Author: Hsiao C. LiuPublisher:
ISBN:
Category :
Languages : en
Pages : 36
Book Description
Setup of Low Pressure Chemical Vapor Deposition of Boron Nitride Thin Films
Author: Hsiao C. LiuDeposition of Cubic Boron Nitride Thin Films by Supersonic D.C. Plasma-enhanced Chemical Vapor Deposition
Author: Eric RundeQuantum Dots for Quantum Information Technologies
Author: Peter MichlerPublisher: Springer
ISBN: 3319563785
Category : Science
Languages : en
Pages : 457
Book Description
This book highlights the most recent developments in quantum dot spin physics and the generation of deterministic superior non-classical light states with quantum dots. In particular, it addresses single quantum dot spin manipulation, spin-photon entanglement and the generation of single-photon and entangled photon pair states with nearly ideal properties. The role of semiconductor microcavities, nanophotonic interfaces as well as quantum photonic integrated circuits is emphasized. The latest theoretical and experimental studies of phonon-dressed light matter interaction, single-dot lasing and resonance fluorescence in QD cavity systems are also provided. The book is written by the leading experts in the field.
Proceedings of the ... European Conference on Chemical Vapor Deposition
Author: Handbook of Chemical Vapor Deposition
Author: Hugh O. PiersonPublisher: William Andrew
ISBN: 1437744885
Category : Technology & Engineering
Languages : en
Pages : 459
Book Description
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Chemical Vapor Deposition Growth and Characterization of Two-Dimensional Hexagonal Boron Nitride
Author: Roland Yingjie TayPublisher: Springer
ISBN: 9811088098
Category : Technology & Engineering
Languages : en
Pages : 152
Book Description
This thesis focuses on the growth of a new type of two-dimensional (2D) material known as hexagonal boron nitride (h-BN) using chemical vapor deposition (CVD). It also presents several significant breakthroughs in the authors’ understanding of the growth mechanism and development of new growth techniques, which are now well known in the field. Of particular importance is the pioneering work showing experimental proof that 2D crystals of h-BN can indeed be hexagonal in shape. This came as a major surprise to many working in the 2D field, as it had been generally assumed that hexagonal-shaped h-BN was impossible due to energy dynamics. Beyond growth, the thesis also reports on synthesis techniques that are geared toward commercial applications. Large-area aligned growth and up to an eightfold reduction in the cost of h-BN production are demonstrated. At present, all other 2D materials generally use h-BN as their dielectric layer and for encapsulation. As such, this thesis lays the cornerstone for using CVD 2D h-BN for this purpose.
Preparation of Chemical Vapor-deposited Materials for Use in Field-enhanced Electron Emission Studies
Author: David G. MCMasterPublisher:
ISBN:
Category :
Languages : en
Pages : 44
Book Description
The general principles of chemical vapor deposition (CVD) are described and specific experimental results on the deposition of pyrolytic graphite, of CVD boron nitride, and of CVD tungsten on tungsten substrates are discussed. In order to obtain uniform anisotropic, thin films of pyrolytic graphite and CVD boron nitride, the deposition parameters such as deposition temperature, concentration of the gaseous reactants, and gas flow pattern were varied, and their influence on the deposits was studied. It was found that the uniformity of pyrolytic graphite can be increased by using high total gas flow rates and low methane concentrations. The most uniform CVD-boron nitride deposits were obtained under the following conditions: Temperature: 1600C; Gas flow rate (cc/min): ammonia 10, boron trichloride 6, nitrogen 4. The deposits of pyrolytic graphite and CVD boron nitride exhibited a high degree of anisotropy. Thin-film sandwich structures of pyrolytic graphite and CVD boron nitride were successfully produced. Preliminary tests have been performed with CVD tungsten. (Author).
Chemical Vapor Deposition Polymerization
Author: Jeffrey B. FortinPublisher: Springer Science & Business Media
ISBN: 147573901X
Category : Science
Languages : en
Pages : 112
Book Description
Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.
Layered 2D Materials and Their Allied Applications
Author: InamuddinPublisher: John Wiley & Sons
ISBN: 111965520X
Category : Technology & Engineering
Languages : en
Pages : 400
Book Description
Ever since the discovery of graphene, two-dimensional layered materials (2DLMs) have been the central tool of the materials research community. The reason behind their importance is their superlative and unique electronic, optical, physical, chemical and mechanical properties in layered form rather than in bulk form. The 2DLMs have been applied to electronics, catalysis, energy, environment, and biomedical applications. The following topics are discussed in the book’s fifteen chapters: • The research status of the 2D metal-organic frameworks and the different techniques used to synthesize them. • 2D black phosphorus (BP) and its practical application in various fields. • Reviews the synthesis methods of MXenes and provides a detailed discussion of their structural characterization and physical, electrochemical and optical properties, as well as applications in catalysis, energy storage, environmental management, biomedicine, and gas sensing. • The carbon-based materials and their potential applications via the photocatalytic process using visible light irradiation. • 2D materials like graphene, TMDCs, few-layer phosphorene, MXene in layered form and their heterostructures. • The structure and applications of 2D perovskites. • The physical parameters of pristine layered materials, ZnO, transition metal dichalcogenides, and heterostructures of layered materials are discussed. • The coupling of graphitic carbon nitride with various metal sulfides and oxides to form efficient heterojunction for water purification. • The structural features, synthetic methods, properties, and different applications and properties of 2D zeolites. • The methods for synthesizing 2D hollow nanostructures are featured and their structural aspects and potential in medical and non-medical applications. • The characteristics and structural aspects of 2D layered double hydroxides (LDHs) and the various synthesis methods and role of LDH in non-medical applications as adsorbent, sensor, catalyst, etc. • The synthesis of graphene-based 2D layered materials synthesized by using top-down and bottom-up approaches where the main emphasis is on the hot-filament thermal chemical vapor deposition (HFTCVD) method. • The different properties of 2D h-BN and borophene and the various methods being used for the synthesis of 2D h-BN, along with their growth mechanism and transfer techniques. • The physical properties and current progress of various transition metal dichalcogenides (TMDC) based on photoactive materials for photoelectrochemical (PEC) hydrogen evolution reaction. • The state-of-the-art of 2D layered materials and associated devices, such as electronic, biosensing, optoelectronic, and energy storage applications.
Low Pressure Chemical Vapor Deposition of Silicon Nitride Films from Ditertiarybutylsilane
Author: Xiangqun FanPublisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 120
Book Description