Author: D. HaramePublisher: The Electrochemical Society
ISBN: 1607685434
Category :
Languages : en
Pages : 1042
Book Description
SiGe, Ge, and Related Compounds 6: Materials, Processing, and Devices
Author: D. HaramePublisher: The Electrochemical Society
ISBN: 1607685434
Category :
Languages : en
Pages : 1042
Book Description
SiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices
Author: David HaramePublisher: The Electrochemical Society
ISBN: 1566776562
Category : Electronic apparatus and appliances
Languages : en
Pages : 1136
Book Description
Advanced semiconductor technology is depending on innovation and less on "classical" scaling. SiGe, Ge, and Related Compounds have become a key component of the arsenal in improving semiconductor performance. This issue of ECS Transactions discusses the technology to form these materials, process them, FET devices incorporating them, Surfaces and Interfaces, Optoelectronic devices, and HBT devices.
SiGe, Ge, and Related Compounds 4: Materials, Processing, and Devices
Author: D. HaramePublisher: The Electrochemical Society
ISBN: 1566778255
Category : Science
Languages : en
Pages : 1066
Book Description
Advanced semiconductor technology is depending on innovation and less on "classical" scaling. SiGe, Ge, and Related Compounds has become a key component in the arsenal in improving semiconductor performance. This symposium discusses the technology to form these materials, process them, FET devices incorporating them, Surfaces and Interfaces, Optoelectronic devices, and HBT devices.
SiGe, Ge, and Related Compounds: Materials, Processing, and Devices 8
Author: Q. LiuPublisher: The Electrochemical Society
ISBN: 1607688530
Category : Science
Languages : en
Pages : 450
Book Description
ULSI Process Integration 6
Author: C. ClaeysPublisher: The Electrochemical Society
ISBN: 1566777445
Category : Integrated circuits
Languages : en
Pages : 547
Book Description
ULSI Process Integration 6 covers all aspects of process integration. Sections are devoted to 1) Device Technologies, 2) Front-end-of-line integration (gate stacks, shallow junctions, dry etching, etc.), 3) Back-end-of-line integration (CMP, low-k, Cu interconnect, air-gaps, 3D packaging, etc.), 4) Alternative channel technologies (Ge, III-V, hybrid integration), and 5) Emerging technologies (CNT, graphene, polymer electronics, nanotubes).
Nanoscaled Films and Layers
Author: Laszlo NanaiPublisher: BoD – Books on Demand
ISBN: 9535131435
Category : Science
Languages : en
Pages : 300
Book Description
In recent years, scientific investigations and technological developments have resulted in many new results. Direct applications of quantum mechanical laws to system with length scales lower than 100 nm (nano) had opened a way to construction of new equipment in the field f.e. of nano- and optoelectronics. This book fits into this trend summarizing the results related to discoveries and technological applications of nanolayer in different fields of material science and even life science. The chapters are organized into three subfields: 1) Preparation and fabrications of nanolayers with different methods. 2) Description of recent achievements related to very important III-V heterostructures. 3) Descriptions of mechanical, thermal, optoelectronic, photocatalytic, and tribological properties of nanolayered structures. Some environmentally friendly applications are also treated in this book. The presented book provides a description of specific and original results obtained by authors. We hope that the volume will be of interest for a wide range of readers working in the field of material science.
SiGe, Ge, and Related Compounds 5
Author: Electrochemical SocietyPublisher:
ISBN: 9781623320089
Category :
Languages : en
Pages : 1097
Book Description
Sinep 2009. 1st International Workshop on Si Based Nano-Electronics and -Photonics
Author: Steafno ChiussiPublisher: Netbiblo
ISBN: 8497454162
Category : Technology & Engineering
Languages : en
Pages : 162
Book Description
The main objective of this International Workshop in Vigo is to target this major problem by bringing together scientists and engineers specialized on various different topics related to group IV semiconductors. In five consecutive sessions dedicated to - Group IV materials: CMOS and further extension of the roadmap - Group IV materials: Nano-photonics - Material aspects and characterization on nano-scale - Nanostructures and material processing on atomic scale
Journal of the Electrochemical Society
Author: Processing and Properties of Compound Semiconductors
Author: Publisher: Elsevier
ISBN: 0080541011
Category : Science
Languages : en
Pages : 333
Book Description
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded.