Author: Jerzy RuzylloPublisher:
ISBN:
Category :
Languages : en
Pages : 399
Book Description
Semiconductor cleaning technology 1989
Author: Jerzy RuzylloSemiconductor Cleaning Technology, 1989
Author: Electrochemical Society. Dielectrics and Insulation DivisionPublisher:
ISBN:
Category : Semiconductor wafers
Languages : en
Pages : 399
Book Description
Semiconductor Cleaning Technology, 1989
Author: Richard E. NovakSemiconductor Cleaning Technology/1989
Author: Electrochemical SocietyCleaning Technology in Semiconductor Device Manufacturing
Author: Publisher: The Electrochemical Society
ISBN: 9781566772594
Category : Technology & Engineering
Languages : en
Pages : 636
Book Description
Handbook of Silicon Wafer Cleaning Technology
Author: Karen ReinhardtPublisher: William Andrew
ISBN: 0815517734
Category : Technology & Engineering
Languages : en
Pages : 749
Book Description
The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. A review of the current cleaning technologies is included. Also, advanced cleaning technologies that are under investigation for next generation processing are covered; including supercritical fluid, laser, and cryoaerosol cleaning techniques. Additionally theoretical aspects of the cleaning technologies and how these processes affect the wafer is discussed such as device damage and surface roughening will be discussed. The analysis of the wafers surface is outlined. A discussion of the new materials and the changes required for the surface conditioning process used for manufacturing is also included. Focused on silicon wafer cleaning techniques including wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits As this book covers the major technologies for removing contaminants, it is a reliable reference for anyone that manufactures integrated circuits, or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process Editors are two of the top names in the field and are both extensively published Discusses next generation processing techniques including supercritical fluid, laser, and cryoaerosol
Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10
Author: Takeshi HattoriPublisher: The Electrochemical Society
ISBN: 156677568X
Category : Microelectronics
Languages : en
Pages : 497
Book Description
This issue covers topics related to the removal of contaminants from and conditioning of Si (SOI), SiC, Ge, SiGe, and III-V semiconductor surfaces; cleaning media, including non-aqueous cleaning methods and tools; front- and back-end cleaning operations; integrated cleaning; cleaning of MEMS; photomasks (reticles); porous low-k dielectrics; post-CMP cleaning; wafer bevel cleaning and polishing; characterization, evaluation, and monitoring of cleaning; correlation with device performance as well as cleaning of equipment and storage and handling hardware. The hardcover edition includes a bonus CD-ROM of Cleaning Technology in Semiconductor Device Manufacturing 1989?2007: Proceedings from the ECS Semiconductor Cleaning Symposia 1?10. This bonus material is not available with the PDF edition.
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Author: Jerzy RużyłłoPublisher: The Electrochemical Society
ISBN: 9781566771887
Category : Technology & Engineering
Languages : en
Pages : 668
Book Description
Proceedings of the Third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
Author: Vikram J. KapoorPublisher: The Electrochemical Society
ISBN: 9781566770484
Category : Science
Languages : en
Pages : 644
Book Description
Fundamentals of Semiconductor Processing Technology
Author: Badih El-KarehPublisher: Springer Science & Business Media
ISBN: 9780792395348
Category : Technology & Engineering
Languages : en
Pages : 620
Book Description
The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.