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Author: J.R. Beeler Publisher: Elsevier ISBN: 0080984649 Category : Technology & Engineering Languages : en Pages : 900
Book Description
Defects in Solids, Volume 13: Radiation Effects Computer Experiments provides guidance to persons interested in learning how to develop and use computer experiment programs to simulate defect production and annealing in solids. The book first elaborates on computer experiment methods and outline of defect properties computations. Topics include metal models used in defect property example calculations; configuration energy computation procedure; migration energy computation procedure; dynamical method; and Monte Carlo method. The publication also examines vacancies and divacancies and self interstitials. The manuscript takes a look at impurity atoms, defect migration, and vacancy clusters. Discussions focus on heterogeneous nucleation of vacancy clusters and voids, vacancy and divacancy migration, substitutional metallic large impurity atom, and vacancy clusters in face-centered cubic metals. The publication also tackles binary collision approximation cascade program construction and collision cascades and displacement spikes. The text is a valuable source of information for readers wanting to develop and use computer experiment programs to copy defect production and annealing in solids.
Author: J.R. Beeler Publisher: Elsevier ISBN: 0080984649 Category : Technology & Engineering Languages : en Pages : 900
Book Description
Defects in Solids, Volume 13: Radiation Effects Computer Experiments provides guidance to persons interested in learning how to develop and use computer experiment programs to simulate defect production and annealing in solids. The book first elaborates on computer experiment methods and outline of defect properties computations. Topics include metal models used in defect property example calculations; configuration energy computation procedure; migration energy computation procedure; dynamical method; and Monte Carlo method. The publication also examines vacancies and divacancies and self interstitials. The manuscript takes a look at impurity atoms, defect migration, and vacancy clusters. Discussions focus on heterogeneous nucleation of vacancy clusters and voids, vacancy and divacancy migration, substitutional metallic large impurity atom, and vacancy clusters in face-centered cubic metals. The publication also tackles binary collision approximation cascade program construction and collision cascades and displacement spikes. The text is a valuable source of information for readers wanting to develop and use computer experiment programs to copy defect production and annealing in solids.
Author: J.R. Beeler Publisher: North Holland ISBN: Category : Computers Languages : en Pages : 908
Book Description
Defects in Solids, Volume 13: Radiation Effects Computer Experiments provides guidance to persons interested in learning how to develop and use computer experiment programs to simulate defect production and annealing in solids. The book first elaborates on computer experiment methods and outline of defect properties computations. Topics include metal models used in defect property example calculations; configuration energy computation procedure; migration energy computation procedure; dynamical method; and Monte Carlo method. The publication also examines vacancies and divacancies and self interstitials. The manuscript takes a look at impurity atoms, defect migration, and vacancy clusters. Discussions focus on heterogeneous nucleation of vacancy clusters and voids, vacancy and divacancy migration, substitutional metallic large impurity atom, and vacancy clusters in face-centered cubic metals. The publication also tackles binary collision approximation cascade program construction and collision cascades and displacement spikes. The text is a valuable source of information for readers wanting to develop and use computer experiment programs to copy defect production and annealing in solids.
Author: C. Claeys Publisher: Springer Science & Business Media ISBN: 3662049740 Category : Science Languages : en Pages : 424
Book Description
This wide-ranging book summarizes the current knowledge of radiation defects in semiconductors, outlining the shortcomings of present experimental and modelling techniques and giving an outlook on future developments. It also provides information on the application of sensors in nuclear power plants.
Author: Hans-Jürgen Christ Publisher: Springer ISBN: 365824531X Category : Technology & Engineering Languages : en Pages : 624
Book Description
This book represents the final reports of the scientific projects funded within the DFG-SPP1466 and, hence, provides the reader with the possibility to familiarize with the leading edge of VHCF research. It draws a balance on the existing knowledge and its enhancement by the joint research action of the priority program. Three different material classes are dealt with: structural metallic materials, long-fiber-reinforced polymers and materials used in micro-electro-mechanical systems. The project topics address the development of suitable experimental techniques for high-frequency testing and damage monitoring, the characterization of damage mechanisms and damage evolution, the development of mechanism-based models and the transfer of the obtained knowledge and understanding into engineering regulations and applications.
Author: R.W. Cahn Publisher: Elsevier ISBN: 0080538940 Category : Technology & Engineering Languages : en Pages : 2889
Book Description
This is the fourth edition of a work which first appeared in 1965. The first edition had approximately one thousand pages in a single volume. This latest volume has almost three thousand pages in 3 volumes which is a fair measure of the pace at which the discipline of physical metallurgy has grown in the intervening 30 years.Almost all the topics previously treated are still in evidence in this version which is approximately 50% bigger than the previous edition. All the chapters have been either totally rewritten by new authors or thoroughly revised and expanded, either by the third-edition authors alone or jointly with new co-authors. Three chapters on new topics have been added, dealing with dry corrosion, oxidation and protection of metal surfaces; the dislocation theory of the mechanical behavior of intermetallic compounds; and (most novel) a chapter on polymer science for metallurgists, which analyses the conceptual mismatch between metallurgists' and polymer scientists' way of looking at materials. Special care has been taken throughout all chapters to incorporate the latest experimental research results and theoretical insights. Several thousand citations to the research and review literature are included in this edition. There is a very detailed subject index, as well as a comprehensive author index.The original version of this book has long been regarded as the standard text in physical metallurgy and this thoroughly rewritten and updated version will retain this status.
Author: Allan H Johnston Publisher: World Scientific ISBN: 9814467650 Category : Technology & Engineering Languages : en Pages : 376
Book Description
This book focuses on reliability and radiation effects in compound semiconductors, which have evolved rapidly during the last 15 years. It starts with first principles, and shows how advances in device design and manufacturing have suppressed many of the older reliability mechanisms.It is the first book that comprehensively covers reliability and radiation effects in optoelectronic as well as microelectronic devices. It contrasts reliability mechanisms of compound semiconductors with those of silicon-based devices, and shows that the reliability of many compound semiconductors has improved to the level where they can be used for ten years or more with low failure rates.
Author: J.M. Walls Publisher: Elsevier ISBN: 1483287882 Category : Science Languages : en Pages : 197
Book Description
This volume provides a comprehensive and up to the minute review of the techniques used to determine the nature and composition of surfaces. Originally published as a special issue of the Pergamon journal Vacuum, it comprises a carefully edited collection of chapters written by specialists in each of the techniques and includes coverage of the electron and ion spectroscopies, as well as the atom-imaging methods such as the atom probe field ion microscope and the scanning tunnelling microscope. Surface science is an important area of study since the outermost surface layers play a crucial role in processses such as catalysis, adhesion, wear, and corrosion, with applications in metallurgy, thin films and surface coatings, the chemicals and polymer industries, and microelectronics, to name a few. This book covers those techniques used routinely for surface analysis as well as those employed for more fundamental scientific studies. It will be of interest to university research workers, graduate students and to industrial scientists solving practical problems.
Author: J.R. Beeler
Author: J.R. Beeler
Author: J.R. Beeler
Author: C. Claeys
Author: 
Author: 
Author: Hans-Jürgen Christ
Author: R.W. Cahn
Author: Allan H Johnston
Author: 
Author: J.M. Walls