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Author: S. Ashok Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 400
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book, first published in 2007, focuses on the application of defects and impurities in current and emerging semiconductor technologies.
Author: S. Ashok Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 400
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book, first published in 2007, focuses on the application of defects and impurities in current and emerging semiconductor technologies.
Author: S. Ashok Publisher: Cambridge University Press ISBN: 9781558998179 Category : Technology & Engineering Languages : en Pages : 0
Book Description
This book, first published in 2005, explores the deliberate introduction and manipulation of defects and impurities for the purpose of engineering desired properties in semiconductor materials and devices. The presentations are grouped around the distinct topics of materials, processing and devices. The papers on grown-in defects in bulk crystals deal with overviews of intrinsic and impurity-related defects and their influence on electrical, optical and mechanical properties, as well as the use of impurities to arrest certain types of defects during growth and defects to control growth. Most of the papers deal with dopant and defect issues relevant to widegap semiconductors. The scope of defect and impurity engineering is far-ranging, as exemplified by phase and morphological stability of silicides, interface control and passivation, and application of ion implantation, plasma treatment and rapid thermal processing for creating/activating/suppressing trap levels. Papers in these areas are also found in the book.
Author: Robert W. Collins Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 760
Book Description
This book continues the long-standing and highly successful series on amorphous silicon science and technology. The opening article honors the pioneering use of photons to probe silicon films and provides an historical overview of optical absorption for studies of the Urbach edge and disorder. Additional invited presentations focus on new approaches for the fabrication of higher stability amorphous silicon-based materials and solar cells, and on the characterization of materials and cells both structurally and electronically. The book includes topics relevant to solar cells, including the role of hydrogen in metastability phenomena and deposition processes, and the application of atomistic material simulations in elucidating film growth mechanisms and structure as characterized by in situ probes. Chapters are devoted to nanostructures, such as quantum dots and wires, and to nano/microcrystalline and poly/single crystalline films, the latter involving new concepts in crystalline grain growth and epitaxy. Device applications are also highlighted, such as thin-film transistors, solar cells, and image sensors, operable on the meter scale, to memories, operable on the nanometer scale.
Author: Materials Research Society. Meeting Publisher: ISBN: Category : Science Languages : en Pages : 296
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book studies the effect of nanometer-scale structure and confinement on degradation processes and analyzes the experimental and theoretical approaches used to estimate the lifetime of nanostructured and nanoconfined materials in various environments.
Author: Materials Research Society Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 336
Book Description
Surface interactions and modifications have become increasingly critical for a broad range of manufacturing technologies. Applications can be in traditional manufacturing sectors and in manufacturing processes for microelectronics, optics, and micro-/nanoelectromechanical systems (MEMS/NEMS). Many applications demand engineered surfaces at different length scales that will function under extreme conditions. The goal of this book is to advance understanding of these diverse applications. In the field of tribological coatings, the increasing sophistication of coating processes to provide control over materials and composition gradients is being exploited to tailor properties such as adhesion, stresses, thermal barrier and wear resistance. Understanding the influence of nanostructure in coatings has become pivotal in the development of hard and wear-resistant materials. Modeling and simulation continue to make contributions to the understanding and predication of surface properties and surface interactions. Advances in this field have focused on the microstructure and organization of organic thin films. In tribology, the combination of modeling, with experimental probe techniques, is increasing our understanding of erosion and wear mechanisms.
Author: A. Kumar Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 330
Book Description
Technology requirements associated with the progressive scaling of devices for future technology nodes, coupled with the aggressive introduction of new materials, places tremendous demands on chemical-mechanical polishing. The goal of this 2005 book, which is part of a popular series from MRS, is to bring together experts from a broad spectrum of research and technology groups currently working on CMP, to review advances made, and to offer a comprehensive discussion of future challenges that must be overcome. The book shows trends in the development of consumables, process modules, tool designs, process integration, modeling, defect characterization, and metrology. Topics include: planarization processes and applications; consumables -CMP pads and slurries; CMP equipment and metrology; and CMP modeling and simulation.
Author: S. Ashok
Author: S. Ashok
Author: Materials Research Society. Meeting
Author: S. Ashok
Author: Robert W. Collins
Author: Materials Research Society. Meeting
Author: 
Author: Materials Research Society. Meeting
Author: Materials Research Society
Author: A. Kumar
Author: Materials Research Society. Meeting