnetic radiation and galactic cosmic rays, creating conditions that are harmful to both instrumentation and human passengers. Current shielding methods offer a degree of protection, but they are not suitable for long term missions or for habitation on extraterrestrial environments, and traditional terrestrial shields are too heavy to be carried on these missions. Organic polymers offer a versatile, lightweight solution to many of the difficulties in shielding, however they also present difficulties establishing a sufficiently high hydrogen content while maintaining high mechanical and thermal stability. By mixing two polymer species together it is possible to produce a material that combines the properties of both polymers, yet due to the immiscible nature of most polymeric materials, using polymer blends is not a practical solution. However it is possible to bypass the issue of immiscibility by dissolving different polymer species together and crosslinking like chains together, forming an interpenetrating polymer network (IPN). This research focuses on the synthesis and characterization of IPNs consisting of aliphatic and aromatic polymer species, containing a high hydrogen content and good mechanical properties, respectively, to be used in extraterrestrial environments to provide protection from ionizing radiation for humans and instrumentation alike.

Author:
Publisher: Elsevier
ISBN: 0081003587
Category : Science
Languages : en
Pages : 636

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As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place