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Selective Directed Self-assembly of Coexisting Morphologies Using Block Copolymer Blends

Selective Directed Self-assembly of Coexisting Morphologies Using Block Copolymer Blends PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :

Book Description
Directed self-assembly (DSA) of block copolymers is an emergent technique for nano-lithography, but is limited in the range of structures possible in a single fabrication step. We expand on traditional DSA chemical patterning. Moreover, a blend of lamellar- and cylinder-forming block copolymers assembles on specially designed surface chemical line gratings, leading to the simultaneous formation of coexisting ordered morphologies in separate areas of the substrate. The competing energetics of polymer chain distortions and chemical mismatch with the substrate grating bias the system towards either line/space or dot array patterns, depending on the pitch and linewidth of the prepattern. This contrasts with typical DSA, wherein assembly of a single-component block copolymer on chemical templates generates patterns of either lines/spaces (lamellar) or hexagonal dot arrays (cylinders). In our approach, the chemical template encodes desired local spatial arrangements of coexisting design motifs, self-assembled from a single, sophisticated resist.

Selective Directed Self-assembly of Coexisting Morphologies Using Block Copolymer Blends

Selective Directed Self-assembly of Coexisting Morphologies Using Block Copolymer Blends PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :

Book Description
Directed self-assembly (DSA) of block copolymers is an emergent technique for nano-lithography, but is limited in the range of structures possible in a single fabrication step. We expand on traditional DSA chemical patterning. Moreover, a blend of lamellar- and cylinder-forming block copolymers assembles on specially designed surface chemical line gratings, leading to the simultaneous formation of coexisting ordered morphologies in separate areas of the substrate. The competing energetics of polymer chain distortions and chemical mismatch with the substrate grating bias the system towards either line/space or dot array patterns, depending on the pitch and linewidth of the prepattern. This contrasts with typical DSA, wherein assembly of a single-component block copolymer on chemical templates generates patterns of either lines/spaces (lamellar) or hexagonal dot arrays (cylinders). In our approach, the chemical template encodes desired local spatial arrangements of coexisting design motifs, self-assembled from a single, sophisticated resist.

Self-assembly of Block Copolymers for the Fabrication of Functional Nanomaterials

Self-assembly of Block Copolymers for the Fabrication of Functional Nanomaterials PDF Author: Li Yao
Publisher:
ISBN:
Category : Block copolymers
Languages : en
Pages : 150

Book Description
This dissertation explores the use of block copolymers which can self-assemble into different morphologies as templates to fabricate nanostructured materials. The first section (Chapters 2-4) reports the formation of mesoporous silica films with spherical, cylindrical and bicontinuous pores up to 40 nm in diameter through replicating the morphologies of the solid block copolymer (BCP) templates, polystyrene-b-poly(tert-butyl acrylate) (PS-b-PtBA), via phase selective condensation of tetraethylorthosilicate in supercritical CO2. Next, directed self-assembly was used to control the orientation of cylindrical domains in PS-b-PtBA templates. Large-area aligned mesochannels in silica films with diameters tunable between 5 and 30 nm were achieved through the replication of oriented templates via scCO2 infusion. The long-range alignment of mesochannels was confirmed through GISAXS with sample stage azimuthal rotation. In the second section (Chapters 5-6), enantiopure tartaric acid was used as an additive to dramatically improve ordering in poly(ethylene oxide-block-tert-butyl acrylate) (PEO-b-PtBA) copolymers. Transmission electron microscopy (TEM), atomic force microscopy (AFM) and X-ray scattering were used to study the phase behavior and morphologies within both bulk and thin films. With the addition of a photo acid generator, photo-induced disorder in the PEO-b-PtBA/tartaric acid composite system was achieved upon UV exposure which deprotected the PtBA block to yield poly(acrylic acid) (PAA), which is phase-miscible with PEO. Area-selective UV exposure using a photo-mask was applied with the assistance of trace amounts of base quencher to achieve high-resolution hierarchical patterns. Helical superstructures were observed by TEM in this BCP/chiral additive system with 3D handedness confirmed by TEM tomography. In the last section (Chapter 7), ultra-high loadings of nanoparticles into target domains of block copolymer composites were achieved by blending the block copolymer hosts with small molecule additives that exhibit strong interactions with one of the polymer chain segments and with the nanoparticle ligands via hydrogen bonding. The addition of 40 wt% D-tartaric acid to poly(ethylene oxide-block-tert-butyl acrylate) (PEO-b-PtBA) enabled the loading of up to 150 wt% of 4-hydroxythiophenol functionalized Au nanoparticles relative to the mass of the target hydrophilic domain. This was equivalent to over 40% Au by mass of the resulting well ordered composite as measured by thermal gravimetric analysis.

