Pulse Electrochemical Deposition and Photocorrosion of Copper Indium Diselenide Thin Film PDF Download

Author: Nima Ghamarian
Publisher:
ISBN:
Category : Copper indium selenide
Languages : en
Pages : 228

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Author: Sook Liang Teo
Publisher:
ISBN:
Category : Copper
Languages : en
Pages : 418

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Author: Sreekanth Mandati
Publisher:
ISBN:
Category : Technology
Languages : en
Pages :

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CuInSe2 (CIS) and Cu(In,Ga)Se2 (CIGS) semiconductors are the most studied absorber materials for thin films solar cells due to their direct bandgap and large absorption coefficient. The highly efficient CIGS devices are often fabricated using expensive vacuum based technologies; however, recently electrodeposition has been demonstrated to produce CIGS devices with high efficiencies and it is easily amenable for large area films of high quality with effective material use and high deposition rate. In this context, this chapter discusses the recent developments in CIS and CIGS technologies using electrodeposition. In addition, the fundamental features of electrodeposition such as direct current, pulse and pulse-reverse plating and their application in the fabrication of CIS and CIGS films are discussed. In conclusion, the chapter summarizes the utilization of pulse electrodeposition for fabrication of CIS and CIGS films while making a recommendation for exploring the group's unique pulse electroplating method.

Author:
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Category :
Languages : en
Pages :

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A photovoltaic cell exhibiting an overall conversion efficiency of 13.6% is prepared from a copper-indium-gallium-diselenide precursor thin film. The film is fabricated by first simultaneously electrodepositing copper, indium, gallium, and selenium onto a glass/molybdenum substrate (12/14). The electrodeposition voltage is a high frequency AC voltage superimposed upon a DC voltage to improve the morphology and growth rate of the film. The electrodeposition is followed by physical vapor deposition to adjust the final stoichiometry of the thin film to approximately Cu(In.sub. 1-n Ga.sub.x)Se.sub. 2, with the ratio of Ga/(In+Ga) being approximately 0.39.

Author: Moses W. Haimbodi
Publisher:
ISBN:
Category : Photovoltaic cells
Languages : en
Pages : 452

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Author:
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ISBN:
Category :
Languages : en
Pages :

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High quality thin films of copper-indium-gallium-diselenide useful in the production of solar cells are prepared by electrodepositing at least one of the constituent metals onto a glass/Mo substrate, followed by physical vapor deposition of copper and selenium or indium and selenium to adjust the final stoichiometry of the thin film to approximately Cu(In, Ga)Se.sub. 2. Using an AC voltage of 1-100 KHz in combination with a DC voltage for electrodeposition improves the morphology and growth rate of the deposited thin film. An electrodeposition solution comprising at least in part an organic solvent may be used in conjunction with an increased cathodic potential to increase the gallium content of the electrodeposited thin film.

Author: G. Oskam
Publisher: The Electrochemical Society
ISBN: 156677800X
Category : Science
Languages : en
Pages : 234

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This symposium provided a forum for current work on the electrodeposition and characterization of functional coatings and nanostructures. Central issues include the control of size and architecture and the ample choices and demands of substrate and deposited materials. The focus materials of this symposium were semiconductors, oxides and composites with e.g. ceramic nanoparticles or nanotubes.

Author: Rima Dorothea Lauge Kristensen
Publisher:
ISBN:
Category : Photoelectric cells
Languages : en
Pages : 460

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Author: Xiaoyue Zhang
Publisher:
ISBN:
Category :
Languages : en
Pages : 310

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This dissertation discusses the formation of cadmium telluride (CdTe) using potential pulse atomic layer deposition (PP-ALD) and metal thin films (copper and gold) using surface limited redox replacement (SLRR). Both materials play important roles in photovoltaic devices. PP-ALD is an electrodeposition methodology similar to co-deposition because it uses one solution containing all precursors. However, instead of maintaining one deposition potential as with codeposition, potentials are varied quickly between a cathodic and an anodic potential throughout deposition. Each short pulse aims to limit the amount deposited during cathodic potential and strip the excess in the following anodic potential so that thermodynamically stable compound remains without elemental excess buried beneath the later-grown film. To achieve high quality CdTe thin film, changes in deposition potential and solution flow effects were first monitored and optimized. Parametric variables for controlling the Cd/Te ratio and morphology are also established. X-ray diffraction (XRD), Scanning electron microscope (SEM), Electron probe microanalysis (EPMA), Energy dispersive X-Ray Analyzer (EDX) were used to characterize the resulting CdTe films. Results indicated that deposited CdTe was stoichiometric, high crystalline with a smooth, continuous morphology using an optimized PP-ALD method. The optimized PP-ALD method was also applied on nanostructured Au electrodes. Initial results showed high quality deposits with reproducible stoichiometry, which could open pathways for semiconductor and nanostructure incorporation. Cu and Au thin films were formed on metal and semiconductor substrates via surface limited redox replacement (SLRR). An atomic layer of cadmium was first deposited as a sacrificial layer, and then replaced with ions of more noble metals such as Cu2+ or Au3+ to form Cu or Au atomic layer. Uniform and reasonably flat metal thin films with controllable thickness were produced by multiple repetitions of SLRR cycles with great linear growth with respect to cycle numbers. The resulting metal thin films were characterized using coulometry, SEM, EDX and EPMA. They confirmed deposited metal thin films had a conformal, flat morphology with no roughness development, nor Cd incorporation in the deposition process.

Author: Rui Kamada
Publisher: ProQuest
ISBN: 9780549926849
Category : Copper
Languages : en
Pages :

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Cu(In, Ga)Se 2 film fabrication by the selenization of the mixed metal/metal-selenide precursors was investigated. For the precursor preparation, the combination of electro deposition, annealing, co-evaporation and pre-selenization methods were employed with sequential sputtering as a control. The precursor structures studied were CuSe/Ga/In, Cu 2-x Se/Ga/In, (Ga, In)-Se/Cu and metallic Cu-Ga/In as a control. Cu 2-x Se/Ga/In precursors were prepared from both electro deposition and co-evaporation. These precursors were selenized in H 2 Se at at 450°C for 5, 15, and 90min. The structures of the precursors and reacted films were examined in terms of the crystalline phases, compositions and morphologies by scanning electron microscopy, energy dispersive spectroscopy, symmetric and asymmetric X-ray diffraction, and Auger electron spectroscopy. The similar selenization reaction rates were obtained for the precursors with copper selenide/Ga/In structures as that for the control precursor while that for the (Ga, In)-Se/Cu seems to be slower than the control. Ga accumulation at the backside of the selenized film was universally observed for the precursors including the control Cu-Ga/In precursor, with the exception of one precursor with the structure of CuSe/Ga/In made from electro deposition. For the CuSe/Ga/In precursor, a hill-like Ga profile with the maximum Ga concentration at the middle of the film was obtained. In addition, increased Ga composition at the front side of the selenized film was obtained for the Cu 2-x Se/Ga/In precursor made from electro deposition compared to the control. The device performance of the solar cells made of these selenized films were also investigated and related to the film properties. The comparable conversion efficiencies were obtained from the three precursors with copper selenide/Ga/In structures as the control. The long wavelength edge of external quantum efficiency curve indicates larger bandgap than the control for the films made from the two precursors including the CuSe/Ga/In and Cu 2-x Se/Ga/In, both started with electron deposition. The enhanced Ga incorporation into Cu(In, Ga)Se 2 structure corresponds to the larger bandgap for these precursors.