Author: Michael T. Seman
Publisher:
ISBN:
Category : Electrochromic devices
Languages : en
Pages : 348

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Book Description

Author: Catherine B. Labelle
Publisher:
ISBN:
Category :
Languages : en
Pages : 620

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Book Description

Author: Pieter C. Rowlette
Publisher:
ISBN:
Category : Ceramic to metal bonding
Languages : en
Pages : 304

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Book Description

Author: A.W. Weimer
Publisher: Springer Science & Business Media
ISBN: 9400900716
Category : Technology & Engineering
Languages : en
Pages : 675

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Book Description
Carbide, Nitride and Boride Materials Synthesis and Processing is a major reference text addressing methods for the synthesis of non-oxides. Each chapter has been written by an expert practising in the subject area, affiliated with industry, academia or government research, thus providing a broad perspective of information for the reader. The subject matter ranges from materials properties and applications to methods of synthesis including pre- and post-synthesis processing. Although most of the text is concerned with the synthesis of powders, chapters are included for other materials such as whiskers, platelets, fibres and coatings. Carbide, Nitride and Boride Materials Synthesis and Processing is a comprehensive overview of the subject and is suitable for practitioners in the industry as well as those looking for an introduction to the field. It will be of interest to chemical, mechanical and ceramic engineers, materials scientists and chemists in both university and industrial environments working on or with refractory carbides, nitrides and borides.

Author: Joshua Robbins
Publisher:
ISBN:
Category : Oxides
Languages : en
Pages : 246

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Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 0

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Book Description

Author: Mitsuharu Konuma
Publisher: Springer Science & Business Media
ISBN: 3642845118
Category : Science
Languages : en
Pages : 234

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Book Description
Properties of thin films depend strongly upon the deposition technique and conditions chosen. In order to achieve the desired film, optimum deposition conditions have to be found by carrying out experiments in a trial-and error fashion with varying parameters. The data obtained on one growth apparatus are often not transferable to another. This is especially true for film deposition processes using a cold plasma because of our poor under standing of the mechanisms. Relatively precise studies have been carried out on the role that physical effects play in film formation such as sputter deposition. However, there are many open questions regarding processes that involve chemical reactions, for example, reactive sputter deposition or plasma enhanced chemical vapor deposition. Much further research is re quired in order to understand the fundamental deposition processes. A sys tematic collection of basic data, some of which may be readily available in other branches of science, for example, reaction cross sections for gases with energetic electrons, is also required. The need for pfasma deposition techniques is felt strongly in industrial applications because these techniques are superior to traditional thin-film deposition techniques in many ways. In fact, plasma deposition techniques have developed rapidly in the semiconductor and electronics industries. Fields of possible application are still expanding. A reliable plasma reactor with an adequate in situ system for monitoring the deposition conditions and film properties must be developed to improve reproducibility and pro ductivity at the industrial level.

Author: Wenli Yang
Publisher:
ISBN:
Category : Dielectrics
Languages : en
Pages : 298

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Book Description

Author: Y. Pauleau
Publisher: Springer Science & Business Media
ISBN: 940100353X
Category : Technology & Engineering
Languages : en
Pages : 372

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Book Description
An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.

Author: Larry M. Miller
Publisher:
ISBN:
Category : Aluminum oxide
Languages : en
Pages : 0

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Book Description