Block Copolymer Self-assembly - a Computational Approach Towards Novel Morphologies

Block Copolymer Self-assembly - a Computational Approach Towards Novel Morphologies PDF Author: Karim Raafat Gadelrab
Publisher:
ISBN:
Category :
Languages : en
Pages : 140

Book Description
Spontaneous self-assembly of materials is a phenomenon exhibited by different molecular systems. Among many, Block copolymers (BCPs) proved to be particularly interesting due to their ability to microphase separate into periodic domains. Nonetheless, the rising need for arbitrary, complex, 3D nanoscale morphology shows that what is commonly achievable is quite limited. Expanding the range of BCPs morphologies could be attained through the implementation of a host of strategies that could be used concurrently. Using directed self-assembly (DSA), a sphere forming BCP was assembled in a randomly displaced post template to study system resilience towards defect creation. Template shear-like distortion seemed to govern local defect generation. Defect clusters with symmetries compatible with that of the BCP showed enhanced stability. Using 44 and 32434 Archimedean tiling templates that are incompatible with BCP six-fold symmetry created low symmetry patterns with an emergent behavior dependent on pattern size and shape. A variation of DSA is studied using modulated substrates. Layer-by-layer deposition of cylinder forming BCPs was investigated. Self-consistent field theory (SCFT) and strong segregation theory SST were employed to provide the understanding and the conditions under which particular orientations of consecutive layers were produced. Furthermore, deep functionalized trenches were employed to create vertically standing high-[chi] BCP structures. Changing annealing conditions for a self-assembled lamellar structure evolved the assembled pattern to a tubular morphology that is non-native to diblock copolymers. A rather fundamental but challenging strategy to go beyond the standard motifs common to BCPs is to synthesize multiblock molecules with an expanded design space. Triblock copolymers produced bilayer perforated lamellar morphology. SCFT analysis showed a large window of stability of such structures in thin films. In addition, a model for bottlebrush BCPs (BBCPs) was constructed to investigate the characteristics of BBCPs self-assembly. Pre-stacked diblock sidechains showed improved microphase separation while providing domain spacing relevant to lithography applications. A rich phase diagram was constructed at different block concentrations. The ability to explore new strategies to discover potential equilibrium morphologies in BCPs is supported by strong numerical modeling and simulations efforts. Accelerating SCFT performance would greatly benefit BCP phase discovery. Preliminary work discussed the first attempt to Neural Network (NN) assisted SCFT. The use of NN was able to cut on the required calculations steps to reach equilibrium morphology, demonstrating accelerated calculation, and escaping trapped states, with no effect on final structure.

Directed Self-assembly of Block Copolymers and Ternary Block Copolymer/homopolymer Blends on Chemically Patterned Surfaces Into Device-oriented Geometries

Directed Self-assembly of Block Copolymers and Ternary Block Copolymer/homopolymer Blends on Chemically Patterned Surfaces Into Device-oriented Geometries PDF Author: Mark P. Stoykovich
Publisher:
ISBN:
Category :
Languages : en
Pages : 210

Book Description


Block Copolymers I

Block Copolymers I PDF Author: Volker Abetz
Publisher: Springer Science & Business Media
ISBN: 9783540265801
Category : Technology & Engineering
Languages : en
Pages : 264

Book Description
1 N. Hadjichristidis, M. Pitsikalis, H. Iatrou: Synthesis of Block Copolymers.- 2 V. Abetz: Phase Behaviour and Morphologies of Block Copolymers.-

Amphiphilic Block Copolymers

Amphiphilic Block Copolymers PDF Author: P. Alexandridis
Publisher: Elsevier
ISBN: 0080527108
Category : Science
Languages : en
Pages : 449

