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Author: Stephen E. Saddow Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 432
Book Description
Advances in silicon carbide materials, processing and device design have recently resulted in implementation of SiC-based electronic systems and offer great promise in high-voltage, high-temperature and high-frequency applications. This volume focuses on new developments in basic science of SiC materials as well as rapidly maturing device technologies. The challenges in this field include understanding and decreasing defect densities in bulk SiC crystals, controlling morphology and residual impurities in epilayers, optimization of implant activation and oxide-SiC interfaces, and developing novel device structures. This book brings together the crystal growers, physicists and device experts needed to continue the rapid pace of silicon-carbide-based technology. Topics include: epitaxial growth; characterization/defects; MOS technology; SiC processing and devices.
Author: Stephen E. Saddow Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 432
Book Description
Advances in silicon carbide materials, processing and device design have recently resulted in implementation of SiC-based electronic systems and offer great promise in high-voltage, high-temperature and high-frequency applications. This volume focuses on new developments in basic science of SiC materials as well as rapidly maturing device technologies. The challenges in this field include understanding and decreasing defect densities in bulk SiC crystals, controlling morphology and residual impurities in epilayers, optimization of implant activation and oxide-SiC interfaces, and developing novel device structures. This book brings together the crystal growers, physicists and device experts needed to continue the rapid pace of silicon-carbide-based technology. Topics include: epitaxial growth; characterization/defects; MOS technology; SiC processing and devices.
Author: Tatsuki Ohji Publisher: John Wiley & Sons ISBN: 0470944056 Category : Technology & Engineering Languages : en Pages : 260
Book Description
This issue contains 25 invited and contributed papers, all peer reviewed according to the American Ceramic Society Review Process. The latest developments in processing and manufacturing technologies are covered, including green manufacturing, smart processing, advanced composite manufacturing, rapid processing, joining, machining, and net shape forming technologies. These papers discuss the most important aspects necessary for understanding and further development of processing and manufacturing of ceramic materials and systems.
Author: Materials Research Society. Meeting Publisher: ISBN: Category : Science Languages : en Pages : 900
Book Description
This year's nitride symposium showed the scope of nitride-related advances spanning basic materials physics over process technology to high-performance devices. Progress was reported in bulk growth of GaN and AlN, growth on various substrates and substrate orientations, optical properties of InN, defect and doping analysis of p-doped GaN, and polarization properties. These led to new performance records in visible light emitter technology, i.e., higher efficiency/higher brightness, UV emitters with shorter wavelength, and UV and photo detectors. Advances in the development of nitride-based electronic devices with new heterostructure FET designs for RF power applications, including those on Si substrates and wafer fusion, are also reported. This book captures the exciting developments in this rapidly progressing field. Topics include: epitaxy - devices and defect reduction; defects and characterization; epitaxy - nonpolar orientations and alloys; optical properties; UV emitters and detectors; visible light emitters; electronic devices; characterization of defects and transport; and contacts, processing and p-type nitrides.
Author: Mark I. Gardner Publisher: ISBN: Category : Computers Languages : en Pages : 408
Book Description
Progress in MOS integrated-circuit technology is largely driven by the ability to dimensionally scale the constituent components of individual devices and their associated interconnections. Given a set of materials with fixed properties, this scaling is finite and its predicted limits are rapidly approaching. The International Technology Roadmap for Semiconductors establishes the pace at which this scaling occurs and identifies many of the technological challenges ahead. This volume assembles representatives from the fields of materials science, physics, electrical and chemical engineering to provide an insightful review of current technology and understanding. Specifically, the intent is to discuss materials issues stemming from device scaling to sub-100nm technology nodes. Topics include: high-k characterization; atomic layer deposition; gate metal materials and integration; contacts and ultrashallow junction formation; theory and modeling and crystalline oxides for gate dielectrics.
