Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 199
Book Description
Special Issue on Generation and Use of Radiation in the Extreme Ultraviolet and Soft X-ray Region
Generation and Use of Radiation in the Extreme Ultraviolet and Soft X-ray Region
Soft X-Rays and Extreme Ultraviolet Radiation
Author: David Attwood
Publisher: Cambridge University Press
ISBN: 1139643428
Category : Technology & Engineering
Languages : en
Pages : 611
Book Description
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Publisher: Cambridge University Press
ISBN: 1139643428
Category : Technology & Engineering
Languages : en
Pages : 611
Book Description
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Enhancement Cavities for the Generation of Extreme Ultraviolet and Hard X-Ray Radiation
Author: Henning Carstens
Publisher: Springer
ISBN: 3319940090
Category : Science
Languages : en
Pages : 103
Book Description
This thesis discusses the power scaling of ultrashort pulses in enhancement cavities, utilized in particular for frequency conversion processes, such as Thomson scattering and high-harmonic generation. Using custom optics for ultrashort-pulse enhancement cavities, it demonstrates for the first time that at the envisaged power levels, the mitigation of thermal effects becomes indispensable even in cavities comprising solely reflective optics. It also studies cavities with large beams, albeit with low misalignment sensitivity, as a way to circumvent intensity-induced mirror damage. Average powers of several hundred kilowatts are demonstrated, which benefit hard x-ray sources based on Thomson scattering. Furthermore, pulses as short as 30 fs were obtained at more than 10 kW of average power and employed for high-harmonic generation with photon energies exceeding 100 eV at 250 MHz repetition rate, paving the way for frequency comb spectroscopy in this spectral region.
Publisher: Springer
ISBN: 3319940090
Category : Science
Languages : en
Pages : 103
Book Description
This thesis discusses the power scaling of ultrashort pulses in enhancement cavities, utilized in particular for frequency conversion processes, such as Thomson scattering and high-harmonic generation. Using custom optics for ultrashort-pulse enhancement cavities, it demonstrates for the first time that at the envisaged power levels, the mitigation of thermal effects becomes indispensable even in cavities comprising solely reflective optics. It also studies cavities with large beams, albeit with low misalignment sensitivity, as a way to circumvent intensity-induced mirror damage. Average powers of several hundred kilowatts are demonstrated, which benefit hard x-ray sources based on Thomson scattering. Furthermore, pulses as short as 30 fs were obtained at more than 10 kW of average power and employed for high-harmonic generation with photon energies exceeding 100 eV at 250 MHz repetition rate, paving the way for frequency comb spectroscopy in this spectral region.
Soft X-rays and Extreme Ultraviolet Radiation
Author: David Attwood (University of California, Berkeley.)
Publisher:
ISBN: 9781139636421
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN: 9781139636421
Category :
Languages : en
Pages :
Book Description
Soft X-Rays and Extreme Ultraviolet Radiation
Author: David Attwood
Publisher:
ISBN: 9781316085097
Category : Grenz rays
Languages : en
Pages : 488
Book Description
This self-contained, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The book will be of great interest to graduate students, researchers and practising engineers.
Publisher:
ISBN: 9781316085097
Category : Grenz rays
Languages : en
Pages : 488
Book Description
This self-contained, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The book will be of great interest to graduate students, researchers and practising engineers.
Soft x-rays and extreme ultraviolet radiation
Author: David Attwood
Publisher:
ISBN: 9781139641326
Category :
Languages : en
Pages : 470
Book Description
This self-contained, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The book will be of great interest to graduate students, researchers and practising engineers.
Publisher:
ISBN: 9781139641326
Category :
Languages : en
Pages : 470
Book Description
This self-contained, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The book will be of great interest to graduate students, researchers and practising engineers.
X-Rays and Extreme Ultraviolet Radiation
Author: David Attwood
Publisher: Cambridge University Press
ISBN: 1316810666
Category : Technology & Engineering
Languages : en
Pages :
Book Description
With this fully updated second edition, readers will gain a detailed understanding of the physics and applications of modern X-ray and EUV radiation sources. Taking into account the most recent improvements in capabilities, coverage is expanded to include new chapters on free electron lasers (FELs), laser high harmonic generation (HHG), X-ray and EUV optics, and nanoscale imaging; a completely revised chapter on spatial and temporal coherence; and extensive discussion of the generation and applications of femtosecond and attosecond techniques. Readers will be guided step by step through the mathematics of each topic, with over 300 figures, 50 reference tables and 600 equations enabling easy understanding of key concepts. Homework problems, a solutions manual for instructors, and links to YouTube lectures accompany the book online. This is the 'go-to' guide for graduate students, researchers and industry practitioners interested in X-ray and EUV interaction with matter.
Publisher: Cambridge University Press
ISBN: 1316810666
Category : Technology & Engineering
Languages : en
Pages :
Book Description
With this fully updated second edition, readers will gain a detailed understanding of the physics and applications of modern X-ray and EUV radiation sources. Taking into account the most recent improvements in capabilities, coverage is expanded to include new chapters on free electron lasers (FELs), laser high harmonic generation (HHG), X-ray and EUV optics, and nanoscale imaging; a completely revised chapter on spatial and temporal coherence; and extensive discussion of the generation and applications of femtosecond and attosecond techniques. Readers will be guided step by step through the mathematics of each topic, with over 300 figures, 50 reference tables and 600 equations enabling easy understanding of key concepts. Homework problems, a solutions manual for instructors, and links to YouTube lectures accompany the book online. This is the 'go-to' guide for graduate students, researchers and industry practitioners interested in X-ray and EUV interaction with matter.
Tunable Coherent Radiation at Soft X-ray Wavelengths
Author: Kristine Marie Rosfjord
Publisher:
ISBN:
Category :
Languages : en
Pages : 268
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 268
Book Description
Applied Science & Technology Index
Author:
Publisher:
ISBN:
Category : Electronic journals
Languages : en
Pages : 2172
Book Description
Publisher:
ISBN:
Category : Electronic journals
Languages : en
Pages : 2172
Book Description