Book Description
It is the belief of the editors of this book that the recognition of block copolymers as being amphiphilic molecules and sharing common features with other well-studied amphiphiles will prove beneficial to both the surfactant and the polymer communities. An aim of this book is to bridge the two communities and cross-fertilise the different fields. To this end, leading researchers in the field of amphiphilic block copolymer self-assembly, some having a background in surfactant chemistry, and others with polymer physics roots, have agreed to join forces and contribute to this book.The book consists of four entities. The first part discusses theoretical considerations behind the block copolymer self-assembly in solution and in the melt. The second part provides case studies of self-assembly in different classes of block copolymers (e.g., polyethers, polyelectrolytes) and in different environments (e.g., in water, in non-aqueous solvents, or in the absence of solvents). The third part presents experimental tools, ranging from static (e.g., small angle neutron scattering) to dynamic (e.g., rheology), which can prove valuable in the characterization of block copolymer self-assemblies. The fourth part offers a sampling of current applications of block copolymers in, e.g., formulations, pharmaceutics, and separations, applications which are based on the unique self-assembly properties of block copolymers.

Self-assembly Behavior of Block Copolymer/homopolymer Blends in Thin Films

Self-assembly Behavior of Block Copolymer/homopolymer Blends in Thin Films PDF Author: Shuaigang Xiao
Publisher:
ISBN:
Category :
Languages : en
Pages : 208

Book Description


Self-Assembly of Polymers

Self-Assembly of Polymers PDF Author: Dmitry Volodkin
Publisher: MDPI
ISBN: 3039285068
Category : Technology & Engineering
Languages : en
Pages : 186

Book Description
Nowadays, polymer self-assembly has become extremely attractive for both biological (drug delivery, tissue engineering, scaffolds) and non-biological (packaging, semiconductors) applications. In nature, a number of key biological processes are driven by polymer self-assembly, for instance protein folding. Impressive morphologies can be assembled from polymers thanks to a diverse range of interactions involved, e.g., electrostatics, hydrophobic, hots-guest interactions, etc. Both 2D and 3D tailor-made assemblies can be designed through modern powerful techniques and approaches such as the layer-by-layer and the Langmuir-Blodgett deposition, hard and soft templating. This Special Issue highlights contributions (research papers, short communications, review articles) that focus on recent developments in polymer self-assembly for both fundamental understanding the assembly phenomenon and real applications.

Mesoscale Modeling of Directed Self Assemblies of Block Copolymer Lithography

Mesoscale Modeling of Directed Self Assemblies of Block Copolymer Lithography PDF Author: Shubham Dattaram Pinge
Publisher:
ISBN:
Category :
Languages : en
Pages : 134

Book Description
Block copolymers (BCPs) self organize at molecular level building blocks and forming nano-structures with characteristic length scales. As these nano-structures resemble the lithographic features desired in the micro-electronics industry, they are used as a nanotemplate in the manufacture of micro-chips. This study focusses on the pillarpost guide method of directing self assemblies to form 'punch hole' lithographic nano-patterns. The work aims to elucidate the necessary conditions required to form hexagonal packed cylinders using di-block copolymers. It sheds lights on various factors that affect the BCP self assembly and how the morphology is altered due to these factors. These include biasing the surfaces (selective towards one of the BCP phase) and altering the BCP properties (chain length, volume fraction etc). The morphologies attained have been independently verified by experimental results obtained from our collaborators at EMD Performance Materials Group, NJ-USA. Apart from optimizing the morphology of the system, fundamental studies have been performed on the system. The behavior of the BCP chains is analyzed under a simple confinement between two flat substrates that selectively wets one of the phases. The morphology thus formed is studied with the polymer chain length being the reaction coordinate for a fixed critical confinement. The results obtained from the fundamental study has helped us in explaining the morphology formed in a more complex geometry like pillarpost guide that uses topography to confine the polymers. This in turn has proven to be of great benefit to optimally design the system and achieve the ideal nanolithographic patterns. iii.

Directed Self-assembly of Block Copolymer Films on Chemically Nanopatterned Surfaces

Directed Self-assembly of Block Copolymer Films on Chemically Nanopatterned Surfaces PDF Author: Adam M. Welander
Publisher:
ISBN:
Category :
Languages : en
Pages : 118

Book Description