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Surface Modification for Area Selective Atomic Layer Deposition on Silicon and Germanium

Surface Modification for Area Selective Atomic Layer Deposition on Silicon and Germanium PDF Author: Rong Chen
Publisher:
ISBN:
Category :
Languages : en
Pages : 484

Book Description


Surface Modification for Area Selective Atomic Layer Deposition on Silicon and Germanium

Surface Modification for Area Selective Atomic Layer Deposition on Silicon and Germanium PDF Author: Rong Chen
Publisher:
ISBN:
Category :
Languages : en
Pages : 484

Book Description


Atomic Layer Deposition of Nanostructured Materials

Atomic Layer Deposition of Nanostructured Materials PDF Author: Nicola Pinna
Publisher: John Wiley & Sons
ISBN: 3527639934
Category : Technology & Engineering
Languages : en
Pages : 472

Book Description
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Atomic Layer Deposition for Semiconductors

Atomic Layer Deposition for Semiconductors PDF Author: Cheol Seong Hwang
Publisher: Springer Science & Business Media
ISBN: 146148054X
Category : Science
Languages : en
Pages : 266

Book Description
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Principles of Vapor Deposition of Thin Films

Principles of Vapor Deposition of Thin Films PDF Author: Professor K.S. K.S Sree Harsha
Publisher: Elsevier
ISBN: 0080480314
Category : Technology & Engineering
Languages : en
Pages : 1173

Book Description
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.* Offers detailed derivation of important formulae.* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

Dissertation Abstracts International

Dissertation Abstracts International PDF Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 846

Book Description


Materials Science

Materials Science PDF Author: Yitzhak Mastai
Publisher: BoD – Books on Demand
ISBN: 953511140X
Category : Science
Languages : en
Pages : 563

Book Description
Today modern materials science is a vibrant, emerging scientific discipline at the forefront of physics, chemistry, engineering, biology and medicine, and is becoming increasingly international in scope as demonstrated by emerging international and intercontinental collaborations and exchanges. The overall purpose of this book is to provide timely and in-depth coverage of selected advanced topics in materials science. Divided into five sections, this book provides the latest research developments in many aspects of materials science. This book is of interest to both fundamental research and also to practicing scientists and will prove invaluable to all chemical engineers, industrial chemists and students in industry and academia.

TMS 2021 150th Annual Meeting & Exhibition Supplemental Proceedings

TMS 2021 150th Annual Meeting & Exhibition Supplemental Proceedings PDF Author: Minerals, Metals and Materials Society. Annual Meeting
Publisher:
ISBN: 9783030652623
Category : Electronic books
Languages : en
Pages :

Book Description
This collection presents papers from the 150th Annual Meeting & Exhibition of The Minerals, Metals & Materials Society.

Handbook of Manufacturing Engineering and Technology

Handbook of Manufacturing Engineering and Technology PDF Author: Andrew Y. C. Nee
Publisher: Springer
ISBN: 9781447146698
Category : Technology & Engineering
Languages : en
Pages : 0

Book Description
The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.

Organometallic Chemistry

Organometallic Chemistry PDF Author: Nathan J Patmore
Publisher: Royal Society of Chemistry
ISBN: 1788010671
Category : Science
Languages : en
Pages : 210

Book Description
With the increase in volume, velocity and variety of information, researchers can find it difficult to keep up to date with the literature in their field. Providing an invaluable resource, this volume contains analysed, evaluated and distilled information on the latest in organometallic chemistry research and emerging fields. The reviews range in scope and include π-coordinated arene metal complexes and catalysis by arene exchange, rylenes as chromophores in catalysts for CO2 photoreduction, metal nodes and metal sites in metal–organic frameworks, developments in molecular precursors for CVD and ALD, and multiphoton luminescence processes in f-element containing compounds.

Atomic Layer Deposition in Energy Conversion Applications

Atomic Layer Deposition in Energy Conversion Applications PDF Author: Julien Bachmann
Publisher: John Wiley & Sons
ISBN: 3527694838
Category : Technology & Engineering
Languages : en
Pages : 366

Book Description
Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.