Author: LengleyPublisher: American Institute of Physics
ISBN:
Category : Science
Languages : en
Pages : 192
Book Description
Materials processing scientists and engineers, basic and applied research scientists and accelerator technicians.
Surface Conditioning of Vacuum Systems
Author: LengleyPublisher: American Institute of Physics
ISBN:
Category : Science
Languages : en
Pages : 192
Book Description
Materials processing scientists and engineers, basic and applied research scientists and accelerator technicians.
Ben Franklin and Tom Paine
Author: John McGovernThe Foundations of Vacuum Coating Technology
Author: Donald M. MattoxPublisher: William Andrew
ISBN: 0128130857
Category : Technology & Engineering
Languages : en
Pages : 383
Book Description
The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. - History and detailed descriptions of Vacuum Deposition Technologies - Review of Enabling Technologies and their importance to current applications - Extensively referenced text - Patents are referenced as part of the history - Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology - Glossary of Terms for vacuum coating
Surface Conditioning of Vacuum Systems
Author: Handbook of Physical Vapor Deposition (PVD) Processing
Author: D. M. MattoxPublisher: Cambridge University Press
ISBN: 0080946585
Category : Technology & Engineering
Languages : en
Pages : 947
Book Description
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
Energy Research Abstracts
Author: Handbook of Silicon Wafer Cleaning Technology
Author: Karen ReinhardtPublisher: William Andrew
ISBN: 032351085X
Category : Technology & Engineering
Languages : en
Pages : 794
Book Description
Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others. - Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits - Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries - Covers processes and equipment, as well as new materials and changes required for the surface conditioning process
Proceedings
Author: Scientific and Technical Aerospace Reports
Author: Vacuum Technology
Author: Nagamitsu YoshimuraPublisher: Springer Science & Business Media
ISBN: 3540744339
Category : Technology & Engineering
Languages : en
Pages : 359
Book Description
In this book, Yoshimura provides a review of the UHV related development during the last decades. His very broad experience in the design enables him to present us this detailed reference. After a general description how to design UHV systems, he covers all important issue in detail, like pumps, outgasing, Gauges, and Electrodes for high voltages. Thus, this book serves as reference for everybody using UVH in scientific equipment.