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Author: Publisher: ISBN: Category : Languages : en Pages : 76
Book Description
The goals of this project are: 1) the development of a new method for the fabrication of superconducting oxide thin films, viz computer controlled ion beam sputter deposition; and 2) the fabrication of YBa2Cu3O(7-delta) thin films and devices using this method. In the early stage of the project it was demonstrated that the use of complex multicomponent sputter targets (such as ceramic YBa2Cu3O7-delta) present significant problems for compositional control. The new computer-controlled ion beam sputter deposition system was developed. The key features include: 1) a rotatable target holder assembly, which serves to position elemental targets under the ion beam in a rapid sequence, 2) a primary ion beam to produce a sputtered flux from the targets, 3) a secondary oxygen beam (ionic, atomic, or reactive oxygen (ozone)) to oxygenate the film and lower the required deposition temperature, 4) complete computer interfacing to provide real time feedback on the thickness of the depositing species and control of the above items. In terms of the superconductor device objectives, the system is designed to allow for low temperature deposition for integrated devices, compositional control and flexibility, and for scaling to a commercial system. The capability of the system for controlled sequential deposition of layered structures is fundamental for the production of heterostructures and sandwich junctions (superconductor-insulator-superconductor and superconductor-normal-superconductor). This is demanding due to the short coherence lengths in the oxide superconductors.
Author: Publisher: ISBN: Category : Languages : en Pages : 76
Book Description
The goals of this project are: 1) the development of a new method for the fabrication of superconducting oxide thin films, viz computer controlled ion beam sputter deposition; and 2) the fabrication of YBa2Cu3O(7-delta) thin films and devices using this method. In the early stage of the project it was demonstrated that the use of complex multicomponent sputter targets (such as ceramic YBa2Cu3O7-delta) present significant problems for compositional control. The new computer-controlled ion beam sputter deposition system was developed. The key features include: 1) a rotatable target holder assembly, which serves to position elemental targets under the ion beam in a rapid sequence, 2) a primary ion beam to produce a sputtered flux from the targets, 3) a secondary oxygen beam (ionic, atomic, or reactive oxygen (ozone)) to oxygenate the film and lower the required deposition temperature, 4) complete computer interfacing to provide real time feedback on the thickness of the depositing species and control of the above items. In terms of the superconductor device objectives, the system is designed to allow for low temperature deposition for integrated devices, compositional control and flexibility, and for scaling to a commercial system. The capability of the system for controlled sequential deposition of layered structures is fundamental for the production of heterostructures and sandwich junctions (superconductor-insulator-superconductor and superconductor-normal-superconductor). This is demanding due to the short coherence lengths in the oxide superconductors.
Author: Publisher: ISBN: Category : Languages : en Pages : 10
Book Description
Ion beam sputter-deposition is a technique currently used by many groups to produce single and multicomponent thin films. This technique provides several advantages over other deposition methods, which include the capability for yielding higher film density, accurate stoichiometry control, and smooth surfaces. However, the relatively high kinetic energies associated with ion beam sputtering also lead to difficulties if the process is not properly controlled. Computer simulations have been performed to determine net deposition rates, as well as the secondary erosion, lattice damage, and gas implantation in the films, associated with primary ions scattered from elemental Y, Ba and Cu targets used to produce high temperature superconducting Y-Ba-Cu-O films. The simulations were performed using the TRIM code for different ion masses and kinetic energies, and different deposition geometries. Results are presented for primary beams of Ar, Kr and Xe incident on Ba and Cu targets at 0° and 45° with respect to the surface normal, with the substrate positioned at 0° and 45°. The calculations indicate that the target composition, mass and kinetic energy of the primary beam, angle of incidence on the target, and position and orientation of the substrate affect the film damage and trapped primary beam gas by up to 5 orders of magnitude.
Author: Shigeru Hayakawa Publisher: William Andrew Publishing ISBN: 9780815512806 Category : Reference Languages : en Pages : 304
Book Description
A concise, comprehensive overview of sputter deposition technologyùa key technology for materials research in the next decade. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallurgical coatings. High temperature superconductors can be synthesized with sputtering under non-equilibrium conditions. Diamond films and ferroelectric materials are other applications.
