Auger- and X-Ray Photoelectron Spectroscopy in Materials Science PDF Download
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Auger- and X-Ray Photoelectron Spectroscopy in Materials Science PDF full book. Access full book title Auger- and X-Ray Photoelectron Spectroscopy in Materials Science by Siegfried Hofmann. Download full books in PDF and EPUB format.
Author: Siegfried Hofmann Publisher: Springer Science & Business Media ISBN: 3642273807 Category : Science Languages : en Pages : 544
Book Description
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Author: Siegfried Hofmann Publisher: Springer Science & Business Media ISBN: 3642273807 Category : Science Languages : en Pages : 544
Book Description
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Author: Siegfried Hofmann Publisher: Springer Science & Business Media ISBN: 3642273815 Category : Science Languages : en Pages : 545
Book Description
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Author: John F. Watts Publisher: John Wiley & Sons ISBN: 1119417643 Category : Technology & Engineering Languages : en Pages : 307
Book Description
Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.
Author: Patrick Echlin Publisher: Springer Science & Business Media ISBN: 1475790279 Category : Medical Languages : en Pages : 463
Book Description
This book has its origins in the intensive short courses on scanning elec tron microscopy and x-ray microanalysis which have been taught annually at Lehigh University since 1972. In order to provide a textbook containing the materials presented in the original course, the lecturers collaborated to write the book Practical Scanning Electron Microscopy (PSEM), which was published by Plenum Press in 1975. The course con tinued to evolve and expand in the ensuing years, until the volume of material to be covered necessitated the development of separate intro ductory and advanced courses. In 1981 the lecturers undertook the project of rewriting the original textbook, producing the volume Scan ning Electron Microscopy and X-Ray Microanalysis (SEMXM). This vol ume contained substantial expansions of the treatment of such basic material as electron optics, image formation, energy-dispersive x-ray spectrometry, and qualitative and quantitative analysis. At the same time, a number of chapters, which had been included in the PSEM vol ume, including those on magnetic contrast and electron channeling con trast, had to be dropped for reasons of space. Moreover, these topics had naturally evolved into the basis of the advanced course. In addition, the evolution of the SEM and microanalysis fields had resulted in the devel opment of new topics, such as digital image processing, which by their nature became topics in the advanced course.
Author: Donald T. Hawkins Publisher: Springer Science & Business Media ISBN: 1468413872 Category : Science Languages : en Pages : 305
Book Description
Auger electron spectroscopy is rapidly developing into the single most powerful analytical technique in basic and applied science.for investigating the chemical and structural properties of solids. Its ex plosive growth beginning in 1967 was triggered by the development of Auger analyzers capable of de tecting one atom layer of material in a fraction of a second. Continued growth was guaranteed firstly by the commercial availability of apparatus which combined the capabilities of scanning electron mi croscopy and ion-mill depth profiling with Auger analysis, and secondly by the increasing need to know the atomistics of many processes in fundamental research and engineering applications. The expanding use of Auger analysis was accompanied by an increase in the number of publications dealing with it. Because of the developing nature of Auger spectroscopy, the articles have appeared in many different sources covering diverse disciplines, so that it is extremely difficult to discover just what has or has not been subjected to Auger analysis. In this situation, a comprehensive bibliography is obviou-sly useful to those both inside and outside the field. For those in the field, this bibliography should be a wonderful time saver for locating certain references, in researching a particular topic, or when considering various aspects of instrumentation or data analysis. This bibliography not only provides the most complete listing of references pertinent to surface Auger analysis available today, but it is also a basis for extrapolating from past trends to future expectations.
Author: Thomas Carlson Publisher: Springer Science & Business Media ISBN: 1475701187 Category : Science Languages : en Pages : 427
Book Description
In 1970 when I first seriously contemplated writing a book on electron spectroscopy, I recognized the impossibility of completely reaching my desired goals. First, the field was expanding (and still is) at such a rate that a definitive statement of the subject is not possible. The act of following the literature comprehensively and summarizing its essential content proved to be a diver gent series. On the other hand, the field has increased to such a size that violent changes in its basic makeup no longer occur with the frequency that was present in its early days. Furthermore, the excitement of electron spectro scopy lies in its many-faceted interrelationships. In the era of specialization, electron spectroscopy is an open-ended subject continually bringing together new aspects of science. I wished to discuss not just one type of electron spectro scopy, but as many as would be possible. The book as it stands concentrates its attention on x-ray photoelectron spectroscopy, but also presents the basis of Auger electron spectroscopy and uv photoelectron spectroscopy, as well as mentioning many of the other branches of the field. A large, many-author volume might be an answer to some of these problems. However, though anyone person possesses only a limited amount of expertise, I have always enjoyed books by a single author since what they lack in detailed knowledge they gain in a unified viewpoint. I hope the final product, though limited in its attainment of these goals, will still be of some merit.
Author: Otto Buck Publisher: Academic Press ISBN: 1483191486 Category : Technology & Engineering Languages : en Pages : 359
Book Description
Electron and Positron Spectroscopies in Materials Science and Engineering presents the advances and limitations of instrumentations for surface and interface probing useful to metallurgical applications. It discusses the Auger electron spectroscopy and electron spectroscopy for chemical analysis. It addresses the means to determine the chemistry of the surface. Some of the topics covered in the book are the exo-electron emission; positron annihilation; extended x-ray absorption fine structure; high resolution electron microscopy; uniaxial monotonic deformation-induced dislocation substructure; and analytical electron microscopy. The mechanistic basis for exo-electron spectroscopy is covered. The correlation of fatigue and photoyield are discussed. The text describes the tribostimulated emission. A study of the quantitative measurement of fatigue damage is presented. A chapter is devoted to the fracture of oxide films on aluminium. Another section focuses on the positron annihilation experimental details and the creep-induced dislocation substructure. The book can provide useful information to scientists, engineers, students, and researchers.
Author: Mauro Sardela Publisher: Springer ISBN: 1461492815 Category : Technology & Engineering Languages : en Pages : 242
Book Description
Practical Materials Characterization covers the most common materials analysis techniques in a single volume. It stands as a quick reference for experienced users, as a learning tool for students, and as a guide for the understanding of typical data interpretation for anyone looking at results from a range of analytical techniques. The book includes analytical methods covering microstructural, surface, morphological, and optical characterization of materials with emphasis on microscopic structural, electronic, biological, and mechanical properties. Many examples in this volume cover cutting-edge technologies such as nanomaterials and life sciences.
Author: Siegfried Hofmann
Author: Siegfried Hofmann
Author: Siegfried Hofmann
Author: John F. Watts
Author: Hirowo G. Suzuki
Author: Patrick Echlin
Author: Donald T. Hawkins
Author: Thomas Carlson
Author: David Briggs
Author: Otto Buck
Author: Mauro Sardela