Author: Paul Martin SmithPublisher:
ISBN:
Category :
Languages : en
Pages : 412
Book Description
Stabilization of Thin Tungsten Films on Silicon During Rapid Thermal Annealing in Nitrogen
Author: Paul Martin SmithDissertation Abstracts International
Author: Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 792
Book Description
Tungsten and Other Advanced Metals for ULSI Applications in 1990: Volume 6
Author: Gregory C. SmithPublisher: Mrs Conference Proceedings
ISBN:
Category : Science
Languages : en
Pages : 422
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Physics Briefs
Author: Advances in Rapid Thermal and Integrated Processing
Author: F. RoozeboomPublisher: Springer Science & Business Media
ISBN: 9401587116
Category : Science
Languages : en
Pages : 568
Book Description
Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.
Scientific and Technical Aerospace Reports
Author: STAR
Author: ULSI Science and Technology, 1989
Author: C. M. OsburnPublisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 804
Book Description
Ion Implantation Technology - 94
Author: S. CoffaPublisher: Newnes
ISBN: 044459972X
Category : Science
Languages : en
Pages : 1031
Book Description
The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters.The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.
Nuclear Science Abstracts
Author: Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 1462
Book Description
NSA is a comprehensive collection of international nuclear science and technology literature for the period 1948 through 1976, pre-dating the prestigious INIS database, which began in 1970. NSA existed as a printed product (Volumes 1-33) initially, created by DOE's predecessor, the U.S. Atomic Energy Commission (AEC). NSA includes citations to scientific and technical reports from the AEC, the U.S. Energy Research and Development Administration and its contractors, plus other agencies and international organizations, universities, and industrial and research organizations. References to books, conference proceedings, papers, patents, dissertations, engineering drawings, and journal articles from worldwide sources are also included. Abstracts and full text are provided if available.