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Author: Harry L. Stover Publisher: ISBN: Category : Masks (Electronics). Languages : en Pages : 708
Book Description
SPIE Milestones are collections of seminal papers from the world literature covering important discoveries and developments in optics and photonics.
Author: Harry L. Stover Publisher: ISBN: Category : Masks (Electronics). Languages : en Pages : 708
Book Description
SPIE Milestones are collections of seminal papers from the world literature covering important discoveries and developments in optics and photonics.
Author: Victor M. Bright Publisher: SPIE-International Society for Optical Engineering ISBN: Category : Microelectromechanical systems Languages : en Pages : 654
Book Description
A selection of 81 papers on six major topics within the field of optical microelectromechanical systems (MEMS).
Author: Alfred Kwok-Kit Wong Publisher: SPIE Press ISBN: 9780819458292 Category : Technology & Engineering Languages : en Pages : 280
Book Description
Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
Author: Bruce W. Smith Publisher: CRC Press ISBN: 1420051539 Category : Technology & Engineering Languages : en Pages : 866
Book Description
This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Author: Francis T. S. Yu Publisher: SPIE-International Society for Optical Engineering ISBN: Category : Computers Languages : en Pages : 668
Book Description
SPIE Milestones are collections of seminal papers from the world literature covering important discoveries and developments in optics and photonics.
Author: David J. Whitehouse Publisher: SPIE-International Society for Optical Engineering ISBN: Category : Technology & Engineering Languages : en Pages : 672
Book Description
Topics in this volume include: comparison of interferometric contouring techniques; comparison of visibility of standard scratches; and near-grazing illumination and shadowing of rough surfaces.
Author: Harry L. Stover
Author: Harry L. Stover
Author: Victor M. Bright
Author: Alfred Kwok-Kit Wong
Author: Harry L. Stover
Author: Suganda Jutamulia
Author: Bruce W. Smith
Author: Suganda Jutamulia
Author: Guy Indebetouw
Author: Francis T. S. Yu
Author: David J. Whitehouse