Author: Wade H. Shafer Publisher: Springer Science & Business Media ISBN: 1461303931 Category : Science Languages : en Pages : 427
Book Description
Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Data Analysis and Synthesis (CINDAS)* at Purdue University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dis semination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the thought that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all concerned if the printing and distribution of the volumes were handled by an international publishing house to assure improved service and broader dissemination. Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Corporation of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 39 (thesis year 1994) a total of 13,953 thesis titles from 21 Canadian and 159 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this impor tant annual reference work. While Volume 39 reports theses submitted in 1994, on occasion, certain uni versities do report theses submitted in previous years but not reported at the time.
Author: Kiyotaka Wasa Publisher: William Andrew ISBN: 1437734847 Category : Technology & Engineering Languages : en Pages : 657
Book Description
This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. - A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available - All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique - 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
Author: Yao Jin Publisher: ISBN: Category : Languages : en Pages :
Book Description
A vanadium oxide (VO x) thin film is the most common imaging layer used in commercial uncooled focal plane arrays for infrared cameras. These VOx thin films have an x value ranging from 1.3 to 2 and have low resistivity (0.1 to 10 [omega] cm), high temperature coefficient of resistance (TCR) (-2 to -3 %/K), and low 1/f noise. Reactive ion beam sputtering is typically used to deposit these VOx thin films for commercial thermal imaging cameras. However, the reactive ion beam deposition system for the VOx is reported to have less than desirable throughput and a narrow process window. In this work, the potential for reactive pulsed-dc magnetron sputtering of nanocomposite VOx thin films for microbolometer applications was investigated. VOx thin films with resistivity from 10-4 to 105 [omega] cm with a TCR from 0 to -4.3 %/K were deposited by reactive sputtering from a metallic vanadium target in argon/oxygen mixtures with substrate bias. Magnetron sputtered VOx shows bolometric properties comparable to those of commercial-grade IBD prepared VOx. Important limitations for manufacturing implementation of reactive magnetron sputtering such as hysteresis oxidation and non-uniform oxidation of the vanadium target surface were evaluated. The VOx film deposition rate, resistivity, and temperature coefficient of resistance were correlated to oxygen to argon ratio, processing pressure, target-to-substrate distance, and oxygen inlet positions. To deposit VOx in the resistivity range of 0.1--10 [omega] cm with good uniformity and process control, it was found that a lower processing pressure, larger target-to-substrate distance, and an oxygen inlet near the substrate are useful. Other processing methods employing magnetron sputtering were investigated such as co-sputtering of V and V2O5 target, sputtering from a VC target, a V2O5 target, and a V2Ox target but initial investigation of these methods did not yield a superior process to the simple sputtering of a pure metallic vanadium target. Another technique, biased target ion beam deposition (BTIBD), was investigated for deposition VOx thin films with potential alloy additions. In this BTIBD system, ions with energy lower than 25 eV were generated remotely and vanadium targets are negatively biased independently for sputtering. High TCR (
Author: Publisher: ISBN: Category : Languages : en Pages : 0
Book Description
Magnetron sputtering deposition is potentially the most economical deposition method for thin films. Presently sputtering can't deposit high temperature superconductors like Yttrium Barium Copper Oxide (YBCO) because of negative oxygen ion bombardment damage. Lowering the plasma discharge voltage to less than 100 volts would decrease such damage and make YBCO economically practical. The goal of this phase I effort was to lower plasma discharge voltages using high magnetic fields. Our results showed that high magnetic fields alone can lower plasma voltages to about 200 volts. Just as important, we showed that plasma impedance was lowered by more than ten times. Low plasma impedance allows high magnetic fields and electron injection into the plasma to be combined to lower plasma voltage to 30 volts. This combination removes the power limitations of electron injection. It should also produce epitaxial quality thin film semiconductors because low voltages allow 'self-bombardment' where the adatoms have the optimum energy to form a crystalline matrix at lower temperatures. The method is also applicable to thin film semiconductors such as II-VI solar cells and III-V films.
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Author: Shigeru Hayakawa
Author: Wade H. Shafer![Synthesis of YBa2Cu3O--[subscript Delta] Superconducting Thin Films by Reactive Ion-beam Sputter-deposition for Application to Devices PDF](https://books.google.com/books/content/images/frontcover/4DXyNwAACAAJ?fife=w80-h100)
Author: René Ralph Woolcott
Author: Kiyotaka Wasa
Author: Yao Jin
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