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Author: Charbel Said Madi Publisher: ISBN: Category : Languages : en Pages : 166
Book Description
Remote Plasma Assisted Pulsed Laser Deposition (RPA-PLD) film growth differs fro m conventional PLD in that laser ablation is carried in a chemically activated o xygen background generated by a plasma source as opposed to deposition in ground state O2 molecules in reactive PLD. The aim of this thesis is to investigate th e use of RPA-PLD technique for the growth of chromium oxide thin films and in pa rticular the growth of the metastable half-metallic CrO2 phase. Films were grown on both Si (100) and TiO2 (100) substrates by KrF Excimer las er ablation of Cr2O3 and Cr targets. The effects of plasma power, activated oxyg en pressure, substrate temperature, as well as substrate and target composition on the bonding, microstructure and magnetic domains of the films were studied us ing Fourier Transform Infra-Red Spectroscopy (FTIR), Grazing Incidence X-Ray Dif fraction (GIXRD), Atomic Force Microscopy (AFM) and Magnetic Force Microscopy (M FM). The combination of the Pulsed Laser Deposition with an oxygen remote plasma so urce promoted the formation of the CrO2 phase. The effect of plasma source was s ignificant at high pressure: Films deposited at high O2 pressure (75 mTorr) reve aled the presence of the CrO3 phase (the stable CrOx phase at low temperatures) whereas, the use of activated oxygen pressure lead to the formation of the CrO2 phase. At low deposition temperatures, namely below 300?C, the films consisted of a mixture of several oxide phases with the occurrence of CrO2 features embedd ed in a pre-dominantly amorphous matrix. With increasing the temperature up to 4 50 oC, the structure of the films reverted to a polycrystalline Cr2O3 phase as i nferred from the appearance of the corresponding peaks in the XRD spectra and fr om the narrowing of the infra-red absorption bands. At activated oxygen pressure of less than 30 mTorr, the films were inert and no postdeposition oxidation was observed. The use of a higher activated oxygen pressure, however, resulted in p orous films exhibiting postdeposition oxidation and an increase of CrO2 amounts as inferred from the intensity increase of both the FTIR absorption bands and th e magnetic phase interaction in the MFM scans.
Author: Charbel Said Madi Publisher: ISBN: Category : Languages : en Pages : 166
Book Description
Remote Plasma Assisted Pulsed Laser Deposition (RPA-PLD) film growth differs fro m conventional PLD in that laser ablation is carried in a chemically activated o xygen background generated by a plasma source as opposed to deposition in ground state O2 molecules in reactive PLD. The aim of this thesis is to investigate th e use of RPA-PLD technique for the growth of chromium oxide thin films and in pa rticular the growth of the metastable half-metallic CrO2 phase. Films were grown on both Si (100) and TiO2 (100) substrates by KrF Excimer las er ablation of Cr2O3 and Cr targets. The effects of plasma power, activated oxyg en pressure, substrate temperature, as well as substrate and target composition on the bonding, microstructure and magnetic domains of the films were studied us ing Fourier Transform Infra-Red Spectroscopy (FTIR), Grazing Incidence X-Ray Dif fraction (GIXRD), Atomic Force Microscopy (AFM) and Magnetic Force Microscopy (M FM). The combination of the Pulsed Laser Deposition with an oxygen remote plasma so urce promoted the formation of the CrO2 phase. The effect of plasma source was s ignificant at high pressure: Films deposited at high O2 pressure (75 mTorr) reve aled the presence of the CrO3 phase (the stable CrOx phase at low temperatures) whereas, the use of activated oxygen pressure lead to the formation of the CrO2 phase. At low deposition temperatures, namely below 300?C, the films consisted of a mixture of several oxide phases with the occurrence of CrO2 features embedd ed in a pre-dominantly amorphous matrix. With increasing the temperature up to 4 50 oC, the structure of the films reverted to a polycrystalline Cr2O3 phase as i nferred from the appearance of the corresponding peaks in the XRD spectra and fr om the narrowing of the infra-red absorption bands. At activated oxygen pressure of less than 30 mTorr, the films were inert and no postdeposition oxidation was observed. The use of a higher activated oxygen pressure, however, resulted in p orous films exhibiting postdeposition oxidation and an increase of CrO2 amounts as inferred from the intensity increase of both the FTIR absorption bands and th e magnetic phase interaction in the MFM scans.
Author: Liviu Duta Publisher: MDPI ISBN: 3036510443 Category : Medical Languages : en Pages : 224
Book Description
Despite its limitation in terms of surface covered area, the PLD technique still gathers interest among researchers by offering endless possibilities for tuning thin film composition and enhancing their properties of interest due to: (i) the easiness of a stoichiometric transfer even for very complex target materials, (ii) high adherence of the deposited structures to the substrate, (iii) controlled degree of phase, crystallinity, and thickness of deposited coatings, (iv) versatility of the experimental set-up which allows for simultaneous ablation of multiple targets resulting in combinatorial maps or consecutive ablation of multiple targets producing multi-layered structures, and (v) adjustment of the number of laser pulses, resulting in either a spread of nanoparticles, islands of materials or a complete covering of a surface. Moreover, a variation of PLD, known as Matrix Assisted Pulsed Laser Evaporation, allows for deposition of organic materials, ranging from polymers to proteins and even living cells, otherwise difficult to transfer unaltered in the form of thin films by other techniques. Furthermore, the use of laser light as transfer agent ensures purity of films and pulse-to-pulse deposition allows for an unprecedented control of film thickness at the nm level. This Special Issue is a collection of state-of-the art research papers and reviews in which the topics of interest are devoted to thin film synthesis by PLD and MAPLE, for numerous research and industry field applications, such as bio-active coatings for medical implants and hard, protective coatings for cutting and drilling tools withstanding high friction and elevated temperatures, sensors, solar cells, lithography, magnetic devices, energy-storage and conversion devices, controlled drug delivery and in situ microstructuring for boosting of surface properties.
Author: P.L.F. Hemment Publisher: Newnes ISBN: 0444596313 Category : Technology & Engineering Languages : en Pages : 630
Book Description
Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation.Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.
Author: Mihaela Filipescu Publisher: ISBN: Category : Technology Languages : en Pages :
Book Description
The aim of this work is to show that material processing by laser-based technologies can lead to the growth of multifunctional thin films with potential in a large area of applications. The synthesis of Hf, Ta, Si, and Al metal oxides described here relies on the use of pulsed laser deposition (PLD), or radiofrequency (RF) assisted PLD. The morphology and structure of the as-grown thin films are investigated by atomic force microscopy, X-ray diffraction, and transmission electron microscopy, whilst the optical properties are determined by spectroellipsometry. The dielectric behaviour of the deposited layers is investigated by electrical measurements.
Author: Armando Luches Publisher: Nova Science Publishers ISBN: 9781611224207 Category : Boron nitride Languages : en Pages : 0
Book Description
Pulsed laser deposition (PLD) is at present one of the most interesting technique for thin film deposition. In the PLD process a film is formed by ablating a solid target with energetic laser pulses and collecting the material of interest on a substrate placed a few cm from the target. According to its ability to carry the stoichiometry from the target to the substrate and to its relatively high growth rate (~0.1 nm/pulse), PLD is an attractive technique for compound thin film deposition. This technique offers the possibility of depositing thin films on room-temperature or low-temperature substrates, due to the high energy of the species forming the laser plasma plume expanding from the target to the substrate. This book reviews research on the depositon of c-BN films by using PLD, ion-assisted PLD and other laser-assisted procedures.
Author: Charbel Said Madi
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