Author: Dhyaneshwar MurugesanPublisher:
ISBN:
Category :
Languages : en
Pages : 182
Book Description
Simulation of Silicon Carbide Metal Semiconductor Field Effect Transistor Using Analytical Modeling for High Frequency and Time Delay
Author: Dhyaneshwar MurugesanPublisher:
ISBN:
Category :
Languages : en
Pages : 182
Book Description
Simulation of Silicon Carbide MESFET Using Analytical Modeling and Synopsis Software for High Power and High Frequency Performance
Author: Puneet PandeyAnalytical Modeling of 4H-silicon Carbide Based MESFET with Trapping Effects
Author: Chirayu ShahPublisher:
ISBN:
Category :
Languages : en
Pages : 64
Book Description
4H-Silicon Carbide metal semiconductor effect transistor has a massive possible popular high-power device at microwave frequencies because of their extensive band-gap structures of high electrical breakdown field strength, high electron saturation velocity and high operational temperature. A physics-based analytical model of Silicon Carbide based MESFETs has been developed considering high-purity semi-insulating substrates to find the interaction of traps influence between the channel and substrates. I-V characteristics with the influence of traps and without traps, I-V characteristics with field dependent mobility and the transconductance with traps and without traps have been evaluated to understand the power aided efficiency and frequency performance.
Silicon Carbide (SiC) Based MESFET Similation for High Power and High Frequency Performance Using MATLAB
Author: Bhavik PatelPublisher:
ISBN:
Category :
Languages : en
Pages : 81
Book Description
In this project, the explanation of analytical modeling of ion implanted silicon carbide (SiC) metal semiconductor field effect transistors (MESFETs) has been described. This model has been designed to determine the drain-source current, threshold voltage, intrinsic parameters such as gate capacitance, transconductance and, drain-source resistance bearing in mind different fabrication parameters such as annealing, ion energy, ion dose, and ion range. The model helps in getting the ion implantation fabrication parameters using the optimization of the effective implanted channel thickness for different ion doses arising to the preferred pitch off voltage for high breakdown voltage and high drain current. A study on gate-to-drain and gate-to-source capacitance, drain-source resistance and transconductance was done to determine the device frequency response.
Physics-based Analytical Model for Silicon Carbide MESFET with a New Concept of Charge Conserving Capacitance
Author: Kiran Kumar RambappagariPublisher:
ISBN:
Category : Metal semiconductor field-effect transistors
Languages : en
Pages : 48
Book Description
In this project, a physics-based analytical model for silicon carbide (SiC) metal semiconductor field effect transistors (MESFETs) has been developed and presented. The gate capacitances such as gate-source capacitance and gate-drain capacitance were determined by considering various terminal charges with respect to the voltages at source, drain, and gate. The gate capacitance has been determined for linear and non-linear regions. This study is extremely valuable for SiC MESFETs to find their cut-off and maximum frequencies from the gate capacitance model. The gate-source and gate-drain capacitances show extremely attractive values, justifying the use of SiC MESFET as a high frequency device.
Junctionless Field-Effect Transistors
Author: Shubham SahayPublisher: John Wiley & Sons
ISBN: 1119523516
Category : Technology & Engineering
Languages : en
Pages : 496
Book Description
A comprehensive one-volume reference on current JLFET methods, techniques, and research Advancements in transistor technology have driven the modern smart-device revolution—many cell phones, watches, home appliances, and numerous other devices of everyday usage now surpass the performance of the room-filling supercomputers of the past. Electronic devices are continuing to become more mobile, powerful, and versatile in this era of internet-of-things (IoT) due in large part to the scaling of metal-oxide semiconductor field-effect transistors (MOSFETs). Incessant scaling of the conventional MOSFETs to cater to consumer needs without incurring performance degradation requires costly and complex fabrication process owing to the presence of metallurgical junctions. Unlike conventional MOSFETs, junctionless field-effect transistors (JLFETs) contain no metallurgical junctions, so they are simpler to process and less costly to manufacture.JLFETs utilize a gated semiconductor film to control its resistance and the current flowing through it. Junctionless Field-Effect Transistors: Design, Modeling, and Simulation is an inclusive, one-stop referenceon the study and research on JLFETs This timely book covers the fundamental physics underlying JLFET operation, emerging architectures, modeling and simulation methods, comparative analyses of JLFET performance metrics, and several other interesting facts related to JLFETs. A calibrated simulation framework, including guidance on SentaurusTCAD software, enables researchers to investigate JLFETs, develop new architectures, and improve performance. This valuable resource: Addresses the design and architecture challenges faced by JLFET as a replacement for MOSFET Examines various approaches for analytical and compact modeling of JLFETs in circuit design and simulation Explains how to use Technology Computer-Aided Design software (TCAD) to produce numerical simulations of JLFETs Suggests research directions and potential applications of JLFETs Junctionless Field-Effect Transistors: Design, Modeling, and Simulation is an essential resource for CMOS device design researchers and advanced students in the field of physics and semiconductor devices.
Simulation of SiC MESFET Using Synopsys Technology Computer-aided Design
Author: Siddharth NirmalDevelopment of Silicon Carbide Metal-semiconductor Field-effect Transistors for Microwave Power Applications
Author: Ho-Young ChaSimulation and Modeling of Emerging Devices
Author: Brinda BhowmickPublisher: Cambridge Scholars Publishing
ISBN: 1527507041
Category : Technology & Engineering
Languages : en
Pages : 136
Book Description
This book covers the physical principles, modelling, fabrication and applications of Tunnel Field Effect Transistors (TFETs) and Fin Field Effect Transistors (FinFETs). This is intended to act as a reference for undergraduate, postgraduate and research scholars belonging to backgrounds of Applied Physics, Electrical and Electronics Engineering and Material Science. Of paramount importance is the need to understand the simulation aspects of these devices, the validity of mathematical models, basics on fabrication and details of applications of these nanoscale devices. The presentation of the book assumes that the reader has fundamental concepts of semiconductor device physics and electronic circuits. A course such as the one this book is intended to accompany and motivate both students and scholars to get involved in the research on TFETs and FinFETs. Further, this book can act as a reference for device engineers and scientists who need to get updated information on device and technological developments.
A Three Region Analytical Model for Short Channel Silicon Carbide (SiC) MESFET's
Author: Rahul Reddy KambalapallyPublisher:
ISBN:
Category : Metal semiconductor field-effect transistors
Languages : en
Pages : 52
Book Description
This project presents an improved analytical model of the three regions in a SiC metal semiconductor field effect transistor(MESFET). The analytical model mainly focuses on two regions in the active channel that are between gate-source and drain-source. The third region gate-drain (which is ungated) is ignored in this analytical model due to the very large potential drop at high drain voltages in a short channel device. In order to improve the accuracy in this model, the parasitic resistance and incomplete ionization of dopants have been incorporated. Considering these effects in the analytical model, a simulation of the current and voltage characteristics and transfer characteristics of the Silicon Carbide MESFET has been developed and discussed in detailed in this thesis.