Author: Steven Lester SilvaPublisher:
ISBN:
Category :
Languages : en
Pages : 198
Book Description
Scanning Tunneling Microscopy Studies of Reactions on Surfaces and Nanometer Scale Structures
Author: Steven Lester SilvaScanning Tunneling Microscopy Studies of Nanometer-scale Structures
Author: Standley Michael YorkPublisher:
ISBN:
Category :
Languages : en
Pages : 196
Book Description
Chemical, Structural and Electronic Analysis of Heterogeneous Surfaces on Nanometer Scale
Author: R. RoseiPublisher: Springer Science & Business Media
ISBN: 9401157243
Category : Science
Languages : en
Pages : 138
Book Description
An assessment of the recent achievements and relative strengths of two developing techniques for characterising surfaces at the nanometer scale: (i) local probe methods, including scanning tunnelling microscopy and its derivatives; and (ii) nanoscale photoemission and absorption spectroscopy for chemical analysis. The keynote lectures were delivered by some of the world's best scientists in the field and some of the topics covered include: (1) The possible application of STM in atomically resolved chemical analysis. (2) The principles of scanning force/friction and scanning near-field optical microscopes. (3) The scanning photoemission electron microscopes built at ELETTRA and SRRC, with a description of synchrotron radiation microscopy. (4) Recent progress in the development of spatially-resolved photoelectron microscopy, especially the use of zone plate photon optics. (5) The present status of non-scanning photoemission microscopy with slow electrons. (6) the BESSY 2 project for a non-scanning photoelectron microscope with electron optics. (7) Spatially-resolved in situ reaction studies of chemical waves and oscillatory phenomena with the UV photoemission microscope.
Nanometer-scale Surface Restructuring of Silver Films Studied by Scanning Tunneling Microscopy
Author: Ernest Roger FrankScanning Tunneling Microscopy in Surface Science, Nanoscience, and Catalysis
Author: Michael BowkerPublisher: John Wiley & Sons
ISBN: 9783527628834
Category : Science
Languages : en
Pages : 258
Book Description
Here, top international authors in the field of STM and surface science present first-class contributions on this hot topic, bringing the reader up to date with the latest developments in this rapidly advancing field. The focus is on the nanoscale, particularly in relation to catalysis, involving developments in our understanding of the nature of the surfaces of oxides and nanoparticulate materials, as well as adsorption, and includes in-situ studies of catalysis on such model materials. Of high interest to practitioners of surface science, nanoscience, STM and catalysis.
Scanning Tunneling Microscopy and Computational Chemistry Studies for Controlled Reactions on Silicon
Author: Dimitri B. SkliarPublisher: ProQuest
ISBN: 9780549924609
Category : Scanning tunneling microscopy
Languages : en
Pages :
Book Description
The understanding of the chemistry of silicon surfaces has been one of the major contributors in development and improvement of silicon based microelectronic devices in the past several decades. Progressively, the dimensions of devices have reduced by several orders of magnitude, presently at the length scale of few tens of nanometers, and are expected to decrease in size even more. For chemistry based film growth methods such as chemical vapor deposition (CVD) or atomic layer deposition (ALD), control of film structure and composition in this spatial regime requires a very detailed nanoscopic understanding of silicon surface chemistry. A combined experimental and theoretical approach, utilizing ultra high vacuum scanning tunneling microscopy (UHV-STM) and density functional theory (DFT), to understanding the surface chemistry of Si(100) is illustrated in the context of ALD development for high dielectric constant metal oxides. As a first possible route to controllably deposit monolayer thick metal layer, the reaction of the metal-organic molecule with bare silicon surface is considered. The interaction of the protonated b-diketonate ligand, 2,2,6,6-tetramethyl-3,5-heptanedione (dpmH), which is a byproduct of the strontium metal-organic precursor vaporization, with Si(100)-2x1 surface is investigated. Two aspects of the molecule's interactions were addressed: the adsorption at room temperature as well as its thermal decomposition. By combination of the experiments with DFT calculations of adsorbate geometry, STM image simulations, and reaction pathways it was possible to propose unique binding configurations that match the experimentally observed adsorption features. Theoretical analysis of multiple competing reaction pathways showed that hydroxyl dissociation via a 1,7 H-shift mechanism is the dominant adsorption pathway. Several other pathways including [2+4] addition, [2+2] C=O intra-dimer addition, [2+2] C=O intra-dimer addition with OH dissociation on an adjacent dimer, [2+2] C=C intra-dimer addition, and "ene" addition are found to be barrierless with respect to the entrance channel, and have small barriers relative to a hypothesized adsorption precursor intermediate. Pathways involving 1,3 and 1,2 intra-molecular H-shifts are found to be highly activated and are expected to be inaccessible at room temperature. Several state inter-conversions are found to be unlikely as well. These results provide insight to the competitive adsorption pathways for multifunctional molecules on silicon. Investigations of thermally induced decomposition of adsorbed dpmH molecules showed that there are no significant products of desorption of carbon containing fragments of the molecule, i.e. most of the carbon atoms incorporate into the silicon surface causing it to reconstruct to a c(4x4) phase at exposures below ~ 0.15 L. At higher exposures formation of SiC islands is observed. These findings demonstrate that schemes to deposit materials from organometallic compounds containing b-diketone ligands onto clean Si(100)-2x1 surface cannot result in an ordered interfacial structure as carbon incorporation into the substrate is inevitable. An alternative strategy for depositing metal template layer is proposed, where the initial reacting surface will be terminated by water at room temperature. The stability of surface hydroxyl groups and mechanisms of their decomposition in 300-600K temperature range are analyzed. It is found that surface oxidation does not follow first order kinetics with respect to the hydroxyl groups. DFT calculations of oxygen insertion pathways point towards a catalytic effect of the dangling bonds and suggest that in the 500-550K range the insertion events should occur predominantly next to unoccupied surface silicon sites. A model is proposed, where diffusing dangling bonds act as moving catalysts for hydroxyl group decomposition. Kinetic Monte Carlo (kMC) simulations are used to compare the results of this model with experimental data. A strategy to increase hydroxyl group stability is demonstrated where the initial concentration of surface dangling bonds is decreased by water termination at 130K.
Scientific and Technical Aerospace Reports
Author: Scanning Tunneling Microscopy and Its Application
Author: Chunli BaiPublisher: Springer Science & Business Media
ISBN: 9783540657156
Category : Medical
Languages : en
Pages : 392
Book Description
This book presents a unified view of the rapidly growing field of scanning tunneling microscopy and its many derivatives. After examining novel scanning-probe techniques and the instrumentation and methods, the book provides detailed accounts of STM applications. It examines limitations of the present-day investigations and provides insight into further trends. "I strongly recommend that Professor Bai's book be a part of any library that serves surface scientists, biochemists, biophysicists, material scientists, and students of any science or engineering field...There is no doubt that this is one of the better (most thoughtful) texts." Journal of the American Chemical Society (Review of 1/e)
Coopertive Research Associateships Tenable at the Naval Research Laboratory, Washington
Author: Publisher: National Academies
ISBN:
Category : Engineering
Languages : en
Pages : 320
Book Description
Author: Like Ruan