Author: Materials Research Society. Meeting Publisher: ISBN: Category : Computers Languages : en Pages : 336
Book Description
In the future, because fundamental materials and process limits are being approached, continued transistor scaling will not be as straightforward. Future complementary metal-oxide semiconductor (MOS) transistors will require high-permittivity (high-k) gate dielectrics and metal gate electrodes, as well as low-resistance ultrashallow junctions, in order to meet the stringent specifications of the International Technology Roadmap for Semiconductors. Techniques to improve transconductance and drive current may also be required. Process integration issues must be solved, and reliability must be assured, before any new material or processing technique can be used in IC manufacture. A further complication is that the key challenges will differ according to application. This book reports research results from industry, government labs and academia covering a wide scope of front-end process issues for future CMOS technologies. Topics include: advanced materials and structures; high-k dielectrics; advanced gate stack materials; heterogeneous integration and strained Si technologies; ultrashallow junction technology; strained Si and source/drain technology; and laser annealing and silicide processes.
Author: D. G. Schlom Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 408
Book Description
This book contains the proceedings of two symposia held at the 2002 MRS Fall Meeting in Boston. Papers from Symposium T, Crystalline Oxides on Semiconductors, bring together experts from different technology areas - high-k gate dielectrics, novel memories, and ferroelectrics, for example - to examine commonality among the fields. These papers offer an overview of the field, highlight interesting experimental results and device ideas, and feature innovative theoretical approaches to understanding these systems. Symposium V, Interfacial Issues for Oxide-Based Electronics, covers a wide range of topics involving the interfaces between electro-optical oxide layers and other materials. Overall, it is clear that a new generation of materials and heterostructures has been enabled by the increasing control of interfacial phenomena. Topics include: epitaxial oxide-silicon heterostructures; ferroelectric thin films on silicon; theory and modeling; crystalline oxides for gate dielectrics; transparent conducting oxides; transparent conducting oxides and oxide growth and properties; field effect devices and gate dielectrics; ferroelectrics, capacitors and sensors; organic devices and interfacial growth issues.
Author: M. Á. Alario-Franco Publisher: ISBN: Category : Science Languages : en Pages : 512
Book Description
Since its inception in the mid-twentieth century, solid-state chemistry has matured within the chemical sciences. In the same way that chemistry itself is considered a central science, solid-state chemistry is central in its many relations to physics, in particular to solid-state physics and also to materials science and engineering. There are few problems in materials science or engineering in which the preparation of the material itself is not a central issue and, more often than not, this will be a solid-state chemical problem. For these reasons, it is not surprising that in the technological development of the last century, solid-state chemistry has grown in importance. It is not only a synthesis science, it is also the science of structures, defects, stoichiometry, and physical chemical properties. Most of these are explored in the book. Topics include: metal-to-insulator transition; porous materials; dielectric materials; nanomaterials; synthesis of materials; films and catalytic materials; CMR materials; thermoelectric materials; dielectrics, catalysts, phosphors, films and properties and synthesis and crystal growth.
Author: A. Kumar Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 648
Book Description
This book provides a forum for international and interdisciplinary discussion of phenomena where materials performance may be enhanced through engineered surfaces and interfaces. The materials science of hard and wear-resistant coatings, including nanostructured coatings, is a scientifically challenging problem with immediate technological applications in machine and machining tools, magnetic recording and other manufacturing industries. Hard coating systems designed for use in next-generation materials applications must achieve a combination of physical properties. The performance and reliability of MEMS devices strongly depend on the near-surface properties and many materials issues at the micro- and nanoscale remain to be resolved. This book reviews key aspects, discusses ongoing research and speculates on future trends. Topics include: nano- and micrometer-scale characterization and properties; synthesis and characterization of nanostructured materials; deposition, characterization and properties of films and coatings; industrial applications of surface engineering; atomistic and continuum modeling of materials properties; surface engineering issues for bio/microelectronics applications; and surface engineering issues in MEMS structures and devices.
Author: Stephen E. Saddow
Author: Stephen E. Saddow
Author: 
Author: Tatsuki Ohji
Author: Philippe Knauth
Author: Materials Research Society. Meeting
Author: Mark I. Gardner
Author: Materials Research Society. Meeting
Author: D. G. Schlom
Author: M. Á. Alario-Franco
Author: A. Kumar